JPS6139752B2 - - Google Patents
Info
- Publication number
- JPS6139752B2 JPS6139752B2 JP55163931A JP16393180A JPS6139752B2 JP S6139752 B2 JPS6139752 B2 JP S6139752B2 JP 55163931 A JP55163931 A JP 55163931A JP 16393180 A JP16393180 A JP 16393180A JP S6139752 B2 JPS6139752 B2 JP S6139752B2
- Authority
- JP
- Japan
- Prior art keywords
- gate
- erase
- insulating film
- memory cell
- floating gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 18
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 10
- 229920005591 polysilicon Polymers 0.000 claims description 10
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- 239000010408 film Substances 0.000 description 33
- 239000004020 conductor Substances 0.000 description 27
- 238000000034 method Methods 0.000 description 7
- 230000010354 integration Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000013500 data storage Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000002784 hot electron Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- PCTMTFRHKVHKIS-BMFZQQSSSA-N (1s,3r,4e,6e,8e,10e,12e,14e,16e,18s,19r,20r,21s,25r,27r,30r,31r,33s,35r,37s,38r)-3-[(2r,3s,4s,5s,6r)-4-amino-3,5-dihydroxy-6-methyloxan-2-yl]oxy-19,25,27,30,31,33,35,37-octahydroxy-18,20,21-trimethyl-23-oxo-22,39-dioxabicyclo[33.3.1]nonatriaconta-4,6,8,10 Chemical compound C1C=C2C[C@@H](OS(O)(=O)=O)CC[C@]2(C)[C@@H]2[C@@H]1[C@@H]1CC[C@H]([C@H](C)CCCC(C)C)[C@@]1(C)CC2.O[C@H]1[C@@H](N)[C@H](O)[C@@H](C)O[C@H]1O[C@H]1/C=C/C=C/C=C/C=C/C=C/C=C/C=C/[C@H](C)[C@@H](O)[C@@H](C)[C@H](C)OC(=O)C[C@H](O)C[C@H](O)CC[C@@H](O)[C@H](O)C[C@H](O)C[C@](O)(C[C@H](O)[C@H]2C(O)=O)O[C@H]2C1 PCTMTFRHKVHKIS-BMFZQQSSSA-N 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Semiconductor Memories (AREA)
- Non-Volatile Memory (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55163931A JPS5787163A (en) | 1980-11-20 | 1980-11-20 | Semiconductor memory storage |
| DE8181305349T DE3175125D1 (en) | 1980-11-20 | 1981-11-11 | Semiconductor memory device and method for manufacturing the same |
| EP81305349A EP0052982B1 (fr) | 1980-11-20 | 1981-11-11 | Dispositif semiconducteur à mémoire et procédé de fabrication |
| US06/321,322 US4803529A (en) | 1980-11-20 | 1981-11-13 | Electrically erasable and electrically programmable read only memory |
| US07/193,079 US4910565A (en) | 1980-11-20 | 1988-05-12 | Electrically erasable and electrically programmable read-only memory |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55163931A JPS5787163A (en) | 1980-11-20 | 1980-11-20 | Semiconductor memory storage |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5787163A JPS5787163A (en) | 1982-05-31 |
| JPS6139752B2 true JPS6139752B2 (fr) | 1986-09-05 |
Family
ID=15783540
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55163931A Granted JPS5787163A (en) | 1980-11-20 | 1980-11-20 | Semiconductor memory storage |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5787163A (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7907451B2 (en) | 2008-12-08 | 2011-03-15 | Empire Technology Development Llc | Semiconductor storage device and method of manufacturing same |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0644630B2 (ja) * | 1987-04-24 | 1994-06-08 | 株式会社東芝 | 不揮発性半導体メモリ |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52106275A (en) * | 1976-03-03 | 1977-09-06 | Nec Corp | Floating type nonvoltile semiconductor memory element |
| JPS5513901A (en) * | 1978-07-17 | 1980-01-31 | Hitachi Ltd | Fixed memory of semiconductor |
-
1980
- 1980-11-20 JP JP55163931A patent/JPS5787163A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52106275A (en) * | 1976-03-03 | 1977-09-06 | Nec Corp | Floating type nonvoltile semiconductor memory element |
| JPS5513901A (en) * | 1978-07-17 | 1980-01-31 | Hitachi Ltd | Fixed memory of semiconductor |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7907451B2 (en) | 2008-12-08 | 2011-03-15 | Empire Technology Development Llc | Semiconductor storage device and method of manufacturing same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5787163A (en) | 1982-05-31 |
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