JPS62271430A - ウエハ−処理方法 - Google Patents

ウエハ−処理方法

Info

Publication number
JPS62271430A
JPS62271430A JP62079210A JP7921087A JPS62271430A JP S62271430 A JPS62271430 A JP S62271430A JP 62079210 A JP62079210 A JP 62079210A JP 7921087 A JP7921087 A JP 7921087A JP S62271430 A JPS62271430 A JP S62271430A
Authority
JP
Japan
Prior art keywords
alignment
wafer
shot
mask
printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62079210A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6352454B2 (enExample
Inventor
Naoki Ayada
綾田　直樹
Tadashi Konuki
小貫　忠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP62079210A priority Critical patent/JPS62271430A/ja
Publication of JPS62271430A publication Critical patent/JPS62271430A/ja
Publication of JPS6352454B2 publication Critical patent/JPS6352454B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62079210A 1987-03-31 1987-03-31 ウエハ−処理方法 Granted JPS62271430A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62079210A JPS62271430A (ja) 1987-03-31 1987-03-31 ウエハ−処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62079210A JPS62271430A (ja) 1987-03-31 1987-03-31 ウエハ−処理方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP57210986A Division JPS59101830A (ja) 1982-12-01 1982-12-01 転写装置

Publications (2)

Publication Number Publication Date
JPS62271430A true JPS62271430A (ja) 1987-11-25
JPS6352454B2 JPS6352454B2 (enExample) 1988-10-19

Family

ID=13683576

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62079210A Granted JPS62271430A (ja) 1987-03-31 1987-03-31 ウエハ−処理方法

Country Status (1)

Country Link
JP (1) JPS62271430A (enExample)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58103150A (ja) * 1981-12-16 1983-06-20 Matsushita Electric Ind Co Ltd 半導体基板の製造方法
JPS5932130A (ja) * 1982-08-16 1984-02-21 Hitachi Ltd 露光方法および露光装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58103150A (ja) * 1981-12-16 1983-06-20 Matsushita Electric Ind Co Ltd 半導体基板の製造方法
JPS5932130A (ja) * 1982-08-16 1984-02-21 Hitachi Ltd 露光方法および露光装置

Also Published As

Publication number Publication date
JPS6352454B2 (enExample) 1988-10-19

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