JPS621227Y2 - - Google Patents
Info
- Publication number
- JPS621227Y2 JPS621227Y2 JP70382U JP70382U JPS621227Y2 JP S621227 Y2 JPS621227 Y2 JP S621227Y2 JP 70382 U JP70382 U JP 70382U JP 70382 U JP70382 U JP 70382U JP S621227 Y2 JPS621227 Y2 JP S621227Y2
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- substrate holder
- gas
- high frequency
- ion plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 26
- 238000007733 ion plating Methods 0.000 claims description 14
- 239000007789 gas Substances 0.000 description 27
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 230000008020 evaporation Effects 0.000 description 10
- 238000001704 evaporation Methods 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- 239000002994 raw material Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP70382U JPS58105474U (ja) | 1982-01-07 | 1982-01-07 | 高周波イオンプレ−テイング用反応管 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP70382U JPS58105474U (ja) | 1982-01-07 | 1982-01-07 | 高周波イオンプレ−テイング用反応管 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58105474U JPS58105474U (ja) | 1983-07-18 |
| JPS621227Y2 true JPS621227Y2 (cs) | 1987-01-13 |
Family
ID=30013761
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP70382U Granted JPS58105474U (ja) | 1982-01-07 | 1982-01-07 | 高周波イオンプレ−テイング用反応管 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58105474U (cs) |
-
1982
- 1982-01-07 JP JP70382U patent/JPS58105474U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58105474U (ja) | 1983-07-18 |
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