JPS6142421B2 - - Google Patents
Info
- Publication number
- JPS6142421B2 JPS6142421B2 JP57052403A JP5240382A JPS6142421B2 JP S6142421 B2 JPS6142421 B2 JP S6142421B2 JP 57052403 A JP57052403 A JP 57052403A JP 5240382 A JP5240382 A JP 5240382A JP S6142421 B2 JPS6142421 B2 JP S6142421B2
- Authority
- JP
- Japan
- Prior art keywords
- rotating body
- wafer
- plate
- seating portion
- rotating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10P72/78—
Landscapes
- Jigs For Machine Tools (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57052403A JPS58168253A (ja) | 1982-03-29 | 1982-03-29 | ウエハの回転保持具 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57052403A JPS58168253A (ja) | 1982-03-29 | 1982-03-29 | ウエハの回転保持具 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58168253A JPS58168253A (ja) | 1983-10-04 |
| JPS6142421B2 true JPS6142421B2 (enExample) | 1986-09-20 |
Family
ID=12913824
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57052403A Granted JPS58168253A (ja) | 1982-03-29 | 1982-03-29 | ウエハの回転保持具 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58168253A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2728766B2 (ja) * | 1990-07-18 | 1998-03-18 | 株式会社東芝 | 半導体の処理方法およびその装置 |
| JPH07110455B2 (ja) * | 1992-10-27 | 1995-11-29 | 住友電気工業株式会社 | ウェハ固定装置 |
-
1982
- 1982-03-29 JP JP57052403A patent/JPS58168253A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58168253A (ja) | 1983-10-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR0154610B1 (ko) | 반도체기판의 연마방법 및 연마장치 | |
| JP3312163B2 (ja) | 真空吸着装置 | |
| JPH04300673A (ja) | 回転式塗布装置及び回転式塗布方法 | |
| JPH0250197B2 (enExample) | ||
| JPS6142421B2 (enExample) | ||
| JP2004319885A (ja) | チャックテーブル及び半導体ウェーハの研削方法 | |
| JPH08153992A (ja) | 真空チャックの吸着プレート | |
| JPH0864568A (ja) | ウェーハ洗浄装置 | |
| JPS6218362Y2 (enExample) | ||
| JPH0512990B2 (enExample) | ||
| JPH09174364A (ja) | 半導体ウエハのユニバーサルチャックテーブル | |
| JPH09193010A (ja) | 半導体製造装置 | |
| JP2615317B2 (ja) | スピンナーチャック | |
| JPS6133831A (ja) | 真空吸着装置 | |
| JP3002368B2 (ja) | 回転カップ式液体供給装置 | |
| JPH11179264A (ja) | 回転塗布装置 | |
| JPS6130282Y2 (enExample) | ||
| JP2000246621A (ja) | ウエーハ研磨装置 | |
| JPS6244405B2 (enExample) | ||
| JPS634938B2 (enExample) | ||
| JPH0632673Y2 (ja) | レジスト塗布装置 | |
| JPH0710494Y2 (ja) | 基板エッチング装置 | |
| JPS5934142Y2 (ja) | ウエハチヤツク | |
| JPH0441977Y2 (enExample) | ||
| JPH04126566A (ja) | 回転塗布方法および回転塗布装置 |