JPS6167934A - 溝埋込分離の形成方法 - Google Patents
溝埋込分離の形成方法Info
- Publication number
- JPS6167934A JPS6167934A JP59189893A JP18989384A JPS6167934A JP S6167934 A JPS6167934 A JP S6167934A JP 59189893 A JP59189893 A JP 59189893A JP 18989384 A JP18989384 A JP 18989384A JP S6167934 A JPS6167934 A JP S6167934A
- Authority
- JP
- Japan
- Prior art keywords
- oxide glass
- groove
- silicon oxide
- forming
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10W10/00—
-
- H10W10/01—
Landscapes
- Local Oxidation Of Silicon (AREA)
- Element Separation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59189893A JPS6167934A (ja) | 1984-09-11 | 1984-09-11 | 溝埋込分離の形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59189893A JPS6167934A (ja) | 1984-09-11 | 1984-09-11 | 溝埋込分離の形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6167934A true JPS6167934A (ja) | 1986-04-08 |
| JPH0354860B2 JPH0354860B2 (OSRAM) | 1991-08-21 |
Family
ID=16248944
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59189893A Granted JPS6167934A (ja) | 1984-09-11 | 1984-09-11 | 溝埋込分離の形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6167934A (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6246543A (ja) * | 1985-08-23 | 1987-02-28 | Nec Corp | 半導体装置の製造方法 |
-
1984
- 1984-09-11 JP JP59189893A patent/JPS6167934A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6246543A (ja) * | 1985-08-23 | 1987-02-28 | Nec Corp | 半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0354860B2 (OSRAM) | 1991-08-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH02156552A (ja) | 半導体装置およびその製造方法 | |
| JPH01290236A (ja) | 幅の広いトレンチを平坦化する方法 | |
| JPH0551174B2 (OSRAM) | ||
| JPS6167934A (ja) | 溝埋込分離の形成方法 | |
| JPS61264736A (ja) | 半導体集積回路装置の製造方法 | |
| JPH0653334A (ja) | 半導体装置の製造方法 | |
| JPS6254427A (ja) | 半導体装置の製造方法 | |
| JP2570729B2 (ja) | 半導体装置の製造方法 | |
| JPH02292824A (ja) | 半導体装置の製造方法 | |
| JPH03248429A (ja) | 半導体装置の製造方法 | |
| JPS63296353A (ja) | コンタクトホ−ル形成方法 | |
| EP0146613A1 (en) | PROCESS FOR MANUFACTURING SEMICONDUCTOR STRUCTURES. | |
| JPH0587973B2 (OSRAM) | ||
| JPH08236621A (ja) | 半導体装置の製造方法 | |
| JP2712450B2 (ja) | 半導体装置の製造方法 | |
| JPH038338A (ja) | 多層配線構造の製造方法 | |
| JPS61259540A (ja) | 多層配線の製造方法 | |
| JPH0416019B2 (OSRAM) | ||
| JPH0220141B2 (OSRAM) | ||
| JPS61154143A (ja) | 半導体装置の製造方法 | |
| JPH0148652B2 (OSRAM) | ||
| JPH01206645A (ja) | 半導体装置の製造方法 | |
| JPS60226141A (ja) | 半導体装置の製造方法 | |
| JPS6367747A (ja) | 半導体装置の素子分離方法 | |
| JPH0246747A (ja) | 多層配線の形成方法 |