JPS5766633A - Pattern formation of fine processing resist - Google Patents

Pattern formation of fine processing resist

Info

Publication number
JPS5766633A
JPS5766633A JP55142020A JP14202080A JPS5766633A JP S5766633 A JPS5766633 A JP S5766633A JP 55142020 A JP55142020 A JP 55142020A JP 14202080 A JP14202080 A JP 14202080A JP S5766633 A JPS5766633 A JP S5766633A
Authority
JP
Japan
Prior art keywords
substrate
electron beams
resist
ultraviolet rays
far ultraviolet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55142020A
Other languages
Japanese (ja)
Other versions
JPS6160574B2 (en
Inventor
Seigo Ono
Yoshio Yamashita
Mitsumasa Kunishi
Takaharu Kawazu
Kohei Sogo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP55142020A priority Critical patent/JPS5766633A/en
Publication of JPS5766633A publication Critical patent/JPS5766633A/en
Publication of JPS6160574B2 publication Critical patent/JPS6160574B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To improve sensitivity and resolution against electron beam by a method wherein a pattern is drawn by electron beams on a film on the substrate of a resist component becoming negative type by electron beams and positive type by far ultraviolet rays as well and development is performed under exposure of far ultraviolet rays at the substrate. CONSTITUTION:A film is formed on a substrate by using a resist compound, becoming negative type and positive type by irradiating electron beams and far ultraviolet rays respective at the substrate, for example, the copolymer of ester methacrylate having polyglycidyl methacrylate or glycidyl methacrylate and the residue of C1-C4. Next, a pattern is drawn on the substance by using electron beams and far ultravoilet rays are collectively irradiated at the substrate. After that, development is performed by acetone methanol solution. In this way, the rising part of a resist shirt section forms remarkably sharp and the dimension accuracy of line and space become excellent.
JP55142020A 1980-10-13 1980-10-13 Pattern formation of fine processing resist Granted JPS5766633A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55142020A JPS5766633A (en) 1980-10-13 1980-10-13 Pattern formation of fine processing resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55142020A JPS5766633A (en) 1980-10-13 1980-10-13 Pattern formation of fine processing resist

Publications (2)

Publication Number Publication Date
JPS5766633A true JPS5766633A (en) 1982-04-22
JPS6160574B2 JPS6160574B2 (en) 1986-12-22

Family

ID=15305495

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55142020A Granted JPS5766633A (en) 1980-10-13 1980-10-13 Pattern formation of fine processing resist

Country Status (1)

Country Link
JP (1) JPS5766633A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6143473A (en) * 1998-05-20 2000-11-07 Fujitsu Limited Film patterning method utilizing post-development residue remover

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51140345A (en) * 1975-05-29 1976-12-03 Toku Tamaoki Method of feeding water to flushing water tank for stall urinal
JPS5676530A (en) * 1979-11-27 1981-06-24 Fujitsu Ltd Exposure of resist
JPS56164531A (en) * 1980-05-21 1981-12-17 Hitachi Ltd Manufacture of semiconductor
JPS5912522A (en) * 1982-04-05 1984-01-23 ワイ・エス・セキユリテイ−ズ・リミテツド Electric switchgear

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51140345A (en) * 1975-05-29 1976-12-03 Toku Tamaoki Method of feeding water to flushing water tank for stall urinal
JPS5676530A (en) * 1979-11-27 1981-06-24 Fujitsu Ltd Exposure of resist
JPS56164531A (en) * 1980-05-21 1981-12-17 Hitachi Ltd Manufacture of semiconductor
JPS5912522A (en) * 1982-04-05 1984-01-23 ワイ・エス・セキユリテイ−ズ・リミテツド Electric switchgear

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6143473A (en) * 1998-05-20 2000-11-07 Fujitsu Limited Film patterning method utilizing post-development residue remover

Also Published As

Publication number Publication date
JPS6160574B2 (en) 1986-12-22

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