JPS599168A - 連続真空処理装置用制御装置 - Google Patents

連続真空処理装置用制御装置

Info

Publication number
JPS599168A
JPS599168A JP11862882A JP11862882A JPS599168A JP S599168 A JPS599168 A JP S599168A JP 11862882 A JP11862882 A JP 11862882A JP 11862882 A JP11862882 A JP 11862882A JP S599168 A JPS599168 A JP S599168A
Authority
JP
Japan
Prior art keywords
transfer
transfer device
carrier
processed
speed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11862882A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6147222B2 (de
Inventor
Takashi Matsumoto
隆 松本
Kazuhisa Sawada
沢田　和久
Takenobu Fuda
附田　武信
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Nihon Shinku Gijutsu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc, Nihon Shinku Gijutsu KK filed Critical Ulvac Inc
Priority to JP11862882A priority Critical patent/JPS599168A/ja
Publication of JPS599168A publication Critical patent/JPS599168A/ja
Publication of JPS6147222B2 publication Critical patent/JPS6147222B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP11862882A 1982-07-09 1982-07-09 連続真空処理装置用制御装置 Granted JPS599168A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11862882A JPS599168A (ja) 1982-07-09 1982-07-09 連続真空処理装置用制御装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11862882A JPS599168A (ja) 1982-07-09 1982-07-09 連続真空処理装置用制御装置

Publications (2)

Publication Number Publication Date
JPS599168A true JPS599168A (ja) 1984-01-18
JPS6147222B2 JPS6147222B2 (de) 1986-10-17

Family

ID=14741234

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11862882A Granted JPS599168A (ja) 1982-07-09 1982-07-09 連続真空処理装置用制御装置

Country Status (1)

Country Link
JP (1) JPS599168A (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG107570A1 (en) * 2000-12-08 2004-12-29 Fuji Photo Film Co Ltd Substrate feeding device and method
JP2013199700A (ja) * 2012-03-26 2013-10-03 Choshu Industry Co Ltd 成膜装置並びに成膜装置用の基板搬送装置及び方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG107570A1 (en) * 2000-12-08 2004-12-29 Fuji Photo Film Co Ltd Substrate feeding device and method
JP2013199700A (ja) * 2012-03-26 2013-10-03 Choshu Industry Co Ltd 成膜装置並びに成膜装置用の基板搬送装置及び方法

Also Published As

Publication number Publication date
JPS6147222B2 (de) 1986-10-17

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