JPS62271430A - ウエハ−処理方法 - Google Patents
ウエハ−処理方法Info
- Publication number
- JPS62271430A JPS62271430A JP62079210A JP7921087A JPS62271430A JP S62271430 A JPS62271430 A JP S62271430A JP 62079210 A JP62079210 A JP 62079210A JP 7921087 A JP7921087 A JP 7921087A JP S62271430 A JPS62271430 A JP S62271430A
- Authority
- JP
- Japan
- Prior art keywords
- alignment
- wafer
- shot
- mask
- printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62079210A JPS62271430A (ja) | 1987-03-31 | 1987-03-31 | ウエハ−処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62079210A JPS62271430A (ja) | 1987-03-31 | 1987-03-31 | ウエハ−処理方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57210986A Division JPS59101830A (ja) | 1982-12-01 | 1982-12-01 | 転写装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62271430A true JPS62271430A (ja) | 1987-11-25 |
| JPS6352454B2 JPS6352454B2 (enrdf_load_stackoverflow) | 1988-10-19 |
Family
ID=13683576
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62079210A Granted JPS62271430A (ja) | 1987-03-31 | 1987-03-31 | ウエハ−処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62271430A (enrdf_load_stackoverflow) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58103150A (ja) * | 1981-12-16 | 1983-06-20 | Matsushita Electric Ind Co Ltd | 半導体基板の製造方法 |
| JPS5932130A (ja) * | 1982-08-16 | 1984-02-21 | Hitachi Ltd | 露光方法および露光装置 |
-
1987
- 1987-03-31 JP JP62079210A patent/JPS62271430A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58103150A (ja) * | 1981-12-16 | 1983-06-20 | Matsushita Electric Ind Co Ltd | 半導体基板の製造方法 |
| JPS5932130A (ja) * | 1982-08-16 | 1984-02-21 | Hitachi Ltd | 露光方法および露光装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6352454B2 (enrdf_load_stackoverflow) | 1988-10-19 |
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