JPS613450A - 三次元光結合共有メモリ集積装置 - Google Patents
三次元光結合共有メモリ集積装置Info
- Publication number
- JPS613450A JPS613450A JP59123918A JP12391884A JPS613450A JP S613450 A JPS613450 A JP S613450A JP 59123918 A JP59123918 A JP 59123918A JP 12391884 A JP12391884 A JP 12391884A JP S613450 A JPS613450 A JP S613450A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- memory
- light
- integrated
- data
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000010354 integration Effects 0.000 title 1
- 230000003287 optical effect Effects 0.000 claims abstract description 24
- 239000004065 semiconductor Substances 0.000 claims abstract description 24
- 230000008878 coupling Effects 0.000 claims abstract description 17
- 238000010168 coupling process Methods 0.000 claims abstract description 17
- 238000005859 coupling reaction Methods 0.000 claims abstract description 17
- 239000003990 capacitor Substances 0.000 claims description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 7
- 238000000034 method Methods 0.000 abstract description 6
- 230000008054 signal transmission Effects 0.000 abstract description 6
- 238000009413 insulation Methods 0.000 abstract 5
- 229910052681 coesite Inorganic materials 0.000 abstract 3
- 229910052906 cristobalite Inorganic materials 0.000 abstract 3
- 239000000377 silicon dioxide Substances 0.000 abstract 3
- 235000012239 silicon dioxide Nutrition 0.000 abstract 3
- 229910052682 stishovite Inorganic materials 0.000 abstract 3
- 229910052905 tridymite Inorganic materials 0.000 abstract 3
- 238000010276 construction Methods 0.000 abstract 1
- 238000003475 lamination Methods 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 description 12
- 239000010703 silicon Substances 0.000 description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 11
- 239000000463 material Substances 0.000 description 9
- 230000010365 information processing Effects 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 238000003909 pattern recognition Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 244000025254 Cannabis sativa Species 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 210000004709 eyebrow Anatomy 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
- G11C11/4063—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing
- G11C11/407—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing for memory cells of the field-effect type
- G11C11/409—Read-write [R-W] circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
- G11C11/403—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh
- G11C11/404—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh with one charge-transfer gate, e.g. MOS transistor, per cell
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/42—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using opto-electronic devices, i.e. light-emitting and photoelectric devices electrically- or optically- coupled or feedback-coupled
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Semiconductor Memories (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Multi Processors (AREA)
- Memory System (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59123918A JPS613450A (ja) | 1984-06-18 | 1984-06-18 | 三次元光結合共有メモリ集積装置 |
| US06/702,139 US4672577A (en) | 1984-06-18 | 1985-02-15 | Three-dimensional integrated circuit with optically coupled shared memories |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59123918A JPS613450A (ja) | 1984-06-18 | 1984-06-18 | 三次元光結合共有メモリ集積装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS613450A true JPS613450A (ja) | 1986-01-09 |
| JPH0568105B2 JPH0568105B2 (enExample) | 1993-09-28 |
Family
ID=14872561
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59123918A Granted JPS613450A (ja) | 1984-06-18 | 1984-06-18 | 三次元光結合共有メモリ集積装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US4672577A (enExample) |
| JP (1) | JPS613450A (enExample) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01316872A (ja) * | 1988-06-17 | 1989-12-21 | Mitsubishi Electric Corp | 3次元デバイスを用いた正方行列乗算器 |
| JPH02232765A (ja) * | 1989-03-07 | 1990-09-14 | Agency Of Ind Science & Technol | 集積回路装置 |
| US6563163B1 (en) | 1999-05-18 | 2003-05-13 | Hiroshima University | Nonvolatile memory using deep level capture of carrier at corner structure of oxide film |
| US6874068B1 (en) | 1999-02-12 | 2005-03-29 | Hiroshima University | Shared memory |
| JP2008282108A (ja) * | 2007-05-08 | 2008-11-20 | Research Organization Of Information & Systems | 三次元集積電気回路の配線構造及びそのレイアウト方法 |
| JP2021064806A (ja) * | 2011-12-22 | 2021-04-22 | 株式会社半導体エネルギー研究所 | 半導体装置 |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0215679A (ja) * | 1988-07-04 | 1990-01-19 | Ricoh Co Ltd | 実装方法 |
| WO1991011027A1 (en) * | 1990-01-16 | 1991-07-25 | Iowa State University Research Foundation, Inc. | Non-crystalline silicon active device for large-scale digital and analog networks |
