JPS6147915A - Reflecting optical system - Google Patents

Reflecting optical system

Info

Publication number
JPS6147915A
JPS6147915A JP59169640A JP16964084A JPS6147915A JP S6147915 A JPS6147915 A JP S6147915A JP 59169640 A JP59169640 A JP 59169640A JP 16964084 A JP16964084 A JP 16964084A JP S6147915 A JPS6147915 A JP S6147915A
Authority
JP
Japan
Prior art keywords
mirror
optical system
concave
relay
systems
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59169640A
Other languages
Japanese (ja)
Other versions
JPH0525087B2 (en
Inventor
Takamasa Hirose
広瀬 隆昌
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59169640A priority Critical patent/JPS6147915A/en
Priority to US06/764,001 priority patent/US4701035A/en
Publication of JPS6147915A publication Critical patent/JPS6147915A/en
Publication of JPH0525087B2 publication Critical patent/JPH0525087B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70233Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

Abstract

PURPOSE:To obtain a reflecting optical system having high resolution, which is suitable for a projecting exposure device, by combining appropriately three mirror systems and one relay system, and constituting them so that the overall image forming magnification is reduced. CONSTITUTION:The first mirror system S1, the second mirror system S2, a relay system F, and the third mirror system S3 are constituted of reflecting mirrors M1-M3, reflecting mirrors M4-M6, reflecting mirrors M7-M8, and reflecting mirrors M9-M11, respectively, and an object point P1 is made to form an image at an image point P'4 (P5) in the end so that the image forming magnification becomes about 1/4.5. In this way, by constituting the mirror systems S1, S2 and S3 of a concave mirror, a convex mirror, and a concave mirror, respectively, various aberrations generated from one mirror system are reduced and a good image forming performance is obtained as a whole. Especially, by using the mirror system S2 as a magnifying system, a comatic aberration, a curvature of image, distortion, etc. generated in the mirror systems S1, S3 and the relay system F are corrected satisfatorily, and also vignetting of a luminous flux generated in case of constituting a reflecting optical system of plural mirror systems is prevented by placing total reflecting mirrors H1, H2.

Description

【発明の詳細な説明】 本発明は反射光学系に関し、特にIC、LSI等の集積
回路を製造するときの投影露光装置に用いられる反射光
学系に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a reflective optical system, and more particularly to a reflective optical system used in a projection exposure apparatus for manufacturing integrated circuits such as ICs and LSIs.

従来より投影露光装置&11に用いIC、LSI等の集
積回路のパターンをシリコンウェハーに焼付ける為の反
射光学系が例えば特開昭48−12039号公報、特開
昭53−100230号公報等で提案されている。これ
らの投影露光装置に用いられている反射光学系は非常に
高い解像力を有している。
Conventionally, a reflective optical system used in projection exposure equipment &11 for printing patterns of integrated circuits such as ICs and LSIs onto silicon wafers has been proposed in, for example, Japanese Patent Application Laid-Open Nos. 48-12039 and 1982-100230. has been done. The reflective optical systems used in these projection exposure apparatuses have extremely high resolving power.

投影像の解株力は使用する波長が短かくなればなる程良
くなる。この為に、なるぺ〈短波長を放射する光源が用
いられている。
The shorter the wavelength used, the better the resolution of the projected image becomes. For this purpose, a light source that emits short wavelengths is used.

そして画面中心に限らず広い画面にわたシ高解像力が得
られるよう略冗全に収差補正がなされた光学系が用いら
れている。
In order to obtain high resolution not only in the center of the screen but also over a wide screen, an optical system is used that is almost completely corrected for aberrations.

