JPS61278179A - 超電導回路形成用エッチング方法 - Google Patents

超電導回路形成用エッチング方法

Info

Publication number
JPS61278179A
JPS61278179A JP60120129A JP12012985A JPS61278179A JP S61278179 A JPS61278179 A JP S61278179A JP 60120129 A JP60120129 A JP 60120129A JP 12012985 A JP12012985 A JP 12012985A JP S61278179 A JPS61278179 A JP S61278179A
Authority
JP
Japan
Prior art keywords
layer
etching
mgo
magnesium oxide
superconducting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60120129A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0374515B2 (enExample
Inventor
Hiroshi Nakagawa
博 仲川
Masahiro Aoyanagi
昌宏 青柳
Akira Shoji
彰 東海林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP60120129A priority Critical patent/JPS61278179A/ja
Publication of JPS61278179A publication Critical patent/JPS61278179A/ja
Publication of JPH0374515B2 publication Critical patent/JPH0374515B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
JP60120129A 1985-06-03 1985-06-03 超電導回路形成用エッチング方法 Granted JPS61278179A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60120129A JPS61278179A (ja) 1985-06-03 1985-06-03 超電導回路形成用エッチング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60120129A JPS61278179A (ja) 1985-06-03 1985-06-03 超電導回路形成用エッチング方法

Publications (2)

Publication Number Publication Date
JPS61278179A true JPS61278179A (ja) 1986-12-09
JPH0374515B2 JPH0374515B2 (enExample) 1991-11-27

Family

ID=14778687

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60120129A Granted JPS61278179A (ja) 1985-06-03 1985-06-03 超電導回路形成用エッチング方法

Country Status (1)

Country Link
JP (1) JPS61278179A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01168080A (ja) * 1987-12-24 1989-07-03 Agency Of Ind Science & Technol ジョセフソン接合素子の作製方法
EP0493963A1 (en) * 1990-12-28 1992-07-08 Fujitsu Limited Patterned mask having a transparent etching stopper layer
US5380608A (en) * 1991-11-12 1995-01-10 Dai Nippon Printing Co., Ltd. Phase shift photomask comprising a layer of aluminum oxide with magnesium oxide

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5978586A (ja) * 1982-10-27 1984-05-07 Hitachi Ltd Ｎｂのパタ−ン形成法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5978586A (ja) * 1982-10-27 1984-05-07 Hitachi Ltd Ｎｂのパタ−ン形成法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01168080A (ja) * 1987-12-24 1989-07-03 Agency Of Ind Science & Technol ジョセフソン接合素子の作製方法
EP0493963A1 (en) * 1990-12-28 1992-07-08 Fujitsu Limited Patterned mask having a transparent etching stopper layer
US5876877A (en) * 1990-12-28 1999-03-02 Fujitsu Limited Patterned mask having a transparent etching stopper layer
US5380608A (en) * 1991-11-12 1995-01-10 Dai Nippon Printing Co., Ltd. Phase shift photomask comprising a layer of aluminum oxide with magnesium oxide

Also Published As

Publication number Publication date
JPH0374515B2 (enExample) 1991-11-27

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term