JPS6119137B2 - - Google Patents
Info
- Publication number
- JPS6119137B2 JPS6119137B2 JP52145863A JP14586377A JPS6119137B2 JP S6119137 B2 JPS6119137 B2 JP S6119137B2 JP 52145863 A JP52145863 A JP 52145863A JP 14586377 A JP14586377 A JP 14586377A JP S6119137 B2 JPS6119137 B2 JP S6119137B2
- Authority
- JP
- Japan
- Prior art keywords
- case
- metal film
- recess
- crystal resonator
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013078 crystal Substances 0.000 claims abstract description 39
- 239000002184 metal Substances 0.000 claims abstract description 16
- 229910052751 metal Inorganic materials 0.000 claims abstract description 16
- 238000005530 etching Methods 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims abstract description 4
- 230000007797 corrosion Effects 0.000 claims description 27
- 238000005260 corrosion Methods 0.000 claims description 27
- 239000012780 transparent material Substances 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims description 3
- 239000010453 quartz Substances 0.000 abstract description 3
- 238000007789 sealing Methods 0.000 abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 3
- 239000011230 binding agent Substances 0.000 abstract 1
- 239000006023 eutectic alloy Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000003754 machining Methods 0.000 description 7
- 239000011521 glass Substances 0.000 description 5
- 230000010355 oscillation Effects 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/10—Mounting in enclosures
- H03H9/1007—Mounting in enclosures for bulk acoustic wave [BAW] devices
- H03H9/1014—Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the BAW device
- H03H9/1021—Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the BAW device the BAW device being of the cantilever type
-
- G—PHYSICS
- G04—HOROLOGY
- G04F—TIME-INTERVAL MEASURING
- G04F5/00—Apparatus for producing preselected time intervals for use as timing standards
- G04F5/04—Apparatus for producing preselected time intervals for use as timing standards using oscillators with electromechanical resonators producing electric oscillations or timing pulses
- G04F5/06—Apparatus for producing preselected time intervals for use as timing standards using oscillators with electromechanical resonators producing electric oscillations or timing pulses using piezoelectric resonators
- G04F5/063—Constructional details
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/0595—Holders; Supports the holder support and resonator being formed in one body
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14586477A JPS5478694A (en) | 1977-12-05 | 1977-12-05 | Crystal vibrator |
JP14586377A JPS5478693A (en) | 1977-12-05 | 1977-12-05 | Crystal vibrator |
CH1240178A CH633160B (fr) | 1977-12-05 | 1978-12-05 | Procede de fabrication d'un oscillateur a cristal de quartz de type ultra mince et oscillateur a cristal de quartz encapsule resultant du procede. |
US05/966,688 US4293986A (en) | 1977-12-05 | 1978-12-05 | Method of making a quartz crystal oscillator |
US06/141,025 US4288284A (en) | 1977-12-05 | 1980-04-17 | Method of producing housing element for quartz crystal oscillator |
CH982A CH647642GA3 (US20020128544A1-20020912-P00008.png) | 1977-12-05 | 1982-01-04 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14586477A JPS5478694A (en) | 1977-12-05 | 1977-12-05 | Crystal vibrator |
JP14586377A JPS5478693A (en) | 1977-12-05 | 1977-12-05 | Crystal vibrator |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5478693A JPS5478693A (en) | 1979-06-22 |