一般にレンズを用いた結像光学系は色収差を補正する為
に複数のガラス材料を用いて構成されている。短波長側
の光は閤解像力を得るには有利でわるが瓜波長側では色
分散が大きい為設計上、色収差を良好に補正するのが困
難でらる◇この為に高解像力が要求されるICパターン
等の焼付用の結像光学系には反射鏡を用い次光学系が多
く用いられている。
Generally, an imaging optical system using a lens is constructed using a plurality of glass materials in order to correct chromatic aberration. Light on the short wavelength side is advantageous for obtaining high resolution, but on the long wavelength side, chromatic dispersion is large, so it is difficult to properly correct chromatic aberration due to the design ◇For this reason, high resolution is required. As an imaging optical system for printing IC patterns, etc., a secondary optical system using a reflecting mirror is often used.

これは反射光学系は色収差がなく、任意の波長の光を使
用することができ、かつ光学系全体の透過率をレンズ系
を用い九ときに比べて高めることができる等の特徴かめ
る為でらる。
This is because the reflective optical system has no chromatic aberration, can use light of any wavelength, and can increase the transmittance of the entire optical system compared to when using a lens system. Ru.

本発明は反射光学系の特徴を生かし九投影露光装置に好
適な高解像力の得られる反射光学系の提供を目的とする
〇 本発明の目的を達成する為の反射光学系の主光る特徴は
凹面鏡、凸面鏡そして凹面鏡の順に反射させるように構
成し几単−のミツ−系を複数個連鎖的に配置する際、前
記ミラー系間の少なくとも一箇所に物体像を中継する為
の複数の凹面gIAを有するリレー系を配置し、全体の
結像倍率が縮少となるように構成したことである。
The purpose of the present invention is to provide a reflective optical system that can obtain high resolution and is suitable for a nine-projection exposure apparatus by taking advantage of the characteristics of a reflective optical system.〇The main feature of the reflective optical system to achieve the object of the present invention is a concave mirror. When a plurality of mirror systems are arranged in a chain so as to be reflected in the order of a convex mirror and then a concave mirror, a plurality of concave surfaces gIA for relaying an object image are provided at at least one place between the mirror systems. The relay system is arranged so that the overall imaging magnification is reduced.

このように本発明は3つのミラー系と1つのリレー系で
構成し、リレー系をフィールド系的な作用をするように
構成し、全体的に小型でしかも良好に収差補正を行りt
反射光学系を達成して匹る。
In this way, the present invention is composed of three mirror systems and one relay system, and the relay system is configured to function like a field system.
Achieving a reflective optical system.

次に本発明の実施列を各図と共に説明する。Next, the implementation sequence of the present invention will be explained with reference to each figure.

第1図は本発明の一実施例の反射光学系の概略図でおる
。同図の反射光学系は第2図に示す3つの反射6Ail
i□ 、 M2.  M3 より成るミラー系S1を3
個と第3図に示す2つの反射!3! M3□。
FIG. 1 is a schematic diagram of a reflective optical system according to an embodiment of the present invention. The reflective optical system in the figure consists of three reflective 6Ails shown in Figure 2.
i□, M2. The mirror system S1 consisting of M3 is
and the two reflections shown in Figure 3! 3! M3□.

M3□より成るリレー系Ft−実質的に同一光軸上に位
置するように、かつ全体の結像倍率が縮少となるように
配置しkものでf5す、これにより高解像力の反射光学
系を達成してiる。
Relay system Ft consisting of M3□ is arranged so as to be located substantially on the same optical axis and the overall imaging magnification is reduced. I have achieved this.

第1図の実M列では反射鏡M□〜M3で第1のミラー系
S1、反射鏡M4〜M6で第2のミラー系S2、反射鏡
M7〜M8でリレー系Fそして反射@M9〜M1、で第
3のミラー系83を各々構成してiる。
In the actual M row in Fig. 1, the first mirror system S1 is made up of reflecting mirrors M□-M3, the second mirror system S2 is made up of reflecting mirrors M4-M6, the relay system F is made up of reflecting mirrors M7-M8, and the reflection @M9-M1. , respectively constitute the third mirror system 83.

