JPS61292641A - ホトレジスト用処理液 - Google Patents

ホトレジスト用処理液

Info

Publication number
JPS61292641A
JPS61292641A JP60135030A JP13503085A JPS61292641A JP S61292641 A JPS61292641 A JP S61292641A JP 60135030 A JP60135030 A JP 60135030A JP 13503085 A JP13503085 A JP 13503085A JP S61292641 A JPS61292641 A JP S61292641A
Authority
JP
Japan
Prior art keywords
water
photoresist
compound
organic solvent
processing solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60135030A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0444742B2 (enExample
Inventor
Kunio Ito
伊藤　邦男
Kimio Watabe
渡部　喜美男
Masahiro Shiosaki
潮崎　昌弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanofi Aventis KK
Original Assignee
Hoechst Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Japan Ltd filed Critical Hoechst Japan Ltd
Priority to JP60135030A priority Critical patent/JPS61292641A/ja
Priority to AT85112572T priority patent/ATE58972T1/de
Priority to EP85112572A priority patent/EP0177905B1/de
Priority to DE8585112572T priority patent/DE3580827D1/de
Priority to KR1019850007406A priority patent/KR930010775B1/ko
Priority to CA000492431A priority patent/CA1257610A/en
Priority to US06/785,518 priority patent/US4729941A/en
Priority to ES547744A priority patent/ES8707068A1/es
Publication of JPS61292641A publication Critical patent/JPS61292641A/ja
Publication of JPH0444742B2 publication Critical patent/JPH0444742B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP60135030A 1984-10-09 1985-06-20 ホトレジスト用処理液 Granted JPS61292641A (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP60135030A JPS61292641A (ja) 1985-06-20 1985-06-20 ホトレジスト用処理液
AT85112572T ATE58972T1 (de) 1984-10-09 1985-10-04 Verfahren zum entwickeln und zum entschichten von photoresistschichten mit quaternaeren ammomiumverbindungen.
EP85112572A EP0177905B1 (de) 1984-10-09 1985-10-04 Verfahren zum Entwickeln und zum Entschichten von Photoresistschichten mit quaternären Ammomiumverbindungen
DE8585112572T DE3580827D1 (de) 1984-10-09 1985-10-04 Verfahren zum entwickeln und zum entschichten von photoresistschichten mit quaternaeren ammomiumverbindungen.
KR1019850007406A KR930010775B1 (ko) 1984-10-09 1985-10-08 감광성내식막 처리액
CA000492431A CA1257610A (en) 1984-10-09 1985-10-08 Photoresist processing solution
US06/785,518 US4729941A (en) 1984-10-09 1985-10-08 Photoresist processing solution with quaternary ammonium hydroxide
ES547744A ES8707068A1 (es) 1985-06-20 1985-10-09 Un procedimiento para la preparacion de una serigrafia foto-protectora

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60135030A JPS61292641A (ja) 1985-06-20 1985-06-20 ホトレジスト用処理液

Publications (2)

Publication Number Publication Date
JPS61292641A true JPS61292641A (ja) 1986-12-23
JPH0444742B2 JPH0444742B2 (enExample) 1992-07-22

Family

ID=15142297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60135030A Granted JPS61292641A (ja) 1984-10-09 1985-06-20 ホトレジスト用処理液

Country Status (2)

Country Link
JP (1) JPS61292641A (enExample)
ES (1) ES8707068A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01158444A (ja) * 1987-03-11 1989-06-21 Tokyo Ohka Kogyo Co Ltd ホトレジストの剥離液
JP2009069505A (ja) * 2007-09-13 2009-04-02 Tosoh Corp レジスト除去用洗浄液及び洗浄方法
JP2015026064A (ja) * 2013-06-19 2015-02-05 信越化学工業株式会社 感光性レジスト材料用現像液及びこれを用いたパターン形成方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01158444A (ja) * 1987-03-11 1989-06-21 Tokyo Ohka Kogyo Co Ltd ホトレジストの剥離液
JP2009069505A (ja) * 2007-09-13 2009-04-02 Tosoh Corp レジスト除去用洗浄液及び洗浄方法
JP2015026064A (ja) * 2013-06-19 2015-02-05 信越化学工業株式会社 感光性レジスト材料用現像液及びこれを用いたパターン形成方法

Also Published As

Publication number Publication date
ES547744A0 (es) 1987-07-01
JPH0444742B2 (enExample) 1992-07-22
ES8707068A1 (es) 1987-07-01

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