JPS6119137B2 true JPS6119137B2 (US20020128544A1-20020912-P00008.png) | 1986-05-15 |
Family
ID=26476878
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14586477A Pending JPS5478694A (en) | 1977-12-05 | 1977-12-05 | Crystal vibrator |
JP14586377A Granted JPS5478693A (en) | 1977-12-05 | 1977-12-05 | Crystal vibrator |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14586477A Pending JPS5478694A (en) | 1977-12-05 | 1977-12-05 | Crystal vibrator |
Country Status (3)
Country | Link |
---|---|
US (2) | US4293986A (US20020128544A1-20020912-P00008.png) |
JP (2) | JPS5478694A (US20020128544A1-20020912-P00008.png) |
CH (2) | CH633160B (US20020128544A1-20020912-P00008.png) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03121U (US20020128544A1-20020912-P00008.png) * | 1989-05-23 | 1991-01-07 |
Families Citing this family (67)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH625372A5 (US20020128544A1-20020912-P00008.png) * | 1979-07-06 | 1981-09-15 | Ebauchesfabrik Eta Ag | |
JPS57152212A (en) * | 1981-03-16 | 1982-09-20 | Seiko Epson Corp | Quartz oscillator |
CH655423GA3 (US20020128544A1-20020912-P00008.png) * | 1984-02-15 | 1986-04-30 | ||
JPS60191511A (ja) * | 1984-03-12 | 1985-09-30 | Murata Mfg Co Ltd | 圧電振動子とその製造方法 |
JPS6146608A (ja) * | 1984-08-10 | 1986-03-06 | Murata Mfg Co Ltd | 圧電振動子 |
US4627533A (en) * | 1984-10-29 | 1986-12-09 | Hughes Aircraft Company | Ceramic package for compensated crystal oscillator |
DE3520085A1 (de) * | 1985-06-05 | 1986-12-11 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Verfahren zum herstellen eines hermetisch verschlossenen bauelementengehaeuses, insbesondere fuer schwingquarze |
US4639631A (en) * | 1985-07-01 | 1987-01-27 | Motorola, Inc. | Electrostatically sealed piezoelectric device |
DE3539504A1 (de) * | 1985-11-07 | 1987-05-21 | Schott Glaswerke | Flachgehaeuse zur hermetischen kapselung von piezoelektrischen bauelementen |
FR2592247A1 (fr) * | 1985-12-24 | 1987-06-26 | Electronique Piezo Electr Cie | Perfectionnement aux resonateurs piezoelectriques. |
US5392006A (en) * | 1987-02-27 | 1995-02-21 | Seiko Epson Corporation | Pressure seal type piezoelectric resonator |
US5325574A (en) * | 1987-02-27 | 1994-07-05 | Seiko Epson Corporation | Method of forming a quartz oscillator temperature sensor |
US5265316A (en) * | 1987-02-27 | 1993-11-30 | Seiko Epson Corporation | Method of manufacturing a pressure seal type piezoelectric oscillator |
US5607236A (en) * | 1987-02-27 | 1997-03-04 | Seiko Epson Corporation | Quartz oscillator temperature sensor |
US5592130A (en) * | 1987-02-27 | 1997-01-07 | Seiko Epson Corporation | Piezoelectric oscillator including a piezoelectric resonator with outer lead |
GB8719498D0 (en) * | 1987-08-18 | 1987-11-18 | Ferranti Plc | Seals |
US4895291A (en) * | 1989-05-04 | 1990-01-23 | Eastman Kodak Company | Method of making a hermetic seal in a solid-state device |
US5138214A (en) * | 1989-12-27 | 1992-08-11 | Matsushita Electric Industrial Co., Ltd. | Piezoelectric transducer and method of adjusting oscillation frequency thereof |
US5270491A (en) * | 1990-10-09 | 1993-12-14 | Eastman Kodak Company | Hermetically sealed microelectronic package |
JP2601016B2 (ja) * | 1990-11-17 | 1997-04-16 | 株式会社村田製作所 | 圧電共振子の製造方法 |
JPH06505597A (ja) * | 1991-03-04 | 1994-06-23 | モトローラ・インコーポレーテッド | 非導電性電子回路パッケージ用シールド装置 |
US5668057A (en) * | 1991-03-13 | 1997-09-16 | Matsushita Electric Industrial Co., Ltd. | Methods of manufacture for electronic components having high-frequency elements |
