JPS6223788B2 - - Google Patents

Info

Publication number
JPS6223788B2
JPS6223788B2 JP54031579A JP3157979A JPS6223788B2 JP S6223788 B2 JPS6223788 B2 JP S6223788B2 JP 54031579 A JP54031579 A JP 54031579A JP 3157979 A JP3157979 A JP 3157979A JP S6223788 B2 JPS6223788 B2 JP S6223788B2
Authority
JP
Japan
Prior art keywords
photosensitive resin
formula
phenol
resin
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54031579A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55123614A (en
Inventor
Keiji Kubo
Tetsuo Ishihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd
Priority to JP3157979A priority Critical patent/JPS55123614A/ja
Priority to DE19803009873 priority patent/DE3009873A1/de
Priority to US06/130,372 priority patent/US4308368A/en
Publication of JPS55123614A publication Critical patent/JPS55123614A/ja
Priority to JP28495186A priority patent/JPS62149717A/ja
Publication of JPS6223788B2 publication Critical patent/JPS6223788B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP3157979A 1979-03-16 1979-03-16 Photosensitive resin and positive type-photosensitive resin composition Granted JPS55123614A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP3157979A JPS55123614A (en) 1979-03-16 1979-03-16 Photosensitive resin and positive type-photosensitive resin composition
DE19803009873 DE3009873A1 (de) 1979-03-16 1980-03-14 Photoempfindliche masse
US06/130,372 US4308368A (en) 1979-03-16 1980-03-14 Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
JP28495186A JPS62149717A (ja) 1979-03-16 1986-11-29 感光性樹脂の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3157979A JPS55123614A (en) 1979-03-16 1979-03-16 Photosensitive resin and positive type-photosensitive resin composition

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP28495186A Division JPS62149717A (ja) 1979-03-16 1986-11-29 感光性樹脂の製造方法

Publications (2)

Publication Number Publication Date
JPS55123614A JPS55123614A (en) 1980-09-24
JPS6223788B2 true JPS6223788B2 (enrdf_load_stackoverflow) 1987-05-25

Family

ID=12335086

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3157979A Granted JPS55123614A (en) 1979-03-16 1979-03-16 Photosensitive resin and positive type-photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS55123614A (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8505402D0 (en) * 1985-03-02 1985-04-03 Ciba Geigy Ag Modified phenolic resins
JPS62161146A (ja) * 1986-01-10 1987-07-17 Mitsubishi Petrochem Co Ltd ホトレジスト組成物
JPH0654387B2 (ja) * 1986-05-02 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JPH0654388B2 (ja) * 1986-05-02 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JPH0656487B2 (ja) * 1986-05-02 1994-07-27 東京応化工業株式会社 ポジ型ホトレジスト用組成物
JPH0820730B2 (ja) * 1986-10-30 1996-03-04 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物
JPS63116145A (ja) * 1986-11-04 1988-05-20 Konica Corp 着色画像形成材料
JPS63198046A (ja) * 1987-02-13 1988-08-16 Konica Corp 耐処理薬品性及びインキ着肉性に優れた感光性組成物
JP2560266B2 (ja) * 1987-03-25 1996-12-04 日本合成ゴム株式会社 感放射線性樹脂組成物
JPH0296164A (ja) * 1988-10-03 1990-04-06 Konica Corp 感光性組成物
JP3063148B2 (ja) * 1989-12-27 2000-07-12 住友化学工業株式会社 ポジ型レジスト組成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE793490A (fr) * 1972-05-23 1973-06-29 Hunt Chem Corp Philip A Article sensible a la lumiere comprenant un phenolate de diazoquinone, un liant polymerique, et une diazoquinone-siloxane
JPS4924361A (enrdf_load_stackoverflow) * 1972-06-27 1974-03-04
JPS505083A (enrdf_load_stackoverflow) * 1973-04-27 1975-01-20
JPS54116218A (en) * 1978-03-02 1979-09-10 Oji Paper Co Photosensitive composition

Also Published As

Publication number Publication date
JPS55123614A (en) 1980-09-24

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