そして物点P を順次ミラー系S1.82とリレー系F
そしてミラー系S3で各々結像を繰υ返し、最終的に像
点P’ (P5)に結像倍率17、.5  となるよう
に結f象させている。
Then, the object point P is sequentially transferred to the mirror system S1.82 and the relay system F.
Then, each image is formed repeatedly by the mirror system S3, and finally an image point P' (P5) is formed at an imaging magnification of 17, . It is visualized as 5.

次に第1図に示す反射光学系を構成しているミラー系の
結像状態を説明する。
Next, the image forming state of the mirror system constituting the reflective optical system shown in FIG. 1 will be explained.

第2図にしいて3つの反射鏡M1. M2゜M3  は
物点P工からの光束L工が凹面mM1、凸面鏡M2そし
て凹面鏡M3の順に反射しt後、像点P工′に結像する
ように配置されている。
In Fig. 2, there are three reflecting mirrors M1. M2°M3 are arranged so that the light beam L from the object point P is reflected by the concave surface mM1, the convex mirror M2, and the concave mirror M3 in this order, and after t, is imaged at the image point P'.

第2図に示すミラー系Sの凹面鏡M3は凸面鏡M2と凹
面鏡町との間に位置するよ5に配置されている。
The concave mirror M3 of the mirror system S shown in FIG. 2 is located between the convex mirror M2 and the concave mirror section.

第3図に示すリレー系Fの2つの凹面鏡は物点P工から
の光束を2つの凹面鏡M3□2M3□により像点P□′
に結像するように配置されている。
The two concave mirrors of the relay system F shown in Fig. 3 convert the light beam from the object point P into the image point P□' by the two concave mirrors M3□2M3□.
It is arranged so that the image is formed on the

本実施列においてIJ v−系Ffr:光学的に第2の
ミラー系S と第3のミラー系S3との開国配置しフィ
ールド作用をさせることくより第3のミラー系S3への
光束径を小さくして反射光学系の小型化を図っている。
In this embodiment, the IJ v-system Ffr: Optically, the second mirror system S and the third mirror system S3 are arranged in an open field, and the diameter of the light beam to the third mirror system S3 is made smaller without causing a field effect. The aim is to downsize the reflective optical system.

本実施列において物体は第4図に示すよりな円弧状の一
部分Q□を有効面としている。この為にミラー系の各反
射鏡の外形を必ずしも円形とする必要はなく不要の所は
削除して用いれば全体として反射光学系を小型にするこ
とができる。
In this embodiment, the object has a more circular arc-shaped portion Q□ shown in FIG. 4 as an effective surface. For this reason, the external shape of each reflecting mirror in the mirror system does not necessarily have to be circular, and by removing unnecessary portions, the overall reflecting optical system can be made smaller.

本実施列においてミラー系s、s2.s3を各々凹面鏡
、凸面鏡そして凹面鏡より成るすなわち正、負そして正
の屈折力より成る反射鏡により構成することにより1つ
のミラー系から発生する諸収差、特にコマ収差、像面湾
曲を少なくして全体的に良好なる結像性能を得ている。
In this implementation, mirror systems s, s2. By configuring s3 with a concave mirror, a convex mirror, and a concave mirror, that is, a reflecting mirror with positive, negative, and positive refractive powers, various aberrations generated from one mirror system, especially coma aberration and field curvature, can be reduced and the overall effect can be improved. It has achieved good imaging performance.

このように本実施例では第1図に示すようにミラー系S
 により物点pt−像点P工′へ、すなわちミラー系S
 の物点P2へ、ミラー系SKより物点P を像点P2
′へすなわちリレ一系Fの物点P3へ以下同様にリレー
系Fそしてミラー系83により順次結像を繰り返して最
終的に物点Plt像点P4′へ縮少させて結像させてい
る。
In this embodiment, as shown in FIG.
to the object point pt - image point P', that is, the mirror system S
from the mirror system SK to the object point P2 of the image point P2.
In other words, the object point P3 of the relay system F is successively imaged by the relay system F and the mirror system 83, and finally the object point Plt is reduced to an image point P4'.