| US5280184A (en) * | 1992-04-08 | 1994-01-18 | Georgia Tech Research Corporation | Three dimensional integrated circuits with lift-off |
| WO1993021663A1 (en) * | 1992-04-08 | 1993-10-28 | Georgia Tech Research Corporation | Process for lift-off of thin film materials from a growth substrate |
| US6483736B2 (en) | 1998-11-16 | 2002-11-19 | Matrix Semiconductor, Inc. | Vertically stacked field programmable nonvolatile memory and method of fabrication |
| JP4334173B2 (ja) * | 1999-07-06 | 2009-09-30 | 三菱電機株式会社 | 駆動制御システム |
| US8575719B2 (en) | 2000-04-28 | 2013-11-05 | Sandisk 3D Llc | Silicon nitride antifuse for use in diode-antifuse memory arrays |
| US6888750B2 (en) * | 2000-04-28 | 2005-05-03 | Matrix Semiconductor, Inc. | Nonvolatile memory on SOI and compound semiconductor substrates and method of fabrication |
| KR100821456B1 (ko) | 2000-08-14 | 2008-04-11 | 샌디스크 쓰리디 엘엘씨 | 밀집한 어레이 및 전하 저장 장치와, 그 제조 방법 |
| US6545891B1 (en) * | 2000-08-14 | 2003-04-08 | Matrix Semiconductor, Inc. | Modular memory device |
| US7352199B2 (en) | 2001-02-20 | 2008-04-01 | Sandisk Corporation | Memory card with enhanced testability and methods of making and using the same |
| US6897514B2 (en) | 2001-03-28 | 2005-05-24 | Matrix Semiconductor, Inc. | Two mask floating gate EEPROM and method of making |
| US6525953B1 (en) | 2001-08-13 | 2003-02-25 | Matrix Semiconductor, Inc. | Vertically-stacked, field-programmable, nonvolatile memory and method of fabrication |
| US6593624B2 (en) | 2001-09-25 | 2003-07-15 | Matrix Semiconductor, Inc. | Thin film transistors with vertically offset drain regions |
| US6843421B2 (en) | 2001-08-13 | 2005-01-18 | Matrix Semiconductor, Inc. | Molded memory module and method of making the module absent a substrate support |
| US6841813B2 (en) * | 2001-08-13 | 2005-01-11 | Matrix Semiconductor, Inc. | TFT mask ROM and method for making same |
| US6624485B2 (en) | 2001-11-05 | 2003-09-23 | Matrix Semiconductor, Inc. | Three-dimensional, mask-programmed read only memory |
| US6731011B2 (en) | 2002-02-19 | 2004-05-04 | Matrix Semiconductor, Inc. | Memory module having interconnected and stacked integrated circuits |
| US6853049B2 (en) | 2002-03-13 | 2005-02-08 | Matrix Semiconductor, Inc. | Silicide-silicon oxide-semiconductor antifuse device and method of making |
| US6737675B2 (en) | 2002-06-27 | 2004-05-18 | Matrix Semiconductor, Inc. | High density 3D rail stack arrays |
| US9627395B2 (en) | 2015-02-11 | 2017-04-18 | Sandisk Technologies Llc | Enhanced channel mobility three-dimensional memory structure and method of making thereof |
| US9478495B1 (en) | 2015-10-26 | 2016-10-25 | Sandisk Technologies Llc | Three dimensional memory device containing aluminum source contact via structure and method of making thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57106181A (en) * | 1980-12-24 | 1982-07-01 | Toshiba Corp | Integrated circuit |
| JPS58217072A (ja) * | 1982-06-11 | 1983-12-16 | Sony Corp | 画像処理装置 |
| JPS5950583A (ja) * | 1982-09-16 | 1984-03-23 | Fujitsu Ltd | 半導体装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4603401A (en) * | 1984-04-17 | 1986-07-29 | University Of Pittsburgh | Apparatus and method for infrared imaging |
-
1984
- 1984-06-18 JP JP59123918A patent/JPS613450A/ja active Granted
-
1985
- 1985-02-15 US US06/702,139 patent/US4672577A/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57106181A (en) * | 1980-12-24 | 1982-07-01 | Toshiba Corp | Integrated circuit |
| JPS58217072A (ja) * | 1982-06-11 | 1983-12-16 | Sony Corp | 画像処理装置 |
| JPS5950583A (ja) * | 1982-09-16 | 1984-03-23 | Fujitsu Ltd | 半導体装置 |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01316872A (ja) * | 1988-06-17 | 1989-12-21 | Mitsubishi Electric Corp | 3次元デバイスを用いた正方行列乗算器 |
| JPH02232765A (ja) * | 1989-03-07 | 1990-09-14 | Agency Of Ind Science & Technol | 集積回路装置 |
| US6874068B1 (en) | 1999-02-12 | 2005-03-29 | Hiroshima University | Shared memory |
| US6563163B1 (en) | 1999-05-18 | 2003-05-13 | Hiroshima University | Nonvolatile memory using deep level capture of carrier at corner structure of oxide film |
| JP2008282108A (ja) * | 2007-05-08 | 2008-11-20 | Research Organization Of Information & Systems | 三次元集積電気回路の配線構造及びそのレイアウト方法 |
| JP2021064806A (ja) * | 2011-12-22 | 2021-04-22 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| JP2022088391A (ja) * | 2011-12-22 | 2022-06-14 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| JP2023110044A (ja) * | 2011-12-22 | 2023-08-08 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| JP2024123197A (ja) * | 2011-12-22 | 2024-09-10 | 株式会社半導体エネルギー研究所 | 半導体装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0568105B2 (enExample) | 1993-09-28 |
| US4672577A (en) | 1987-06-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |