JPS61128243A - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物

Info

Publication number
JPS61128243A
JPS61128243A JP24962484A JP24962484A JPS61128243A JP S61128243 A JPS61128243 A JP S61128243A JP 24962484 A JP24962484 A JP 24962484A JP 24962484 A JP24962484 A JP 24962484A JP S61128243 A JPS61128243 A JP S61128243A
Authority
JP
Japan
Prior art keywords
weight
photosensitive resin
resin composition
acid
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24962484A
Other languages
English (en)
Japanese (ja)
Other versions
JPH057705B2 (esLanguage
Inventor
Shohei Nakamura
中村 庄平
Katsuhiro Takahashi
勝弘 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=17195792&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JPS61128243(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP24962484A priority Critical patent/JPS61128243A/ja
Priority to AU50409/85A priority patent/AU587790B2/en
Priority to EP19850308674 priority patent/EP0183552B2/en
Priority to DE8585308674T priority patent/DE3561910D1/de
Publication of JPS61128243A publication Critical patent/JPS61128243A/ja
Publication of JPH057705B2 publication Critical patent/JPH057705B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F279/00Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
    • C08F279/02Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00 on to polymers of conjugated dienes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP24962484A 1984-11-28 1984-11-28 感光性樹脂組成物 Granted JPS61128243A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP24962484A JPS61128243A (ja) 1984-11-28 1984-11-28 感光性樹脂組成物
AU50409/85A AU587790B2 (en) 1984-11-28 1985-11-27 A photopolymerizable composition
EP19850308674 EP0183552B2 (en) 1984-11-28 1985-11-28 A photopolymerizable composition
DE8585308674T DE3561910D1 (en) 1984-11-28 1985-11-28 A photopolymerizable composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24962484A JPS61128243A (ja) 1984-11-28 1984-11-28 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS61128243A true JPS61128243A (ja) 1986-06-16
JPH057705B2 JPH057705B2 (esLanguage) 1993-01-29

Family

ID=17195792

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24962484A Granted JPS61128243A (ja) 1984-11-28 1984-11-28 感光性樹脂組成物

Country Status (4)

Country Link
EP (1) EP0183552B2 (esLanguage)
JP (1) JPS61128243A (esLanguage)
AU (1) AU587790B2 (esLanguage)
DE (1) DE3561910D1 (esLanguage)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04342258A (ja) * 1990-09-05 1992-11-27 E I Du Pont De Nemours & Co 溶媒耐性が改善された感光性エラストマー部材
US6689539B2 (en) 2000-01-05 2004-02-10 Kodak Polychrome Graphics Llc Photosensitive composition and photosensitive lithographic printing plate
WO2010070918A1 (ja) 2008-12-18 2010-06-24 旭化成イーマテリアルズ株式会社 アブレーション層、感光性樹脂構成体、当該感光性樹脂構成体を用いた凸版印刷版の製造方法
WO2012039233A1 (ja) 2010-09-22 2012-03-29 イーストマン コダック カンパニー 平版印刷版原版
WO2024062680A1 (ja) 2022-09-21 2024-03-28 東洋紡エムシー株式会社 再生現像液を製造する方法、及びその方法に好適な感光性樹脂組成物

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NZ212161A (en) * 1984-06-08 1988-06-30 Ishikawa Katsukiyo Photo-polymerisable composition and printing plate prepared therefrom
NZ215095A (en) * 1985-02-12 1989-04-26 Napp Systems Inc Photosensitive resin compositions
DE3814567A1 (de) * 1988-04-29 1989-11-09 Du Pont Deutschland Photopolymerisierbare zusammensetzungen mit carboxylgruppen enthaltenden bindemitteln
DE4032238A1 (de) * 1990-10-11 1992-04-23 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten
JP2640039B2 (ja) * 1991-03-25 1997-08-13 エクソン・ケミカル・パテンツ・インク イソモノオレフィンとアルキルスチレンのグラフトポリマー
US5462835A (en) * 1991-09-16 1995-10-31 P T Sub Inc. Photocurable composition, flexible, photosensitive articles made therefrom, and methods of improving solvent resistance and flexibility of those articles
DE4211391A1 (de) 1992-04-04 1993-10-07 Hoechst Ag Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten
DE4211390A1 (de) * 1992-04-04 1993-10-07 Hoechst Ag Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten
US5422225A (en) * 1994-06-23 1995-06-06 Shell Oil Company Photopolymerizable recording composition for water-washable printing plates containing a water-dispersible elastomeric polymer blend

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1312492A (en) * 1969-12-19 1973-04-04 Mccall Corp Crosslinked polymers and process therefor
US3764324A (en) * 1972-04-13 1973-10-09 Mc Call Corp Photographic polymer composition and process for crosslinking
DK198077A (da) * 1976-05-06 1977-11-07 Japan Synthetic Rubber Co Ltd Fotosensitive kompositioner og trykkeplader der indeholder disse
US4177074A (en) * 1978-01-25 1979-12-04 E. I. Du Pont De Nemours And Company Butadiene/acrylonitrile photosensitive, elastomeric polymer compositions for flexographic printing plates

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04342258A (ja) * 1990-09-05 1992-11-27 E I Du Pont De Nemours & Co 溶媒耐性が改善された感光性エラストマー部材
US6689539B2 (en) 2000-01-05 2004-02-10 Kodak Polychrome Graphics Llc Photosensitive composition and photosensitive lithographic printing plate
WO2010070918A1 (ja) 2008-12-18 2010-06-24 旭化成イーマテリアルズ株式会社 アブレーション層、感光性樹脂構成体、当該感光性樹脂構成体を用いた凸版印刷版の製造方法
US8883399B2 (en) 2008-12-18 2014-11-11 Asahi Kasei E-Materials Corporation Ablation layer, photosensitive resin structure, and method for producing relief printing plate using the photosensitive resin structure
WO2012039233A1 (ja) 2010-09-22 2012-03-29 イーストマン コダック カンパニー 平版印刷版原版
WO2024062680A1 (ja) 2022-09-21 2024-03-28 東洋紡エムシー株式会社 再生現像液を製造する方法、及びその方法に好適な感光性樹脂組成物

Also Published As

Publication number Publication date
EP0183552B1 (en) 1988-03-16
JPH057705B2 (esLanguage) 1993-01-29
AU5040985A (en) 1986-06-05
EP0183552B2 (en) 1991-10-16
EP0183552A3 (en) 1986-06-25
DE3561910D1 (en) 1988-04-21
AU587790B2 (en) 1989-08-31
EP0183552A2 (en) 1986-06-04

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term