本実施例ではミラー系S、S4とリレー系Pi縮少系と
し、ミラー系52t−拡大系として構成している。
In this embodiment, the mirror systems S, S4 and the relay system Pi are reduced, and the mirror system 52t is configured as an enlarged system.

具体的に各ミラー系及びリレー系の結像倍率を示すと表
−1の如くでらる。
Specifically, the imaging magnification of each mirror system and relay system is shown in Table 1.

表−1各ミラー系の結像倍率 本実施列では全体として結像倍率ワ4.5 を達成する
のに3つのミラー系と1つのリレー系を表−1に示すよ
うな結像倍it有するように構成することKより全体的
に収差補正をバランス良く行っている。
Table-1 Imaging magnification of each mirror system In this implementation, three mirror systems and one relay system have the imaging magnification shown in Table-1 to achieve an overall imaging magnification of 4.5. With this configuration, aberration correction is performed in a better balanced manner overall.

特にミラー系S2を拡大系とすることによりミラー系8
184とリレー系Fで生じ次コマ収差、像面湾曲及び歪
曲収差等を良好に補正している。
In particular, by making the mirror system S2 an enlarged system, the mirror system 8
184 and the relay system F, the order comatic aberration, field curvature, distortion, etc. are well corrected.

本実施列では複数のミラー系で反射光学系を構成する場
合に生じる光束のケラVを第2のミラー系S2とリレー
系Fとの間と、第3のミラー系S3の後方に全反射鏡)
(、、H2t−配置して防止している。
In this implementation, a total reflection mirror is used between the second mirror system S2 and the relay system F and behind the third mirror system S3 to eliminate the vignetting V of the light flux that occurs when a reflective optical system is configured with a plurality of mirror systems. )
(,, H2t- is placed and prevented.

本実施列において%に光束のクランを少なくしかつ全体
的に良好なる光学性能を得る為にはミラー系Sエ 、S
3を構成する凹面鏡M工、凸面/a、M2そして凹面鏡
M3の曲率半径を各々R工、 R2,R3とするとき R□/R2≧2       ・・・・・−・・(1)
R□/R3〉l       ・・・・・・・・・(2
)なる諸条件を満足させるのが好ましい。
In this implementation, in order to reduce the clamping of the luminous flux by % and obtain good overall optical performance, the mirror systems S, S
When the radii of curvature of the concave mirror M, convex /a, M2, and concave mirror M3 constituting 3 are R, R2, and R3, respectively, R□/R2≧2... (1)
R□/R3〉l ・・・・・・・・・(2
) It is preferable to satisfy the following conditions.

条件式111 、 +21は物体の有効画面が第4図に
示すように円弧状の一部分でらるとき、軸外収差の発生
を押えつつ、ミラー系全体の小製化を図りかつ物体から
の光束がクランることなく所定位置に結像させる為のも
のである。
Conditional expressions 111 and +21 are such that when the effective screen of the object is a part of a circular arc as shown in FIG. This is to allow the image to be formed at a predetermined position without having to be moved.

条件式(11t−外れるとコマフレアーが増大し又光束
のクランが多くなってくる。又条件式(21t−外れる
と凹面鏡M3の曲率半径が凹面鏡M工に比べ大きくなり
すぎミラー系全体としての小型化を図りつつ所定の屈折
力を得るのが困難となってくる。
If conditional expression (11t) is off, the coma flare will increase and the number of clans in the luminous flux will increase.Also, if conditional expression (21t) is off, the radius of curvature of concave mirror M3 will be too large compared to concave mirror M, making the mirror system as a whole smaller. It becomes difficult to obtain a predetermined refractive power while trying to achieve the desired refractive power.

特に本実施列において像面湾曲を少なくし高コントラス
トの物体像を得るKは前記ミラー系S工、S3における
3つの反射鏡の曲率半径R□。
In particular, in this embodiment, K to reduce field curvature and obtain a high-contrast object image is the radius of curvature R□ of the three reflecting mirrors in the mirror system S and S3.

