JPH0231857B2 - - Google Patents

Info

Publication number
JPH0231857B2
JPH0231857B2 JP61138276A JP13827686A JPH0231857B2 JP H0231857 B2 JPH0231857 B2 JP H0231857B2 JP 61138276 A JP61138276 A JP 61138276A JP 13827686 A JP13827686 A JP 13827686A JP H0231857 B2 JPH0231857 B2 JP H0231857B2
Authority
JP
Japan
Prior art keywords
temperature
photoresist
heat resistance
processing table
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61138276A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62295418A (ja
Inventor
Shinji Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Priority to JP61138276A priority Critical patent/JPS62295418A/ja
Publication of JPS62295418A publication Critical patent/JPS62295418A/ja
Publication of JPH0231857B2 publication Critical patent/JPH0231857B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61138276A 1986-06-16 1986-06-16 レジスト処理方法 Granted JPS62295418A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61138276A JPS62295418A (ja) 1986-06-16 1986-06-16 レジスト処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61138276A JPS62295418A (ja) 1986-06-16 1986-06-16 レジスト処理方法

Publications (2)

Publication Number Publication Date
JPS62295418A JPS62295418A (ja) 1987-12-22
JPH0231857B2 true JPH0231857B2 (enrdf_load_stackoverflow) 1990-07-17

Family

ID=15218130

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61138276A Granted JPS62295418A (ja) 1986-06-16 1986-06-16 レジスト処理方法

Country Status (1)

Country Link
JP (1) JPS62295418A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6225601B1 (en) * 1998-07-13 2001-05-01 Applied Komatsu Technology, Inc. Heating a substrate support in a substrate handling chamber
KR101006800B1 (ko) * 2003-06-06 2011-01-10 도쿄엘렉트론가부시키가이샤 기판의 처리막의 표면 거침을 개선하는 방법 및 기판 처리장치

Also Published As

Publication number Publication date
JPS62295418A (ja) 1987-12-22

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term