JPS6137777B2 - - Google Patents

Info

Publication number
JPS6137777B2
JPS6137777B2 JP56086579A JP8657981A JPS6137777B2 JP S6137777 B2 JPS6137777 B2 JP S6137777B2 JP 56086579 A JP56086579 A JP 56086579A JP 8657981 A JP8657981 A JP 8657981A JP S6137777 B2 JPS6137777 B2 JP S6137777B2
Authority
JP
Japan
Prior art keywords
semiconductor device
semiconductor
under test
test
device under
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56086579A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57201042A (en
Inventor
Michio Honma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP56086579A priority Critical patent/JPS57201042A/ja
Publication of JPS57201042A publication Critical patent/JPS57201042A/ja
Publication of JPS6137777B2 publication Critical patent/JPS6137777B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices

Landscapes

  • Testing Of Individual Semiconductor Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP56086579A 1981-06-05 1981-06-05 Testing method for semiconductor wafer Granted JPS57201042A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56086579A JPS57201042A (en) 1981-06-05 1981-06-05 Testing method for semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56086579A JPS57201042A (en) 1981-06-05 1981-06-05 Testing method for semiconductor wafer

Publications (2)

Publication Number Publication Date
JPS57201042A JPS57201042A (en) 1982-12-09
JPS6137777B2 true JPS6137777B2 (https=) 1986-08-26

Family

ID=13890910

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56086579A Granted JPS57201042A (en) 1981-06-05 1981-06-05 Testing method for semiconductor wafer

Country Status (1)

Country Link
JP (1) JPS57201042A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0556731A (ja) * 1991-09-02 1993-03-09 Koichi Yamamoto ルアーの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5051267A (https=) * 1973-09-07 1975-05-08
JPS5649536A (en) * 1979-09-28 1981-05-06 Hitachi Ltd Semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0556731A (ja) * 1991-09-02 1993-03-09 Koichi Yamamoto ルアーの製造方法

Also Published As

Publication number Publication date
JPS57201042A (en) 1982-12-09

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