JPS6147222B2 - - Google Patents

Info

Publication number
JPS6147222B2
JPS6147222B2 JP11862882A JP11862882A JPS6147222B2 JP S6147222 B2 JPS6147222 B2 JP S6147222B2 JP 11862882 A JP11862882 A JP 11862882A JP 11862882 A JP11862882 A JP 11862882A JP S6147222 B2 JPS6147222 B2 JP S6147222B2
Authority
JP
Japan
Prior art keywords
transfer
processed
carrier
transfer device
speed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11862882A
Other languages
English (en)
Japanese (ja)
Other versions
JPS599168A (ja
Inventor
Takashi Matsumoto
Kazuhisa Sawada
Takenobu Fuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP11862882A priority Critical patent/JPS599168A/ja
Publication of JPS599168A publication Critical patent/JPS599168A/ja
Publication of JPS6147222B2 publication Critical patent/JPS6147222B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP11862882A 1982-07-09 1982-07-09 連続真空処理装置用制御装置 Granted JPS599168A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11862882A JPS599168A (ja) 1982-07-09 1982-07-09 連続真空処理装置用制御装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11862882A JPS599168A (ja) 1982-07-09 1982-07-09 連続真空処理装置用制御装置

Publications (2)

Publication Number Publication Date
JPS599168A JPS599168A (ja) 1984-01-18
JPS6147222B2 true JPS6147222B2 (de) 1986-10-17

Family

ID=14741234

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11862882A Granted JPS599168A (ja) 1982-07-09 1982-07-09 連続真空処理装置用制御装置

Country Status (1)

Country Link
JP (1) JPS599168A (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3756402B2 (ja) * 2000-12-08 2006-03-15 富士写真フイルム株式会社 基板搬送装置及び方法
JP5856885B2 (ja) * 2012-03-26 2016-02-10 長州産業株式会社 成膜装置及び成膜装置用基板搬送装置

Also Published As

Publication number Publication date
JPS599168A (ja) 1984-01-18

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