JPS61123812A - 反射光学系 - Google Patents

反射光学系

Info

Publication number
JPS61123812A
JPS61123812A JP59246533A JP24653384A JPS61123812A JP S61123812 A JPS61123812 A JP S61123812A JP 59246533 A JP59246533 A JP 59246533A JP 24653384 A JP24653384 A JP 24653384A JP S61123812 A JPS61123812 A JP S61123812A
Authority
JP
Japan
Prior art keywords
mirror
reflective optical
optical system
optical axis
systems
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59246533A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0525088B2 (enrdf_load_stackoverflow
Inventor
Takamasa Hirose
広瀬　隆昌
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59246533A priority Critical patent/JPS61123812A/ja
Priority to US06/764,001 priority patent/US4701035A/en
Publication of JPS61123812A publication Critical patent/JPS61123812A/ja
Publication of JPH0525088B2 publication Critical patent/JPH0525088B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59246533A 1984-08-14 1984-11-20 反射光学系 Granted JPS61123812A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59246533A JPS61123812A (ja) 1984-11-20 1984-11-20 反射光学系
US06/764,001 US4701035A (en) 1984-08-14 1985-08-09 Reflection optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59246533A JPS61123812A (ja) 1984-11-20 1984-11-20 反射光学系

Publications (2)

Publication Number Publication Date
JPS61123812A true JPS61123812A (ja) 1986-06-11
JPH0525088B2 JPH0525088B2 (enrdf_load_stackoverflow) 1993-04-09

Family

ID=17149821

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59246533A Granted JPS61123812A (ja) 1984-08-14 1984-11-20 反射光学系

Country Status (1)

Country Link
JP (1) JPS61123812A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6318626A (ja) * 1986-07-11 1988-01-26 Canon Inc 投影露光装置
US5071240A (en) * 1989-09-14 1991-12-10 Nikon Corporation Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image
JPH07147230A (ja) * 1994-08-04 1995-06-06 Canon Inc 縮小投影露光装置および半導体製造方法
JP2010007624A (ja) * 2008-06-30 2010-01-14 Honda Motor Co Ltd エンジンの潤滑構造
JP2012212910A (ja) * 2005-03-08 2012-11-01 Carl Zeiss Smt Gmbh 取扱い可能な絞り又は開口絞りを備えたマイクロリソグラフィー投影光学系

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6318626A (ja) * 1986-07-11 1988-01-26 Canon Inc 投影露光装置
US5071240A (en) * 1989-09-14 1991-12-10 Nikon Corporation Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image
JPH07147230A (ja) * 1994-08-04 1995-06-06 Canon Inc 縮小投影露光装置および半導体製造方法
JP2012212910A (ja) * 2005-03-08 2012-11-01 Carl Zeiss Smt Gmbh 取扱い可能な絞り又は開口絞りを備えたマイクロリソグラフィー投影光学系
US9146472B2 (en) 2005-03-08 2015-09-29 Carl Zeiss Smt Gmbh Microlithography projection system with an accessible diaphragm or aperture stop
JP2010007624A (ja) * 2008-06-30 2010-01-14 Honda Motor Co Ltd エンジンの潤滑構造

Also Published As

Publication number Publication date
JPH0525088B2 (enrdf_load_stackoverflow) 1993-04-09

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