US5747857A (en) * | 1991-03-13 | 1998-05-05 | Matsushita Electric Industrial Co., Ltd. | Electronic components having high-frequency elements and methods of manufacture therefor |
GB2260642B (en) * | 1991-10-19 | 1995-02-08 | Northern Telecom Ltd | Crystal resonator device |
JPH06291587A (ja) * | 1992-07-08 | 1994-10-18 | Matsushita Electric Ind Co Ltd | 圧電振動子 |
KR0158469B1 (ko) * | 1992-10-15 | 1999-03-20 | 모리시타 요이찌 | 발진자 |
DE69322480T2 (de) * | 1992-10-20 | 1999-08-05 | Matsushita Electric Ind Co Ltd | Piezoelektrisches Filter und Verfahren zu seiner Herstellung |
US5302879A (en) * | 1992-12-31 | 1994-04-12 | Halliburton Company | Temperature/reference package, and method using the same for high pressure, high temperature oil or gas well |
JPH06350376A (ja) * | 1993-01-25 | 1994-12-22 | Matsushita Electric Ind Co Ltd | 気密封止された圧電デバイスおよび気密封止パッケージ |
US5506463A (en) * | 1993-08-23 | 1996-04-09 | Rohm Co., Ltd. | Packaged piezoelectric oscillator and method of making the same |
DE69429848T2 (de) * | 1993-11-01 | 2002-09-26 | Matsushita Electric Ind Co Ltd | Elektronische Anordnung und Verfahren zur Herstellung |
DE69409215T2 (de) * | 1993-12-06 | 1998-07-16 | Matsushita Electric Ind Co Ltd | Hybrid Magnetstruktur und deren Herstellungsverfahren |
US5406682A (en) * | 1993-12-23 | 1995-04-18 | Motorola, Inc. | Method of compliantly mounting a piezoelectric device |
JPH07226644A (ja) * | 1994-02-16 | 1995-08-22 | Murata Mfg Co Ltd | エネルギー閉じ込め型圧電共振子 |
US5552655A (en) * | 1994-05-04 | 1996-09-03 | Trw Inc. | Low frequency mechanical resonator |
US5514928A (en) * | 1994-05-27 | 1996-05-07 | Litton Systems, Inc. | Apparatus having cascaded and interbonded microchannel plates and method of making |
DE19548048C2 (de) * | 1995-12-21 | 1998-01-15 | Siemens Matsushita Components | Elektronisches Bauelement, insbesondere mit akustischen Oberflächenwellen arbeitendes Bauelement (OFW-Bauelement) |
DE19548062A1 (de) * | 1995-12-21 | 1997-06-26 | Siemens Matsushita Components | Elektrisches Bauelement, insbesondere mit akustischen Oberflächenwellen arbeitendes Bauelement - OFW-Bauelement - sowie ein Verfahren zu dessen Herstellung |
US6242842B1 (en) | 1996-12-16 | 2001-06-05 | Siemens Matsushita Components Gmbh & Co. Kg | Electrical component, in particular saw component operating with surface acoustic waves, and a method for its production |
US5696422A (en) * | 1996-03-01 | 1997-12-09 | Piezo Crystal Company | Crystal package |
EP0794616B1 (en) * | 1996-03-08 | 2003-01-29 | Matsushita Electric Industrial Co., Ltd. | An electronic part and a method of production thereof |
DE19649332C1 (de) * | 1996-11-28 | 1998-01-22 | Tele Quarz Gmbh | Resonator mit Kristall |
JP3042431B2 (ja) * | 1996-12-03 | 2000-05-15 | 株式会社村田製作所 | 電子部品の封止構造および封止方法 |
US6960870B2 (en) * | 1997-07-29 | 2005-11-01 | Seiko Epson Corporation | Piezo-electric resonator and manufacturing method thereof |
US6976295B2 (en) * | 1997-07-29 | 2005-12-20 | Seiko Epson Corporation | Method of manufacturing a piezoelectric device |
US6114800A (en) * | 1997-10-01 | 2000-09-05 | Murata Manufacturing Co., Ltd | Piezoelectric component |
JP3989663B2 (ja) * | 2000-02-17 | 2007-10-10 | セイコーインスツル株式会社 | 圧電振動子と圧電振動子の製造方法 |
US6628048B2 (en) * | 2000-11-29 | 2003-09-30 | Samsung Electro-Mechanics Co., Ltd. | Crystal oscillator with improved shock resistance |
JP3974346B2 (ja) * | 2001-03-30 | 2007-09-12 | 富士通メディアデバイス株式会社 | 弾性表面波装置 |