R2,R3を更K IR,I > lR31> lR21・・・・・・・・
・(3)とすることである。
Change R2 and R3 K IR, I > lR31 > lR21・・・・・・・・・
- (3).

仁の条件を外れると像面湾曲が大きくなり光束のクラン
が大きくなってくると共に複数のミラー系を組み合わせ
九反射光学系において良好なる収差補正を行うのが困難
となる。
If the condition is not met, the curvature of field becomes large, the clump of the light beam becomes large, and it becomes difficult to perform good aberration correction in a nine-reflection optical system by combining a plurality of mirror systems.

又本実施列において光束のクランを少なくしミラー系の
小型化を図る為に好ましくは前記ミラー系S2の凹面鏡
M工、凸面鏡M2そして凹面鏡M の曲率半径を各りR
工/ 、  R2′、 a3′とするとき なる条件を満足することである。
In addition, in this embodiment, in order to reduce the clamping of the luminous flux and to downsize the mirror system, it is preferable that the radius of curvature of the concave mirror M, the convex mirror M2, and the concave mirror M of the mirror system S2 is set to R.
It is necessary to satisfy the following conditions when R2', R2', and a3' are set.

この条件を外れるとミラー系S□により結像された物体
像を光束のクランをなくした状態でリレー系Fの物点に
結像させるのが困難となる。
If this condition is not met, it will be difficult to focus the object image formed by the mirror system S□ on the object point of the relay system F without the clamp of the light beam.

そしてフィールド系として用いるリレー系F1ミラー系
S2からの光束を効率的に収斂して第3のミラー系S3
の物点く結像させる為には前記リレー系Fの凹面鏡1v
ll、M  の曲率半径を各々R、Rとするとき IR3□7R3□l (1°−曲(5)なる条件を満足
することが好ましい。
Then, the light flux from the relay system F1 mirror system S2 used as a field system is efficiently converged and transferred to the third mirror system S3.
In order to form a sharp image of the object, the concave mirror 1v of the relay system F is
When the radii of curvature of ll and M are R and R, respectively, it is preferable to satisfy the condition IR3□7R3□l (1°-curvature (5)).

この条件を外れるとフィールド系としての作用が十分で
なくな9ミラー系S3ヲ小型化にすS工〜S3そしてリ
レー系の少なくとも1つのミラー系を移動させて行うの
が収差補正及び倍率調整上好ましい。
If this condition is exceeded, the action as a field system will not be sufficient, and it is necessary to downsize the 9-mirror system S3 and move at least one mirror system of the relay system to correct aberrations and adjust magnification. preferable.

次に第1図に示す実施列のi)&数値を示す。Next, the i) & numerical values of the implementation column shown in FIG. 1 are shown.

Ri  は物点P□から数えて第1番目の反射鏡の曲率
半径、Dは各反射鏡との間隔で光の進行方向に沿って左
方から右方に到ったときを正、その逆を負として示す。
Ri is the radius of curvature of the first reflecting mirror counting from the object point P□, and D is the distance between each reflecting mirror, which is the positive value when it reaches from the left to the right along the direction of light travel, and vice versa. is shown as negative.

物体の有効画面はスリット幅で2mNmN有効ノナンバ
ー3(NA−α15)である。物点P0  の有効画面
幅は光軸からの高さ218〜220w0範囲内である。
The effective screen of the object is 2 mNmN effective number 3 (NA-α15) in slit width. The effective screen width of the object point P0 is within the height range of 218 to 220w0 from the optical axis.

