JPS6156507B2 - - Google Patents
Info
- Publication number
- JPS6156507B2 JPS6156507B2 JP53144249A JP14424978A JPS6156507B2 JP S6156507 B2 JPS6156507 B2 JP S6156507B2 JP 53144249 A JP53144249 A JP 53144249A JP 14424978 A JP14424978 A JP 14424978A JP S6156507 B2 JPS6156507 B2 JP S6156507B2
- Authority
- JP
- Japan
- Prior art keywords
- protective film
- layer
- photosensitive
- silicone rubber
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14424978A JPS5570846A (en) | 1978-11-24 | 1978-11-24 | Treating method of lithographic material not requiring dampening water |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14424978A JPS5570846A (en) | 1978-11-24 | 1978-11-24 | Treating method of lithographic material not requiring dampening water |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5570846A JPS5570846A (en) | 1980-05-28 |
JPS6156507B2 true JPS6156507B2 (en, 2012) | 1986-12-02 |
Family
ID=15357699
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14424978A Granted JPS5570846A (en) | 1978-11-24 | 1978-11-24 | Treating method of lithographic material not requiring dampening water |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5570846A (en, 2012) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5825635A (ja) * | 1981-08-10 | 1983-02-15 | Toray Ind Inc | 水なし平版印刷原板 |
JPS5952696A (ja) * | 1982-09-20 | 1984-03-27 | Toray Ind Inc | 湿し水不要平版印刷原版の製造方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS564908B2 (en, 2012) * | 1972-03-21 | 1981-02-02 | ||
US4081282A (en) * | 1975-11-03 | 1978-03-28 | Seal Incorporated | Dry transfer image systems with non-light sensitive frangible layer |
JPS5945973B2 (ja) * | 1976-05-06 | 1984-11-09 | 富士写真フイルム株式会社 | 感光性平版印刷版材料 |
-
1978
- 1978-11-24 JP JP14424978A patent/JPS5570846A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5570846A (en) | 1980-05-28 |
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