JPS6180862A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS6180862A
JPS6180862A JP59202709A JP20270984A JPS6180862A JP S6180862 A JPS6180862 A JP S6180862A JP 59202709 A JP59202709 A JP 59202709A JP 20270984 A JP20270984 A JP 20270984A JP S6180862 A JPS6180862 A JP S6180862A
Authority
JP
Japan
Prior art keywords
polycrystalline silicon
silicon layer
semiconductor device
manufacturing
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59202709A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0527975B2 (enrdf_load_stackoverflow
Inventor
Takeo Maeda
前田　健夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP59202709A priority Critical patent/JPS6180862A/ja
Priority to US06/780,071 priority patent/US4663825A/en
Publication of JPS6180862A publication Critical patent/JPS6180862A/ja
Priority to US07/047,146 priority patent/US4769337A/en
Publication of JPH0527975B2 publication Critical patent/JPH0527975B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/0223—Manufacture or treatment of FETs having insulated gates [IGFET] having source and drain regions or source and drain extensions self-aligned to sides of the gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table
    • H01L21/28525—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table the conductive layers comprising semiconducting material

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
JP59202709A 1984-09-27 1984-09-27 半導体装置の製造方法 Granted JPS6180862A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP59202709A JPS6180862A (ja) 1984-09-27 1984-09-27 半導体装置の製造方法
US06/780,071 US4663825A (en) 1984-09-27 1985-09-25 Method of manufacturing semiconductor device
US07/047,146 US4769337A (en) 1984-09-27 1987-05-08 Method of forming selective polysilicon wiring layer to source, drain and emitter regions by implantation through polysilicon layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59202709A JPS6180862A (ja) 1984-09-27 1984-09-27 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS6180862A true JPS6180862A (ja) 1986-04-24
JPH0527975B2 JPH0527975B2 (enrdf_load_stackoverflow) 1993-04-22

Family

ID=16461852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59202709A Granted JPS6180862A (ja) 1984-09-27 1984-09-27 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS6180862A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61222125A (ja) * 1985-03-27 1986-10-02 Rohm Co Ltd 半導体装置の製造方法
JPS6316671A (ja) * 1986-07-08 1988-01-23 Nec Corp シリサイドゲ−ト半導体装置の製造方法
KR100475727B1 (ko) * 1997-07-01 2005-07-21 삼성전자주식회사 저콘택저항을가지는반도체장치의제조방법

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61222125A (ja) * 1985-03-27 1986-10-02 Rohm Co Ltd 半導体装置の製造方法
JPS6316671A (ja) * 1986-07-08 1988-01-23 Nec Corp シリサイドゲ−ト半導体装置の製造方法
KR100475727B1 (ko) * 1997-07-01 2005-07-21 삼성전자주식회사 저콘택저항을가지는반도체장치의제조방법

Also Published As

Publication number Publication date
JPH0527975B2 (enrdf_load_stackoverflow) 1993-04-22

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