JPS6122856B2 - - Google Patents
Info
- Publication number
- JPS6122856B2 JPS6122856B2 JP14345577A JP14345577A JPS6122856B2 JP S6122856 B2 JPS6122856 B2 JP S6122856B2 JP 14345577 A JP14345577 A JP 14345577A JP 14345577 A JP14345577 A JP 14345577A JP S6122856 B2 JPS6122856 B2 JP S6122856B2
- Authority
- JP
- Japan
- Prior art keywords
- boat
- heat treatment
- boats
- wafer
- time
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010438 heat treatment Methods 0.000 claims description 27
- 238000009792 diffusion process Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 description 27
- 238000003780 insertion Methods 0.000 description 6
- 230000037431 insertion Effects 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14345577A JPS5475985A (en) | 1977-11-29 | 1977-11-29 | Heat treatment method of semiconductor substrate and its unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14345577A JPS5475985A (en) | 1977-11-29 | 1977-11-29 | Heat treatment method of semiconductor substrate and its unit |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60159026A Division JPS6144425A (ja) | 1985-07-18 | 1985-07-18 | 半導体基板の熱処理用ボート |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5475985A JPS5475985A (en) | 1979-06-18 |
| JPS6122856B2 true JPS6122856B2 (cg-RX-API-DMAC7.html) | 1986-06-03 |
Family
ID=15339093
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14345577A Granted JPS5475985A (en) | 1977-11-29 | 1977-11-29 | Heat treatment method of semiconductor substrate and its unit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5475985A (cg-RX-API-DMAC7.html) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5961534U (ja) * | 1982-10-15 | 1984-04-23 | 日本電気株式会社 | 搬送用ボ−ト |
| DE3440111C1 (de) * | 1984-11-02 | 1986-05-15 | Heraeus Quarzschmelze Gmbh, 6450 Hanau | Traegerhorde |
| US6799940B2 (en) | 2002-12-05 | 2004-10-05 | Tokyo Electron Limited | Removable semiconductor wafer susceptor |
-
1977
- 1977-11-29 JP JP14345577A patent/JPS5475985A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5475985A (en) | 1979-06-18 |
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