JPS61173252A - フォトマスクブランクの形成方法 - Google Patents

フォトマスクブランクの形成方法

Info

Publication number
JPS61173252A
JPS61173252A JP60016204A JP1620485A JPS61173252A JP S61173252 A JPS61173252 A JP S61173252A JP 60016204 A JP60016204 A JP 60016204A JP 1620485 A JP1620485 A JP 1620485A JP S61173252 A JPS61173252 A JP S61173252A
Authority
JP
Japan
Prior art keywords
silicide film
film
metal silicide
transparent glass
glass substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60016204A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0434142B2 (enrdf_load_html_response
Inventor
Yaichiro Watakabe
渡壁　弥一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP60016204A priority Critical patent/JPS61173252A/ja
Publication of JPS61173252A publication Critical patent/JPS61173252A/ja
Publication of JPH0434142B2 publication Critical patent/JPH0434142B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60016204A 1985-01-28 1985-01-28 フォトマスクブランクの形成方法 Granted JPS61173252A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60016204A JPS61173252A (ja) 1985-01-28 1985-01-28 フォトマスクブランクの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60016204A JPS61173252A (ja) 1985-01-28 1985-01-28 フォトマスクブランクの形成方法

Publications (2)

Publication Number Publication Date
JPS61173252A true JPS61173252A (ja) 1986-08-04
JPH0434142B2 JPH0434142B2 (enrdf_load_html_response) 1992-06-05

Family

ID=11909978

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60016204A Granted JPS61173252A (ja) 1985-01-28 1985-01-28 フォトマスクブランクの形成方法

Country Status (1)

Country Link
JP (1) JPS61173252A (enrdf_load_html_response)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005331554A (ja) * 2004-05-18 2005-12-02 Shin Etsu Chem Co Ltd フォトマスクブランク及びフォトマスクの製造方法
JP2007185126A (ja) * 2006-01-12 2007-07-26 Sekisui Film Kk 畝の被覆構造及び畝の被覆方法
JP2010066783A (ja) * 2009-12-25 2010-03-25 Shin-Etsu Chemical Co Ltd フォトマスクブランク及びフォトマスクの製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5185380A (enrdf_load_html_response) * 1975-05-21 1976-07-26 Dainippon Printing Co Ltd
JPS5750431A (en) * 1980-09-10 1982-03-24 Toshiba Corp Forming method for minute pattern
JPS5796535A (en) * 1980-12-08 1982-06-15 Seiko Epson Corp Cvd device
JPS57157249A (en) * 1981-03-23 1982-09-28 Nec Corp Preparation of optical exposure mask
JPS57160127A (en) * 1981-03-27 1982-10-02 Nec Corp Manufacture of transcribe mask for x-ray exposure
JPS60176235A (ja) * 1984-02-22 1985-09-10 Nippon Kogaku Kk <Nikon> Ｘ線露光用マスク原板

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5185380A (enrdf_load_html_response) * 1975-05-21 1976-07-26 Dainippon Printing Co Ltd
JPS5750431A (en) * 1980-09-10 1982-03-24 Toshiba Corp Forming method for minute pattern
JPS5796535A (en) * 1980-12-08 1982-06-15 Seiko Epson Corp Cvd device
JPS57157249A (en) * 1981-03-23 1982-09-28 Nec Corp Preparation of optical exposure mask
JPS57160127A (en) * 1981-03-27 1982-10-02 Nec Corp Manufacture of transcribe mask for x-ray exposure
JPS60176235A (ja) * 1984-02-22 1985-09-10 Nippon Kogaku Kk <Nikon> Ｘ線露光用マスク原板

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005331554A (ja) * 2004-05-18 2005-12-02 Shin Etsu Chem Co Ltd フォトマスクブランク及びフォトマスクの製造方法
JP2007185126A (ja) * 2006-01-12 2007-07-26 Sekisui Film Kk 畝の被覆構造及び畝の被覆方法
JP2010066783A (ja) * 2009-12-25 2010-03-25 Shin-Etsu Chemical Co Ltd フォトマスクブランク及びフォトマスクの製造方法

Also Published As

Publication number Publication date
JPH0434142B2 (enrdf_load_html_response) 1992-06-05

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