JPS61190074A - Ta↓2O↓5膜の形成方法 - Google Patents
Ta↓2O↓5膜の形成方法Info
- Publication number
- JPS61190074A JPS61190074A JP2880885A JP2880885A JPS61190074A JP S61190074 A JPS61190074 A JP S61190074A JP 2880885 A JP2880885 A JP 2880885A JP 2880885 A JP2880885 A JP 2880885A JP S61190074 A JPS61190074 A JP S61190074A
- Authority
- JP
- Japan
- Prior art keywords
- film
- gas
- substrate
- formation
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2880885A JPS61190074A (ja) | 1985-02-15 | 1985-02-15 | Ta↓2O↓5膜の形成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2880885A JPS61190074A (ja) | 1985-02-15 | 1985-02-15 | Ta↓2O↓5膜の形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61190074A true JPS61190074A (ja) | 1986-08-23 |
JPH0420982B2 JPH0420982B2 (enrdf_load_stackoverflow) | 1992-04-07 |
Family
ID=12258715
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2880885A Granted JPS61190074A (ja) | 1985-02-15 | 1985-02-15 | Ta↓2O↓5膜の形成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61190074A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5045348A (en) * | 1987-03-26 | 1991-09-03 | Plessey Overseas Limited | Thin film deposition process |
US5234556A (en) * | 1989-08-18 | 1993-08-10 | Hitachi, Ltd. | Polymeric metal oxide materials and their formation and use |
WO2002100954A1 (en) * | 2001-06-06 | 2002-12-19 | Minolta Co., Ltd. | Method for manufacturing substrate with insulating layer and display having the substrate |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5174578A (en) * | 1974-12-25 | 1976-06-28 | Fujitsu Ltd | Zetsuenhimakuno keiseihoho |
JPS6176677A (ja) * | 1984-09-25 | 1986-04-19 | Applied Material Japan Kk | 気相成長方法 |
JPS6184376A (ja) * | 1984-09-28 | 1986-04-28 | Applied Material Japan Kk | 気相成長装置 |
JPS61103539A (ja) * | 1984-10-26 | 1986-05-22 | Applied Material Japan Kk | 気相成長方法 |
-
1985
- 1985-02-15 JP JP2880885A patent/JPS61190074A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5174578A (en) * | 1974-12-25 | 1976-06-28 | Fujitsu Ltd | Zetsuenhimakuno keiseihoho |
JPS6176677A (ja) * | 1984-09-25 | 1986-04-19 | Applied Material Japan Kk | 気相成長方法 |
JPS6184376A (ja) * | 1984-09-28 | 1986-04-28 | Applied Material Japan Kk | 気相成長装置 |
JPS61103539A (ja) * | 1984-10-26 | 1986-05-22 | Applied Material Japan Kk | 気相成長方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5045348A (en) * | 1987-03-26 | 1991-09-03 | Plessey Overseas Limited | Thin film deposition process |
US5234556A (en) * | 1989-08-18 | 1993-08-10 | Hitachi, Ltd. | Polymeric metal oxide materials and their formation and use |
WO2002100954A1 (en) * | 2001-06-06 | 2002-12-19 | Minolta Co., Ltd. | Method for manufacturing substrate with insulating layer and display having the substrate |
Also Published As
Publication number | Publication date |
---|---|
JPH0420982B2 (enrdf_load_stackoverflow) | 1992-04-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
EXPY | Cancellation because of completion of term |