JPS6225750A - 平凹版用感光性印刷版材 - Google Patents

平凹版用感光性印刷版材

Info

Publication number
JPS6225750A
JPS6225750A JP16529385A JP16529385A JPS6225750A JP S6225750 A JPS6225750 A JP S6225750A JP 16529385 A JP16529385 A JP 16529385A JP 16529385 A JP16529385 A JP 16529385A JP S6225750 A JPS6225750 A JP S6225750A
Authority
JP
Japan
Prior art keywords
photosensitive
printing
printing plate
polyvinyl alcohol
plate material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16529385A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0370214B2 (enExample
Inventor
Kunihiro Ichimura
市村　国宏
Teruhiko Yonezawa
米澤　輝彦
Hideo Kikuchi
英夫 菊地
Tetsuaki Tochisawa
栃澤　哲明
Keiichi Hayashi
敬一 林
Hitoshi Sugiura
杉浦　等
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Toyo Gosei Co Ltd
Original Assignee
Agency of Industrial Science and Technology
Toyo Gosei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Toyo Gosei Co Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP16529385A priority Critical patent/JPS6225750A/ja
Publication of JPS6225750A publication Critical patent/JPS6225750A/ja
Publication of JPH0370214B2 publication Critical patent/JPH0370214B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP16529385A 1985-07-26 1985-07-26 平凹版用感光性印刷版材 Granted JPS6225750A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16529385A JPS6225750A (ja) 1985-07-26 1985-07-26 平凹版用感光性印刷版材

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16529385A JPS6225750A (ja) 1985-07-26 1985-07-26 平凹版用感光性印刷版材

Publications (2)

Publication Number Publication Date
JPS6225750A true JPS6225750A (ja) 1987-02-03
JPH0370214B2 JPH0370214B2 (enExample) 1991-11-06

Family

ID=15809575

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16529385A Granted JPS6225750A (ja) 1985-07-26 1985-07-26 平凹版用感光性印刷版材

Country Status (1)

Country Link
JP (1) JPS6225750A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01172831A (ja) * 1987-12-28 1989-07-07 Agency Of Ind Science & Technol 感光性樹脂組成物
EP0373537A1 (en) 1988-12-14 1990-06-20 THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY Photosensitive poly(vinyl alcohol) derivative
JPH04218677A (ja) * 1990-04-02 1992-08-10 Nippon Steel Corp すべり性と密着性に優れた電磁鋼板の電気絶縁皮膜処理方法
KR20010007228A (ko) * 1999-06-04 2001-01-26 도요 고세이 고교 가부시키가이샤 감광성 비누화된 폴리(비닐 아세테이트)로 구성된 감광성조성물 및 그 조성물을 이용하는 패턴형성방법

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57185035A (en) * 1981-05-11 1982-11-15 Agency Of Ind Science & Technol Photosensitive resin composition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57185035A (en) * 1981-05-11 1982-11-15 Agency Of Ind Science & Technol Photosensitive resin composition

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01172831A (ja) * 1987-12-28 1989-07-07 Agency Of Ind Science & Technol 感光性樹脂組成物
EP0373537A1 (en) 1988-12-14 1990-06-20 THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY Photosensitive poly(vinyl alcohol) derivative
JPH04218677A (ja) * 1990-04-02 1992-08-10 Nippon Steel Corp すべり性と密着性に優れた電磁鋼板の電気絶縁皮膜処理方法
KR20010007228A (ko) * 1999-06-04 2001-01-26 도요 고세이 고교 가부시키가이샤 감광성 비누화된 폴리(비닐 아세테이트)로 구성된 감광성조성물 및 그 조성물을 이용하는 패턴형성방법

Also Published As

Publication number Publication date
JPH0370214B2 (enExample) 1991-11-06

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term