ATE130685T1 - Ein phenolharz und ein sensibilisierungsmittel enthaltende zusammensetzung. - Google Patents

Ein phenolharz und ein sensibilisierungsmittel enthaltende zusammensetzung.

Info

Publication number
ATE130685T1
ATE130685T1 AT89309109T AT89309109T ATE130685T1 AT E130685 T1 ATE130685 T1 AT E130685T1 AT 89309109 T AT89309109 T AT 89309109T AT 89309109 T AT89309109 T AT 89309109T AT E130685 T1 ATE130685 T1 AT E130685T1
Authority
AT
Austria
Prior art keywords
composition
group
phenolic resin
sensitizer
composition containing
Prior art date
Application number
AT89309109T
Other languages
English (en)
Inventor
Rong-Chang Liang
Alexander R Pokora
William L Cyrus
Original Assignee
Enzymol Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Enzymol Int Inc filed Critical Enzymol Int Inc
Application granted granted Critical
Publication of ATE130685T1 publication Critical patent/ATE130685T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
AT89309109T 1988-09-08 1989-09-08 Ein phenolharz und ein sensibilisierungsmittel enthaltende zusammensetzung. ATE130685T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US24165788A 1988-09-08 1988-09-08

Publications (1)

Publication Number Publication Date
ATE130685T1 true ATE130685T1 (de) 1995-12-15

Family

ID=22911632

Family Applications (1)

Application Number Title Priority Date Filing Date
AT89309109T ATE130685T1 (de) 1988-09-08 1989-09-08 Ein phenolharz und ein sensibilisierungsmittel enthaltende zusammensetzung.

Country Status (6)

Country Link
EP (1) EP0358517B1 (de)
JP (1) JP3037954B2 (de)
KR (1) KR900005231A (de)
AT (1) ATE130685T1 (de)
CA (1) CA1337788C (de)
DE (1) DE68924894T2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5110740A (en) * 1989-09-06 1992-05-05 The Mead Corporation Pretreatment of phenolic resin suspension to remove residual phenol
EP0523957A1 (de) * 1991-07-17 1993-01-20 Japan Synthetic Rubber Co., Ltd. Strahlungsempfindliche Zusammensetzung

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6180246A (ja) * 1984-09-28 1986-04-23 Nec Corp ポジレジスト材料

Also Published As

Publication number Publication date
EP0358517A3 (en) 1990-10-10
DE68924894T2 (de) 1996-07-04
JP3037954B2 (ja) 2000-05-08
EP0358517A2 (de) 1990-03-14
DE68924894D1 (de) 1996-01-04
JPH02120743A (ja) 1990-05-08
EP0358517B1 (de) 1995-11-22
CA1337788C (en) 1995-12-26
KR900005231A (ko) 1990-04-13

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Legal Events

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