US6548943B2 (en) * | 2001-04-12 | 2003-04-15 | Nokia Mobile Phones Ltd. | Method of producing thin-film bulk acoustic wave devices |
US6528875B1 (en) * | 2001-04-20 | 2003-03-04 | Amkor Technology, Inc. | Vacuum sealed package for semiconductor chip |
JP2003318699A (ja) * | 2002-04-23 | 2003-11-07 | Piedekku Gijutsu Kenkyusho:Kk | 水晶ユニットとその製造方法 |
JP3905041B2 (ja) * | 2003-01-07 | 2007-04-18 | 株式会社日立製作所 | 電子デバイスおよびその製造方法 |
US8092734B2 (en) * | 2004-05-13 | 2012-01-10 | Aptina Imaging Corporation | Covers for microelectronic imagers and methods for wafer-level packaging of microelectronics imagers |
JP4451219B2 (ja) * | 2004-06-03 | 2010-04-14 | 日本電波工業株式会社 | 水晶振動子 |
US7061086B2 (en) * | 2004-09-01 | 2006-06-13 | Bliley Technologies Inc. | Silicon package for piezoelectric device |
JP2006229295A (ja) * | 2005-02-15 | 2006-08-31 | Kyocera Kinseki Corp | 振動子パッケージ |
JP4690146B2 (ja) * | 2005-08-26 | 2011-06-01 | セイコーインスツル株式会社 | 水晶振動子、発振器及び電子機器 |
JP2007251766A (ja) * | 2006-03-17 | 2007-09-27 | Nippon Dempa Kogyo Co Ltd | 表面実装用の水晶発振器 |
US7564177B2 (en) * | 2006-12-26 | 2009-07-21 | Nihon Dempa Kogyo Co., Ltd. | Crystal unit having stacked structure |
US8069549B2 (en) | 2007-03-22 | 2011-12-06 | Seiko Epson Corporation | Method for sealing a quartz crystal device |
JP5078512B2 (ja) * | 2007-09-06 | 2012-11-21 | 日本電波工業株式会社 | 水晶デバイス |
JP5048471B2 (ja) * | 2007-12-05 | 2012-10-17 | セイコーインスツル株式会社 | パッケージの製造方法、パッケージ、電子デバイス、圧電振動子、発振器、電子機器及び電波時計 |
JP4988799B2 (ja) * | 2009-09-16 | 2012-08-01 | 日本電波工業株式会社 | 圧電振動デバイス及び圧電振動デバイスの製造方法 |
JP2011142374A (ja) * | 2010-01-05 | 2011-07-21 | Seiko Epson Corp | 圧電デバイス、圧電デバイスの製造方法 |
JP5129284B2 (ja) * | 2010-03-09 | 2013-01-30 | 日本電波工業株式会社 | 圧電振動子及び圧電振動子の製造方法 |
JP5991452B2 (ja) * | 2014-04-24 | 2016-09-14 | 株式会社村田製作所 | 水晶振動装置及びその製造方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US261402A (en) * | 1882-07-18 | sprague | ||
US378423A (en) * | 1888-02-28 | Method of etching on one | ||
US3421962A (en) * | 1965-04-05 | 1969-01-14 | Int Rectifier Corp | Apparatus for dicing semiconductor wafers |
US3888708A (en) * | 1972-02-17 | 1975-06-10 | Kensall D Wise | Method for forming regions of predetermined thickness in silicon |
US3857161A (en) * | 1973-02-09 | 1974-12-31 | T Hutchins | Method of making a ductile hermetic indium seal |
FR2338607A1 (fr) * | 1976-01-16 | 1977-08-12 | France Etat | Resonateur a quartz a electrodes non adherentes au cristal |
US4077558A (en) * | 1976-12-06 | 1978-03-07 | International Business Machines Corporation | Diffusion bonding of crystals |
-
1977
- 1977-12-05 JP JP14586477A patent/JPS5478694A/ja active Pending
- 1977-12-05 JP JP14586377A patent/JPS5478693A/ja active Granted
-
1978
- 1978-12-05 CH CH1240178A patent/CH633160B/fr unknown
- 1978-12-05 US US05/966,688 patent/US4293986A/en not_active Expired - Lifetime
-
1980
- 1980-04-17 US US06/141,025 patent/US4288284A/en not_active Expired - Lifetime
-
1982
- 1982-01-04 CH CH982A patent/CH647642GA3/fr unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03121U (US20020128544A1-20020912-P00008.png) * | 1989-05-23 | 1991-01-07 |
Also Published As
Publication number | Publication date |
---|---|
JPS5478693A (en) | 1979-06-22 |
CH633160GA3 (US20020128544A1-20020912-P00008.png) | 1982-11-30 |
JPS5478694A (en) | 1979-06-22 |
US4288284A (en) | 1981-09-08 |
CH647642GA3 (US20020128544A1-20020912-P00008.png) | 1985-02-15 |
US4293986A (en) | 1981-10-13 |
CH633160B (fr) |
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