JPS62254434A - ＳｉＯ↓２／ＳｉＮ／ＳｉＯ↓２膜の成膜方法 - Google Patents

ＳｉＯ↓２／ＳｉＮ／ＳｉＯ↓２膜の成膜方法

Info

Publication number
JPS62254434A
JPS62254434A JP9900686A JP9900686A JPS62254434A JP S62254434 A JPS62254434 A JP S62254434A JP 9900686 A JP9900686 A JP 9900686A JP 9900686 A JP9900686 A JP 9900686A JP S62254434 A JPS62254434 A JP S62254434A
Authority
JP
Japan
Prior art keywords
film
sin
sio
sin film
sio2
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9900686A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0455526B2 (enrdf_load_html_response
Inventor
Hisakazu Miyatake
宮武　久和
Ryunosuke Goto
五藤　龍之助
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP9900686A priority Critical patent/JPS62254434A/ja
Publication of JPS62254434A publication Critical patent/JPS62254434A/ja
Publication of JPH0455526B2 publication Critical patent/JPH0455526B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Formation Of Insulating Films (AREA)
JP9900686A 1986-04-28 1986-04-28 ＳｉＯ↓２／ＳｉＮ／ＳｉＯ↓２膜の成膜方法 Granted JPS62254434A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9900686A JPS62254434A (ja) 1986-04-28 1986-04-28 ＳｉＯ↓２／ＳｉＮ／ＳｉＯ↓２膜の成膜方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9900686A JPS62254434A (ja) 1986-04-28 1986-04-28 ＳｉＯ↓２／ＳｉＮ／ＳｉＯ↓２膜の成膜方法

Publications (2)

Publication Number Publication Date
JPS62254434A true JPS62254434A (ja) 1987-11-06
JPH0455526B2 JPH0455526B2 (enrdf_load_html_response) 1992-09-03

Family

ID=14234949

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9900686A Granted JPS62254434A (ja) 1986-04-28 1986-04-28 ＳｉＯ↓２／ＳｉＮ／ＳｉＯ↓２膜の成膜方法

Country Status (1)

Country Link
JP (1) JPS62254434A (enrdf_load_html_response)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01145821A (ja) * 1987-12-01 1989-06-07 Nec Corp 半導体集積回路の製造方法
JP2004523134A (ja) * 2000-09-19 2004-07-29 マットソン テクノロジイ インコーポレイテッド 誘電体膜の形成方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4998182A (enrdf_load_html_response) * 1973-01-19 1974-09-17
JPS60121724A (ja) * 1983-12-06 1985-06-29 Nec Kyushu Ltd 半導体装置の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4998182A (enrdf_load_html_response) * 1973-01-19 1974-09-17
JPS60121724A (ja) * 1983-12-06 1985-06-29 Nec Kyushu Ltd 半導体装置の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01145821A (ja) * 1987-12-01 1989-06-07 Nec Corp 半導体集積回路の製造方法
JP2004523134A (ja) * 2000-09-19 2004-07-29 マットソン テクノロジイ インコーポレイテッド 誘電体膜の形成方法

Also Published As

Publication number Publication date
JPH0455526B2 (enrdf_load_html_response) 1992-09-03

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Legal Events

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EXPY Cancellation because of completion of term