JPH0525088B2 - - Google Patents
Info
- Publication number
- JPH0525088B2 JPH0525088B2 JP59246533A JP24653384A JPH0525088B2 JP H0525088 B2 JPH0525088 B2 JP H0525088B2 JP 59246533 A JP59246533 A JP 59246533A JP 24653384 A JP24653384 A JP 24653384A JP H0525088 B2 JPH0525088 B2 JP H0525088B2
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- systems
- optical axis
- lens group
- magnification
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59246533A JPS61123812A (ja) | 1984-11-20 | 1984-11-20 | 反射光学系 |
US06/764,001 US4701035A (en) | 1984-08-14 | 1985-08-09 | Reflection optical system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59246533A JPS61123812A (ja) | 1984-11-20 | 1984-11-20 | 反射光学系 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61123812A JPS61123812A (ja) | 1986-06-11 |
JPH0525088B2 true JPH0525088B2 (enrdf_load_stackoverflow) | 1993-04-09 |
Family
ID=17149821
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59246533A Granted JPS61123812A (ja) | 1984-08-14 | 1984-11-20 | 反射光学系 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61123812A (enrdf_load_stackoverflow) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2603225B2 (ja) * | 1986-07-11 | 1997-04-23 | キヤノン株式会社 | X線投影露光装置及び半導体製造方法 |
US5071240A (en) * | 1989-09-14 | 1991-12-10 | Nikon Corporation | Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image |
JPH07147230A (ja) * | 1994-08-04 | 1995-06-06 | Canon Inc | 縮小投影露光装置および半導体製造方法 |
EP1856578B1 (en) * | 2005-03-08 | 2010-05-19 | Carl Zeiss SMT AG | Microlithography projection system with an accessible diaphragm or aperture stop |
JP4922254B2 (ja) * | 2008-06-30 | 2012-04-25 | 本田技研工業株式会社 | エンジンの潤滑構造 |
-
1984
- 1984-11-20 JP JP59246533A patent/JPS61123812A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61123812A (ja) | 1986-06-11 |
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