JPS62112375A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS62112375A
JPS62112375A JP25320785A JP25320785A JPS62112375A JP S62112375 A JPS62112375 A JP S62112375A JP 25320785 A JP25320785 A JP 25320785A JP 25320785 A JP25320785 A JP 25320785A JP S62112375 A JPS62112375 A JP S62112375A
Authority
JP
Japan
Prior art keywords
substrate
mask
drain region
conductivity type
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25320785A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0424876B2 (enExample
Inventor
Masayuki Yoshida
正之 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP25320785A priority Critical patent/JPS62112375A/ja
Publication of JPS62112375A publication Critical patent/JPS62112375A/ja
Publication of JPH0424876B2 publication Critical patent/JPH0424876B2/ja
Granted legal-status Critical Current

Links

JP25320785A 1985-11-12 1985-11-12 半導体装置の製造方法 Granted JPS62112375A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25320785A JPS62112375A (ja) 1985-11-12 1985-11-12 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25320785A JPS62112375A (ja) 1985-11-12 1985-11-12 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS62112375A true JPS62112375A (ja) 1987-05-23
JPH0424876B2 JPH0424876B2 (enExample) 1992-04-28

Family

ID=17248042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25320785A Granted JPS62112375A (ja) 1985-11-12 1985-11-12 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS62112375A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04225529A (ja) * 1990-04-06 1992-08-14 Applied Materials Inc 微量の不純物を添加したドレイン（ｌｄｄ）を有する集積回路構造体を製作する改良された方法
EP0856892A3 (en) * 1997-01-30 1999-07-14 Oki Electric Industry Co., Ltd. MOSFET and manufacturing method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04225529A (ja) * 1990-04-06 1992-08-14 Applied Materials Inc 微量の不純物を添加したドレイン（ｌｄｄ）を有する集積回路構造体を製作する改良された方法
EP0856892A3 (en) * 1997-01-30 1999-07-14 Oki Electric Industry Co., Ltd. MOSFET and manufacturing method thereof

Also Published As

Publication number Publication date
JPH0424876B2 (enExample) 1992-04-28

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Legal Events

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