ES8707068A1 - Un procedimiento para la preparacion de una serigrafia foto-protectora - Google Patents
Un procedimiento para la preparacion de una serigrafia foto-protectoraInfo
- Publication number
- ES8707068A1 ES8707068A1 ES547744A ES547744A ES8707068A1 ES 8707068 A1 ES8707068 A1 ES 8707068A1 ES 547744 A ES547744 A ES 547744A ES 547744 A ES547744 A ES 547744A ES 8707068 A1 ES8707068 A1 ES 8707068A1
- Authority
- ES
- Spain
- Prior art keywords
- processing solution
- photoresist processing
- water
- stripping
- organic solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
METODO DE PREPARAR UNA SERIGRAFIA FOTOPROTECTORA. CONSISTE EN IRRADIAR A LA MANERA DE IMAGEN UNA CAPA FOTOPROTECTORA CON RADIACION ACTINICA PARA FORMAR UNA IMAGEN FOROPROTECTORA EN EL INTERIOR DE LA CAPA Y DESPUES REMOVER LAS AREAS SIN IMAGEN DE LA CAPA TRATANDOLA CON UNA SOLUCION PROCESADORA DE FOTOPROTECTORES QUE COMPRENDE: A) UN HIDROXIDO AMONICO CUATERNARIO DE FORMULA (I), DONDE R, R ELEVADO A 1 Y R ELEVADO A 2, IGUALES O DIFERENTES, SON CADA UNO DE ELLOS UN GRUPO ALQUILO DE C 1 A 5, Y N ES UN ENTERO DE 1 A 10, Y B) AGUA Y/O UN DISOLVENTE ORGANICO MISCIBLE CON AGUA. TIENE APLICACIONES EN TECNICAS DE REVELADO.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13503085A JPS61292641A (ja) | 1985-06-20 | 1985-06-20 | ホトレジスト用処理液 |
Publications (2)
Publication Number | Publication Date |
---|---|
ES547744A0 ES547744A0 (es) | 1987-07-01 |
ES8707068A1 true ES8707068A1 (es) | 1987-07-01 |
Family
ID=15142297
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES547744A Expired ES8707068A1 (es) | 1985-06-20 | 1985-10-09 | Un procedimiento para la preparacion de una serigrafia foto-protectora |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS61292641A (es) |
ES (1) | ES8707068A1 (es) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2591644B2 (ja) * | 1987-03-11 | 1997-03-19 | 東京応化工業株式会社 | ホトレジストの剥離液 |
JP2009069505A (ja) * | 2007-09-13 | 2009-04-02 | Tosoh Corp | レジスト除去用洗浄液及び洗浄方法 |
JP6221939B2 (ja) * | 2013-06-19 | 2017-11-01 | 信越化学工業株式会社 | 感光性レジスト材料用現像液及びこれを用いたパターン形成方法 |
-
1985
- 1985-06-20 JP JP13503085A patent/JPS61292641A/ja active Granted
- 1985-10-09 ES ES547744A patent/ES8707068A1/es not_active Expired
Also Published As
Publication number | Publication date |
---|---|
ES547744A0 (es) | 1987-07-01 |
JPH0444742B2 (es) | 1992-07-22 |
JPS61292641A (ja) | 1986-12-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FD1A | Patent lapsed |
Effective date: 19970203 |