JPS6147915A - 反射光学系 - Google Patents
反射光学系Info
- Publication number
- JPS6147915A JPS6147915A JP59169640A JP16964084A JPS6147915A JP S6147915 A JPS6147915 A JP S6147915A JP 59169640 A JP59169640 A JP 59169640A JP 16964084 A JP16964084 A JP 16964084A JP S6147915 A JPS6147915 A JP S6147915A
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- optical system
- concave
- relay
- systems
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lenses (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59169640A JPS6147915A (ja) | 1984-08-14 | 1984-08-14 | 反射光学系 |
US06/764,001 US4701035A (en) | 1984-08-14 | 1985-08-09 | Reflection optical system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59169640A JPS6147915A (ja) | 1984-08-14 | 1984-08-14 | 反射光学系 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6147915A true JPS6147915A (ja) | 1986-03-08 |
JPH0525087B2 JPH0525087B2 (enrdf_load_stackoverflow) | 1993-04-09 |
Family
ID=15890235
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59169640A Granted JPS6147915A (ja) | 1984-08-14 | 1984-08-14 | 反射光学系 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6147915A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6318626A (ja) * | 1986-07-11 | 1988-01-26 | Canon Inc | 投影露光装置 |
US5071240A (en) * | 1989-09-14 | 1991-12-10 | Nikon Corporation | Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image |
JPH04234722A (ja) * | 1990-08-28 | 1992-08-24 | Internatl Business Mach Corp <Ibm> | 補償型光学システム |
WO2006087978A1 (ja) * | 2005-02-15 | 2006-08-24 | Nikon Corporation | 投影光学系、露光装置、およびデバイスの製造方法 |
-
1984
- 1984-08-14 JP JP59169640A patent/JPS6147915A/ja active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6318626A (ja) * | 1986-07-11 | 1988-01-26 | Canon Inc | 投影露光装置 |
US5071240A (en) * | 1989-09-14 | 1991-12-10 | Nikon Corporation | Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image |
JPH04234722A (ja) * | 1990-08-28 | 1992-08-24 | Internatl Business Mach Corp <Ibm> | 補償型光学システム |
WO2006087978A1 (ja) * | 2005-02-15 | 2006-08-24 | Nikon Corporation | 投影光学系、露光装置、およびデバイスの製造方法 |
EP1860477A4 (en) * | 2005-02-15 | 2008-08-20 | Nikon Corp | OPTICAL PROJECTION SYSTEM, EXPOSURE EQUIPMENT, AND DEVICE MANUFACTURING METHOD |
JP5201526B2 (ja) * | 2005-02-15 | 2013-06-05 | 株式会社ニコン | 投影光学系、露光装置、およびデバイスの製造方法 |
KR101332494B1 (ko) * | 2005-02-15 | 2013-11-26 | 가부시키가이샤 니콘 | 투영 광학계, 노광 장치 및 디바이스의 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
JPH0525087B2 (enrdf_load_stackoverflow) | 1993-04-09 |
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