JPS6160426B2 - - Google Patents
Info
- Publication number
- JPS6160426B2 JPS6160426B2 JP11549885A JP11549885A JPS6160426B2 JP S6160426 B2 JPS6160426 B2 JP S6160426B2 JP 11549885 A JP11549885 A JP 11549885A JP 11549885 A JP11549885 A JP 11549885A JP S6160426 B2 JPS6160426 B2 JP S6160426B2
- Authority
- JP
- Japan
- Prior art keywords
- plating layer
- photoresist
- mask
- model
- patterns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 54
- 229920002120 photoresistant polymer Polymers 0.000 claims description 26
- 229910052751 metal Inorganic materials 0.000 claims description 24
- 239000002184 metal Substances 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 9
- 238000002844 melting Methods 0.000 claims description 6
- 230000008018 melting Effects 0.000 claims description 6
- 238000002679 ablation Methods 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 claims description 2
- 238000004381 surface treatment Methods 0.000 claims description 2
- 230000003064 anti-oxidating effect Effects 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000003466 welding Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000001259 photo etching Methods 0.000 description 8
- 238000005323 electroforming Methods 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- 239000000839 emulsion Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/88—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by photographic processes for production of originals simulating relief
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60115498A JPS612156A (ja) | 1985-05-30 | 1985-05-30 | フオトフアブリケーシヨン用マスクの製作方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60115498A JPS612156A (ja) | 1985-05-30 | 1985-05-30 | フオトフアブリケーシヨン用マスクの製作方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9949077A Division JPS5433671A (en) | 1977-08-22 | 1977-08-22 | Method of producing mask for photofabrication |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS612156A JPS612156A (ja) | 1986-01-08 |
| JPS6160426B2 true JPS6160426B2 (enrdf_load_stackoverflow) | 1986-12-20 |
Family
ID=14663996
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60115498A Granted JPS612156A (ja) | 1985-05-30 | 1985-05-30 | フオトフアブリケーシヨン用マスクの製作方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS612156A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0648144U (ja) * | 1992-12-04 | 1994-06-28 | サンクス株式会社 | 光電スイッチ |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5153084A (en) * | 1990-09-10 | 1992-10-06 | General Electric Company | Process for preparing a photo-mask for imaging three-dimensional objects |
-
1985
- 1985-05-30 JP JP60115498A patent/JPS612156A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0648144U (ja) * | 1992-12-04 | 1994-06-28 | サンクス株式会社 | 光電スイッチ |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS612156A (ja) | 1986-01-08 |
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