JPS61137318A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS61137318A JPS61137318A JP59259751A JP25975184A JPS61137318A JP S61137318 A JPS61137318 A JP S61137318A JP 59259751 A JP59259751 A JP 59259751A JP 25975184 A JP25975184 A JP 25975184A JP S61137318 A JPS61137318 A JP S61137318A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- mask
- semiconductor device
- glass film
- electrode metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10D64/011—
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electrodes Of Semiconductors (AREA)
- Formation Of Insulating Films (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59259751A JPS61137318A (ja) | 1984-12-08 | 1984-12-08 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59259751A JPS61137318A (ja) | 1984-12-08 | 1984-12-08 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61137318A true JPS61137318A (ja) | 1986-06-25 |
| JPH0550851B2 JPH0550851B2 (OSRAM) | 1993-07-30 |
Family
ID=17338443
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59259751A Granted JPS61137318A (ja) | 1984-12-08 | 1984-12-08 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61137318A (OSRAM) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54121732A (en) * | 1978-03-15 | 1979-09-21 | Nippon Telegr & Teleph Corp <Ntt> | Pattern transfer method |
-
1984
- 1984-12-08 JP JP59259751A patent/JPS61137318A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54121732A (en) * | 1978-03-15 | 1979-09-21 | Nippon Telegr & Teleph Corp <Ntt> | Pattern transfer method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0550851B2 (OSRAM) | 1993-07-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100521970B1 (ko) | 패드 금속의 표면 보호를 위한 이미지센서 제조방법 | |
| JPS61137318A (ja) | 半導体装置の製造方法 | |
| JPS5932895B2 (ja) | 半導体装置およびその製造方法 | |
| JPS61113062A (ja) | フオトマスク | |
| JP2628555B2 (ja) | 半導体装置の製造方法 | |
| JP2666383B2 (ja) | 半導体装置 | |
| JPS6347951A (ja) | 半導体装置の製造方法 | |
| KR100220796B1 (ko) | 반도체 기판의 범프 에어리어 형성방법 | |
| JPS62281348A (ja) | 半導体装置の製造方法 | |
| JP3158844B2 (ja) | 半導体素子の製造方法 | |
| KR0137619B1 (ko) | 반도체 장치 제조 방법 | |
| JPS5984529A (ja) | パタ−ン形成方法 | |
| KR0172773B1 (ko) | 반도체 소자의 패드 형성 방법 | |
| JPS59210644A (ja) | 半導体装置の製造方法 | |
| KR100550416B1 (ko) | 반도체 소자의 제조 방법 | |
| JP2570709B2 (ja) | エツチング方法 | |
| KR100308787B1 (ko) | 광검출소자제조방법 | |
| JP3222344B2 (ja) | 発光ダイオードアレイの製造方法 | |
| KR100374229B1 (ko) | 반도체소자의금속배선형성방법 | |
| KR100291412B1 (ko) | 포토레지스트도포방법 | |
| JP2001068545A (ja) | 半導体装置の製造方法 | |
| JPS611049A (ja) | 固体撮像素子の製造方法 | |
| JPS60218848A (ja) | 結晶基板のエツチング法 | |
| JPH0232542A (ja) | 半導体装置の製造方法 | |
| JPS61141157A (ja) | 半導体素子の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |