JPS62290844A - 超低鉄損一方向性けい素鋼板 - Google Patents
超低鉄損一方向性けい素鋼板Info
- Publication number
- JPS62290844A JPS62290844A JP13108286A JP13108286A JPS62290844A JP S62290844 A JPS62290844 A JP S62290844A JP 13108286 A JP13108286 A JP 13108286A JP 13108286 A JP13108286 A JP 13108286A JP S62290844 A JPS62290844 A JP S62290844A
- Authority
- JP
- Japan
- Prior art keywords
- silicon steel
- steel sheet
- iron loss
- grain
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 title claims abstract description 59
- 229910000976 Electrical steel Inorganic materials 0.000 title claims abstract description 33
- 229910052742 iron Inorganic materials 0.000 title claims abstract description 29
- 239000013078 crystal Substances 0.000 claims abstract description 22
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract 4
- 239000011248 coating agent Substances 0.000 claims description 20
- 238000000576 coating method Methods 0.000 claims description 20
- 229910000831 Steel Inorganic materials 0.000 abstract description 6
- 239000010959 steel Substances 0.000 abstract description 6
- 238000000137 annealing Methods 0.000 description 29
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 27
- 238000000034 method Methods 0.000 description 12
- 239000000203 mixture Substances 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 238000005097 cold rolling Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- 229910052748 manganese Inorganic materials 0.000 description 6
- 229910052717 sulfur Inorganic materials 0.000 description 6
- 238000005498 polishing Methods 0.000 description 5
- 238000000746 purification Methods 0.000 description 5
- 238000001953 recrystallisation Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005261 decarburization Methods 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229910052711 selenium Inorganic materials 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 229910052839 forsterite Inorganic materials 0.000 description 2
- 238000011835 investigation Methods 0.000 description 2
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 2
- 230000005381 magnetic domain Effects 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002505 iron Chemical class 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Soft Magnetic Materials (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13108286A JPS62290844A (ja) | 1986-06-07 | 1986-06-07 | 超低鉄損一方向性けい素鋼板 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13108286A JPS62290844A (ja) | 1986-06-07 | 1986-06-07 | 超低鉄損一方向性けい素鋼板 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62290844A true JPS62290844A (ja) | 1987-12-17 |
| JPH0335377B2 JPH0335377B2 (enrdf_load_stackoverflow) | 1991-05-28 |
Family
ID=15049568
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13108286A Granted JPS62290844A (ja) | 1986-06-07 | 1986-06-07 | 超低鉄損一方向性けい素鋼板 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62290844A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05202450A (ja) * | 1992-01-27 | 1993-08-10 | Nippon Steel Corp | 超低鉄損一方向性電磁鋼板およびその製造方法 |
| JP2021509145A (ja) * | 2017-12-26 | 2021-03-18 | ポスコＰｏｓｃｏ | 超低鉄損方向性電磁鋼板の製造方法 |
| JP2021509143A (ja) * | 2017-12-26 | 2021-03-18 | ポスコＰｏｓｃｏ | 方向性電磁鋼板の製造方法 |
-
1986
- 1986-06-07 JP JP13108286A patent/JPS62290844A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05202450A (ja) * | 1992-01-27 | 1993-08-10 | Nippon Steel Corp | 超低鉄損一方向性電磁鋼板およびその製造方法 |
| JP2021509145A (ja) * | 2017-12-26 | 2021-03-18 | ポスコＰｏｓｃｏ | 超低鉄損方向性電磁鋼板の製造方法 |
| JP2021509143A (ja) * | 2017-12-26 | 2021-03-18 | ポスコＰｏｓｃｏ | 方向性電磁鋼板の製造方法 |
| US11773490B2 (en) | 2017-12-26 | 2023-10-03 | Posco Co., Ltd | Method for producing oriented electrical steel sheet with ultra-low iron loss |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0335377B2 (enrdf_load_stackoverflow) | 1991-05-28 |
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