JPS6082663A - 混合物薄膜製造の方法および装置 - Google Patents

混合物薄膜製造の方法および装置

Info

Publication number
JPS6082663A
JPS6082663A JP18769383A JP18769383A JPS6082663A JP S6082663 A JPS6082663 A JP S6082663A JP 18769383 A JP18769383 A JP 18769383A JP 18769383 A JP18769383 A JP 18769383A JP S6082663 A JPS6082663 A JP S6082663A
Authority
JP
Japan
Prior art keywords
target
thin film
amount
sputtering
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18769383A
Other languages
English (en)
Japanese (ja)
Other versions
JPH055895B2 (enrdf_load_stackoverflow
Inventor
Hiroki Nakajima
啓幾 中島
Minoru Kiyono
實 清野
Ippei Sawaki
一平 佐脇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP18769383A priority Critical patent/JPS6082663A/ja
Publication of JPS6082663A publication Critical patent/JPS6082663A/ja
Publication of JPH055895B2 publication Critical patent/JPH055895B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • C23C14/0036Reactive sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP18769383A 1983-10-08 1983-10-08 混合物薄膜製造の方法および装置 Granted JPS6082663A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18769383A JPS6082663A (ja) 1983-10-08 1983-10-08 混合物薄膜製造の方法および装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18769383A JPS6082663A (ja) 1983-10-08 1983-10-08 混合物薄膜製造の方法および装置

Publications (2)

Publication Number Publication Date
JPS6082663A true JPS6082663A (ja) 1985-05-10
JPH055895B2 JPH055895B2 (enrdf_load_stackoverflow) 1993-01-25

Family

ID=16210494

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18769383A Granted JPS6082663A (ja) 1983-10-08 1983-10-08 混合物薄膜製造の方法および装置

Country Status (1)

Country Link
JP (1) JPS6082663A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61207573A (ja) * 1985-03-09 1986-09-13 Matsufumi Takatani 多成分系電力スパツタリング法
JPS62142763A (ja) * 1985-12-18 1987-06-26 Hitachi Ltd スパツタ装置
JPS62272402A (ja) * 1986-05-20 1987-11-26 松下電器産業株式会社 ペロブスカイト薄膜の製造方法
JPS6487768A (en) * 1987-09-29 1989-03-31 Hitachi Ltd Multifunction vacuum plating device
WO2001055477A1 (fr) * 2000-01-27 2001-08-02 Nikon Corporation Procede de fabrication d'un film de materiau composite renfermant un element generateur de gaz

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08214930A (ja) * 1995-02-14 1996-08-27 Eewa:Kk 包装容器および包装容器の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5538427A (en) * 1978-09-09 1980-03-17 Toshiba Electric Appliance Co Ltd Oblique pot-type incinerator
JPS57116347A (en) * 1981-01-13 1982-07-20 Canon Inc Photoconductive material

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5538427A (en) * 1978-09-09 1980-03-17 Toshiba Electric Appliance Co Ltd Oblique pot-type incinerator
JPS57116347A (en) * 1981-01-13 1982-07-20 Canon Inc Photoconductive material

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61207573A (ja) * 1985-03-09 1986-09-13 Matsufumi Takatani 多成分系電力スパツタリング法
JPS62142763A (ja) * 1985-12-18 1987-06-26 Hitachi Ltd スパツタ装置
JPS62272402A (ja) * 1986-05-20 1987-11-26 松下電器産業株式会社 ペロブスカイト薄膜の製造方法
JPS6487768A (en) * 1987-09-29 1989-03-31 Hitachi Ltd Multifunction vacuum plating device
WO2001055477A1 (fr) * 2000-01-27 2001-08-02 Nikon Corporation Procede de fabrication d'un film de materiau composite renfermant un element generateur de gaz

Also Published As

Publication number Publication date
JPH055895B2 (enrdf_load_stackoverflow) 1993-01-25

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