JPS6120946A - フォトレジスト剥離用組成物 - Google Patents

フォトレジスト剥離用組成物

Info

Publication number
JPS6120946A
JPS6120946A JP14140284A JP14140284A JPS6120946A JP S6120946 A JPS6120946 A JP S6120946A JP 14140284 A JP14140284 A JP 14140284A JP 14140284 A JP14140284 A JP 14140284A JP S6120946 A JPS6120946 A JP S6120946A
Authority
JP
Japan
Prior art keywords
methylene chloride
photoresist
stripping
photoresist stripping
stripping composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14140284A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0374828B2 (cs
Inventor
Kazuo Oishi
大石　和男
Kunio Obayashi
大林　邦男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP14140284A priority Critical patent/JPS6120946A/ja
Publication of JPS6120946A publication Critical patent/JPS6120946A/ja
Publication of JPH0374828B2 publication Critical patent/JPH0374828B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Detergent Compositions (AREA)
JP14140284A 1984-07-10 1984-07-10 フォトレジスト剥離用組成物 Granted JPS6120946A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14140284A JPS6120946A (ja) 1984-07-10 1984-07-10 フォトレジスト剥離用組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14140284A JPS6120946A (ja) 1984-07-10 1984-07-10 フォトレジスト剥離用組成物

Publications (2)

Publication Number Publication Date
JPS6120946A true JPS6120946A (ja) 1986-01-29
JPH0374828B2 JPH0374828B2 (cs) 1991-11-28

Family

ID=15291166

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14140284A Granted JPS6120946A (ja) 1984-07-10 1984-07-10 フォトレジスト剥離用組成物

Country Status (1)

Country Link
JP (1) JPS6120946A (cs)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6330848A (ja) * 1986-07-21 1988-02-09 エルフ　アトケム　ソシエテ　アノニム 塩化メチレンを主成分とする組成物および該組成物を応用したフォトレジストフィルムの除去方法
JPH01158444A (ja) * 1987-03-11 1989-06-21 Tokyo Ohka Kogyo Co Ltd ホトレジストの剥離液
US5399202A (en) * 1991-12-19 1995-03-21 Hitachi, Ltd. Resist-peeling liquid and process for peeling a resist using the same

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4913103A (cs) * 1972-04-07 1974-02-05
JPS49116012A (cs) * 1973-02-23 1974-11-06
JPS49135904A (cs) * 1973-05-16 1974-12-27
JPS49135905A (cs) * 1973-05-16 1974-12-27
JPS49135903A (cs) * 1973-05-16 1974-12-27
JPS5217002A (en) * 1975-07-30 1977-02-08 Toshiba Corp Manufaceuring method of pick-up cantilever
JPS5217003A (en) * 1975-07-30 1977-02-08 Hitachi Maxell Ltd Magnetic recording tape
JPS5245241A (en) * 1975-10-08 1977-04-09 Hitachi Metals Ltd Wide-band concentrated constant type circulator
JPS5545636A (en) * 1978-09-28 1980-03-31 Toagosei Chem Ind Co Ltd Stabilization of methylene chloride
JPS5597479A (en) * 1978-12-01 1980-07-24 Dow Chemical Europ Stabilized methylene chloride composition for steam rendering
JPS5637212A (en) * 1979-08-29 1981-04-10 Kyoritsu Yuki Kogyo Kenkyusho:Kk Activated carbon dehydrating method
JPS56113715A (en) * 1980-02-12 1981-09-07 Shin Etsu Chem Co Ltd Methylene chloride composition
JPS56131530A (en) * 1980-08-05 1981-10-15 Tokuyama Soda Co Ltd Stabilizing method of methylene chloride
JPS59487A (ja) * 1982-06-23 1984-01-05 東洋エクステリア株式会社 伸縮形門扉

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4913103A (cs) * 1972-04-07 1974-02-05
JPS49116012A (cs) * 1973-02-23 1974-11-06
JPS49135904A (cs) * 1973-05-16 1974-12-27
JPS49135905A (cs) * 1973-05-16 1974-12-27
JPS49135903A (cs) * 1973-05-16 1974-12-27
JPS5217002A (en) * 1975-07-30 1977-02-08 Toshiba Corp Manufaceuring method of pick-up cantilever
JPS5217003A (en) * 1975-07-30 1977-02-08 Hitachi Maxell Ltd Magnetic recording tape
JPS5245241A (en) * 1975-10-08 1977-04-09 Hitachi Metals Ltd Wide-band concentrated constant type circulator
JPS5545636A (en) * 1978-09-28 1980-03-31 Toagosei Chem Ind Co Ltd Stabilization of methylene chloride
JPS5597479A (en) * 1978-12-01 1980-07-24 Dow Chemical Europ Stabilized methylene chloride composition for steam rendering
JPS5637212A (en) * 1979-08-29 1981-04-10 Kyoritsu Yuki Kogyo Kenkyusho:Kk Activated carbon dehydrating method
JPS56113715A (en) * 1980-02-12 1981-09-07 Shin Etsu Chem Co Ltd Methylene chloride composition
JPS56131530A (en) * 1980-08-05 1981-10-15 Tokuyama Soda Co Ltd Stabilizing method of methylene chloride
JPS59487A (ja) * 1982-06-23 1984-01-05 東洋エクステリア株式会社 伸縮形門扉

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6330848A (ja) * 1986-07-21 1988-02-09 エルフ　アトケム　ソシエテ　アノニム 塩化メチレンを主成分とする組成物および該組成物を応用したフォトレジストフィルムの除去方法
JPH01158444A (ja) * 1987-03-11 1989-06-21 Tokyo Ohka Kogyo Co Ltd ホトレジストの剥離液
US5399202A (en) * 1991-12-19 1995-03-21 Hitachi, Ltd. Resist-peeling liquid and process for peeling a resist using the same

Also Published As

Publication number Publication date
JPH0374828B2 (cs) 1991-11-28

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