JPS57185035A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS57185035A
JPS57185035A JP6929981A JP6929981A JPS57185035A JP S57185035 A JPS57185035 A JP S57185035A JP 6929981 A JP6929981 A JP 6929981A JP 6929981 A JP6929981 A JP 6929981A JP S57185035 A JPS57185035 A JP S57185035A
Authority
JP
Japan
Prior art keywords
polyvinyl alcohol
main
chain
photosensitive
derivative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6929981A
Other languages
Japanese (ja)
Other versions
JPS647649B2 (en
Inventor
Kunihiro Ichimura
Kunitaka Toyofuku
Hiroshi Ito
Shuichi Tokumasu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
New Oji Paper Co Ltd
Original Assignee
Agency of Industrial Science and Technology
Oji Paper Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Oji Paper Co Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP6929981A priority Critical patent/JPS57185035A/en
Publication of JPS57185035A publication Critical patent/JPS57185035A/en
Publication of JPS647649B2 publication Critical patent/JPS647649B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To obtain a photosensitive resin composition superior in sensitivity and resolution, by incorporating specified 2 kinds of modified polyvinyl alcohol having photosensitive styrylpyridinium groups or styrylquinolinium groups. CONSTITUTION:A polyvinyl alcohol derivative A has a main polyvinyl alcohol chain having 70-100% saponification degree and polymerization degree up to 1,000, and contains at least one kind of photosensitive styrylpyridinium or styrylquinolium groups represented by the formulaI, amounting to 1-30mol% basing on the total monomer unit number of the main polyvinyl alcohol chain. On the other hand, the polyvinyl alcohol derivative B to be incorporated with said derivative A has 70-100% saponification degree and polymerization degree down to 1,000 in its main polyvinyl alcohol chain, and contains said polymer constituent units of the formulaIamounting to <=1mol% in the main chain.
JP6929981A 1981-05-11 1981-05-11 Photosensitive resin composition Granted JPS57185035A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6929981A JPS57185035A (en) 1981-05-11 1981-05-11 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6929981A JPS57185035A (en) 1981-05-11 1981-05-11 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS57185035A true JPS57185035A (en) 1982-11-15
JPS647649B2 JPS647649B2 (en) 1989-02-09

Family

ID=13398544

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6929981A Granted JPS57185035A (en) 1981-05-11 1981-05-11 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS57185035A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6187150A (en) * 1984-09-11 1986-05-02 Agency Of Ind Science & Technol Photosensitive resin composition
JPS6225750A (en) * 1985-07-26 1987-02-03 Agency Of Ind Science & Technol Photosensitive printing plate material for lithographic and intaglio printing
JPH01172831A (en) * 1987-12-28 1989-07-07 Agency Of Ind Science & Technol Photosensitive resin composition
US5358999A (en) * 1992-05-29 1994-10-25 Ulano Corporation Process for preparation of photosensitive compositions of stilbazolium quaternary

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6187150A (en) * 1984-09-11 1986-05-02 Agency Of Ind Science & Technol Photosensitive resin composition
JPH0369099B2 (en) * 1984-09-11 1991-10-30 Kogyo Gijutsu Incho
JPS6225750A (en) * 1985-07-26 1987-02-03 Agency Of Ind Science & Technol Photosensitive printing plate material for lithographic and intaglio printing
JPH0370214B2 (en) * 1985-07-26 1991-11-06 Kogyo Gijutsu Incho
JPH01172831A (en) * 1987-12-28 1989-07-07 Agency Of Ind Science & Technol Photosensitive resin composition
US5358999A (en) * 1992-05-29 1994-10-25 Ulano Corporation Process for preparation of photosensitive compositions of stilbazolium quaternary

Also Published As

Publication number Publication date
JPS647649B2 (en) 1989-02-09

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