JPS61173253A - フオトマスクブランクの形成方法 - Google Patents

フオトマスクブランクの形成方法

Info

Publication number
JPS61173253A
JPS61173253A JP60016205A JP1620585A JPS61173253A JP S61173253 A JPS61173253 A JP S61173253A JP 60016205 A JP60016205 A JP 60016205A JP 1620585 A JP1620585 A JP 1620585A JP S61173253 A JPS61173253 A JP S61173253A
Authority
JP
Japan
Prior art keywords
metal
silicon
glass substrate
silicide film
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60016205A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0434143B2 (enrdf_load_stackoverflow
Inventor
Yaichiro Watakabe
渡壁　弥一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP60016205A priority Critical patent/JPS61173253A/ja
Publication of JPS61173253A publication Critical patent/JPS61173253A/ja
Publication of JPH0434143B2 publication Critical patent/JPH0434143B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60016205A 1985-01-28 1985-01-28 フオトマスクブランクの形成方法 Granted JPS61173253A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60016205A JPS61173253A (ja) 1985-01-28 1985-01-28 フオトマスクブランクの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60016205A JPS61173253A (ja) 1985-01-28 1985-01-28 フオトマスクブランクの形成方法

Publications (2)

Publication Number Publication Date
JPS61173253A true JPS61173253A (ja) 1986-08-04
JPH0434143B2 JPH0434143B2 (enrdf_load_stackoverflow) 1992-06-05

Family

ID=11910009

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60016205A Granted JPS61173253A (ja) 1985-01-28 1985-01-28 フオトマスクブランクの形成方法

Country Status (1)

Country Link
JP (1) JPS61173253A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006028168A1 (ja) * 2004-09-10 2006-03-16 Shin-Etsu Chemical Co., Ltd. フォトマスクブランク及びフォトマスク
JP2009294681A (ja) * 2009-09-24 2009-12-17 Shin-Etsu Chemical Co Ltd フォトマスクブランク及びフォトマスク

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5323277A (en) * 1976-08-14 1978-03-03 Konishiroku Photo Ind Co Ltd Photomasking material and photomask
JPS60176235A (ja) * 1984-02-22 1985-09-10 Nippon Kogaku Kk <Nikon> Ｘ線露光用マスク原板

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5323277A (en) * 1976-08-14 1978-03-03 Konishiroku Photo Ind Co Ltd Photomasking material and photomask
JPS60176235A (ja) * 1984-02-22 1985-09-10 Nippon Kogaku Kk <Nikon> Ｘ線露光用マスク原板

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006028168A1 (ja) * 2004-09-10 2006-03-16 Shin-Etsu Chemical Co., Ltd. フォトマスクブランク及びフォトマスク
US7691546B2 (en) 2004-09-10 2010-04-06 Shin-Etsu Chemical Co., Ltd. Photomask blank and photomask
US8007964B2 (en) 2004-09-10 2011-08-30 Shin-Etsu Chemical Co., Ltd. Photomask blank and photomask
JP2009294681A (ja) * 2009-09-24 2009-12-17 Shin-Etsu Chemical Co Ltd フォトマスクブランク及びフォトマスク

Also Published As

Publication number Publication date
JPH0434143B2 (enrdf_load_stackoverflow) 1992-06-05

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