R(D) 2−14α5   270 3 −385.  −1010 5  439.67  −280 6  44&68   580 ?  −42L3B   −292,58101L5 
   625 1G  −167,58310 11−449,79 以上のように本発明によれば4つのミラー系を適切に組
み合わせることKより、高解像力の反射光学系を達成す
ることができろ。
R(D) 2-14α5 270 3 -385. -1010 5 439.67 -280 6 44&68 580? -42L3B -292,58101L5
625 1G-167,58310 11-449,79 As described above, according to the present invention, a reflective optical system with high resolution can be achieved by appropriately combining four mirror systems.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例の光学系の概略図、第2図、
第3図は第1図の一部分の説明図、第4図は本発明に係
る物体の有効画面の説明図、第5図は第1図の光学系の
諸収差図である。 図中Yは物置、S −83は各々ミラー系、Fはリレー
系、M□〜M□□は各々反射鏡を示す。
FIG. 1 is a schematic diagram of an optical system according to an embodiment of the present invention, FIG.
3 is an explanatory diagram of a part of FIG. 1, FIG. 4 is an explanatory diagram of an effective screen of an object according to the present invention, and FIG. 5 is a diagram of various aberrations of the optical system of FIG. 1. In the figure, Y indicates a storeroom, S-83 indicates a mirror system, F indicates a relay system, and M□ to M□□ each indicate a reflecting mirror.

Claims (5)

【特許請求の範囲】[Claims] (1)凹面鏡、凸面鏡そして凹面鏡の順に反射させるよ
うに構成した単一のミラー系を複数個連鎖的に配置する
際、前記ミラー系間の少なくとも一箇所に物体像を中継
する為の複数の凹面鏡を有するリレー系を配置し、全体
の結像倍率が縮少となるように構成したことを特徴とす
る反射光学系。
(1) When a plurality of single mirror systems configured to reflect in the order of a concave mirror, a convex mirror, and a concave mirror are arranged in a chain, a plurality of concave mirrors are used to relay an object image to at least one location between the mirror systems. 1. A reflective optical system characterized in that a relay system having a relay system is arranged so that the overall imaging magnification is reduced.
(2)前記反射光学系を物体側より順に第1、第2のミ
ラー系S_1、S_2、前記リレー系F_1そして第3
のミラー系S_3より構成したことを特徴とする特許請
求の範囲第1項記載の反射光学系。
(2) The reflective optical system is arranged in order from the object side: the first mirror system, the second mirror system S_1, S_2, the relay system F_1, and the third mirror system.
The reflective optical system according to claim 1, characterized in that it is constituted by a mirror system S_3.
(3)前記ミラー系S_1、S_4の凹面鏡M_1、凸
面鏡M_2そして凹面鏡M_3の曲率半径を各々R_1
、R_2、R_3としたとき R_1/R_2≧2 R_1/R_3>1 なる条件を満足することを特徴とする特許請求の範囲第
2項記載の反射光学系。
(3) The radius of curvature of the concave mirror M_1, convex mirror M_2, and concave mirror M_3 of the mirror systems S_1 and S_4 is R_1, respectively.
, R_2, and R_3, the reflective optical system according to claim 2 satisfies the following conditions: R_1/R_2≧2 R_1/R_3>1.
(4)前記ミラー系S_2の凹面鏡M_1、凸面鏡M_
2そして凹面鏡M_3の曲率半径を各々R_1′、R_
2′、R_3′とするとき R_1′/R_2′>1 R_1′/R_3′>1 なる条件を満足することを特徴とする特許請求の範囲第
3項記載の反射光学系。
(4) Concave mirror M_1 and convex mirror M_ of the mirror system S_2
2, and the radius of curvature of concave mirror M_3 is R_1' and R_
2', R_3', the reflective optical system according to claim 3, which satisfies the following conditions: R_1'/R_2'>1 R_1'/R_3'>1.
(5)前記リレー系Fは2つの凹面鏡M_3_1、M_
3_2を有しており、前記凹面鏡M_3_1、M_3_
2の曲率半径を各々R_3_1、R_3_2とするとき |R_3_1/R_3_2|<1 なる条件を満足することを特徴とする特許請求の範囲第
4項記載の反射光学系。
(5) The relay system F has two concave mirrors M_3_1, M_
3_2, and the concave mirrors M_3_1, M_3_
5. The reflective optical system according to claim 4, wherein the reflective optical system satisfies the following condition: |R_3_1/R_3_2|<1, where the radii of curvature of R_3_1 and R_3_2 are R_3_1 and R_3_2, respectively.
JP59169640A 1984-08-14 1984-08-14 Reflecting optical system Granted JPS6147915A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59169640A JPS6147915A (en) 1984-08-14 1984-08-14 Reflecting optical system
US06/764,001 US4701035A (en) 1984-08-14 1985-08-09 Reflection optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59169640A JPS6147915A (en) 1984-08-14 1984-08-14 Reflecting optical system

