JPS6150377B2 - - Google Patents
Info
- Publication number
- JPS6150377B2 JPS6150377B2 JP54153418A JP15341879A JPS6150377B2 JP S6150377 B2 JPS6150377 B2 JP S6150377B2 JP 54153418 A JP54153418 A JP 54153418A JP 15341879 A JP15341879 A JP 15341879A JP S6150377 B2 JPS6150377 B2 JP S6150377B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- resist
- ultraviolet rays
- pattern
- irradiated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 12
- 229920005989 resin Polymers 0.000 claims description 5
- 239000011347 resin Substances 0.000 claims description 5
- QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical compound [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 claims description 4
- 229920003986 novolac Polymers 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 3
- 150000002989 phenols Chemical class 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 206010047571 Visual impairment Diseases 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/7045—Hybrid exposures, i.e. multiple exposures of the same area using different types of exposure apparatus, e.g. combining projection, proximity, direct write, interferometric, UV, x-ray or particle beam
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15341879A JPS5676530A (en) | 1979-11-27 | 1979-11-27 | Exposure of resist |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15341879A JPS5676530A (en) | 1979-11-27 | 1979-11-27 | Exposure of resist |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5676530A JPS5676530A (en) | 1981-06-24 |
| JPS6150377B2 true JPS6150377B2 (it) | 1986-11-04 |
Family
ID=15562059
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15341879A Granted JPS5676530A (en) | 1979-11-27 | 1979-11-27 | Exposure of resist |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5676530A (it) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0514621Y2 (it) * | 1987-01-30 | 1993-04-19 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5710390U (it) * | 1980-06-20 | 1982-01-19 | ||
| JPS5766633A (en) * | 1980-10-13 | 1982-04-22 | Oki Electric Ind Co Ltd | Pattern formation of fine processing resist |
| JPS5839015A (ja) * | 1981-09-01 | 1983-03-07 | Pioneer Electronic Corp | 半導体装置の製造方法 |
| JPS59141230A (ja) * | 1983-02-02 | 1984-08-13 | Mitsubishi Electric Corp | パタ−ン形成方法 |
| JPS6010624A (ja) * | 1983-06-29 | 1985-01-19 | Mitsubishi Electric Corp | パタ−ン形成方法 |
-
1979
- 1979-11-27 JP JP15341879A patent/JPS5676530A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0514621Y2 (it) * | 1987-01-30 | 1993-04-19 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5676530A (en) | 1981-06-24 |
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