Publications (2)

Publication Number Publication Date
JPS6147915A true JPS6147915A (en) 1986-03-08
JPH0525087B2 JPH0525087B2 (en) 1993-04-09

Family

ID=15890235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59169640A Granted JPS6147915A (en) 1984-08-14 1984-08-14 Reflecting optical system

Country Status (1)

Country Link
JP (1) JPS6147915A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6318626A (en) * 1986-07-11 1988-01-26 Canon Inc Projection and exposure apparatus
US5071240A (en) * 1989-09-14 1991-12-10 Nikon Corporation Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image
JPH04234722A (en) * 1990-08-28 1992-08-24 Internatl Business Mach Corp <Ibm> Compensation type optical system
WO2006087978A1 (en) * 2005-02-15 2006-08-24 Nikon Corporation Projection optical system, exposure equipment and device manufacturing method

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6318626A (en) * 1986-07-11 1988-01-26 Canon Inc Projection and exposure apparatus
US5071240A (en) * 1989-09-14 1991-12-10 Nikon Corporation Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image
JPH04234722A (en) * 1990-08-28 1992-08-24 Internatl Business Mach Corp <Ibm> Compensation type optical system
WO2006087978A1 (en) * 2005-02-15 2006-08-24 Nikon Corporation Projection optical system, exposure equipment and device manufacturing method
EP1860477A1 (en) * 2005-02-15 2007-11-28 Nikon Corporation Projection optical system, exposure equipment and device manufacturing method
EP1860477A4 (en) * 2005-02-15 2008-08-20 Nikon Corp Projection optical system, exposure equipment and device manufacturing method
JP5201526B2 (en) * 2005-02-15 2013-06-05 株式会社ニコン Projection optical system, exposure apparatus, and device manufacturing method
KR101332494B1 (en) * 2005-02-15 2013-11-26 가부시키가이샤 니콘 Projection optical system, exposure equipment and device manufacturing method

Also Published As

Publication number Publication date
JPH0525087B2 (en) 1993-04-09

Similar Documents

Publication Publication Date Title
JP3747951B2 (en) Catadioptric optics
JP3747958B2 (en) Catadioptric optics
US5071240A (en) Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image
EP0350955B1 (en) Optical reduction system
US4701035A (en) Reflection optical system
JP2801293B2 (en) Zoom lens
JPH0525170B2 (en)
JP2007532938A (en) Catadioptric projection objective
JPH103039A (en) Reflective/refractive optical system
JP6797087B2 (en) Projection optical system and projection type display device
JPS6093410A (en) Reflective optical system
JP6736366B2 (en) Imaging optical system, optical device, and image projection device
JPS612124A (en) Optical system for image formation
JP4066079B2 (en) Objective lens and optical apparatus using the same
EP0604093B1 (en) Catadioptric reduction projection optical system
JPS5832365B2 (en) zoom lens couch
JPS6147915A (en) Reflecting optical system
JP3812051B2 (en) Catadioptric projection optical system
JPS6147914A (en) Reflecting optical system
JPH06265789A (en) Reflection/refraction/projection optical system
JPS62210415A (en) Optical projection system for precise copying
JPS6147917A (en) Reflecting optical system
JPH0525088B2 (en)
JPH1010429A (en) Double image-formation optical system
JPH1010430A (en) Double image-formation optical system