JPS6082663A - 混合物薄膜製造の方法および装置 - Google Patents
混合物薄膜製造の方法および装置Info
- Publication number
- JPS6082663A JPS6082663A JP18769383A JP18769383A JPS6082663A JP S6082663 A JPS6082663 A JP S6082663A JP 18769383 A JP18769383 A JP 18769383A JP 18769383 A JP18769383 A JP 18769383A JP S6082663 A JPS6082663 A JP S6082663A
- Authority
- JP
- Japan
- Prior art keywords
- target
- thin film
- amount
- sputtering
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18769383A JPS6082663A (ja) | 1983-10-08 | 1983-10-08 | 混合物薄膜製造の方法および装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18769383A JPS6082663A (ja) | 1983-10-08 | 1983-10-08 | 混合物薄膜製造の方法および装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6082663A true JPS6082663A (ja) | 1985-05-10 |
JPH055895B2 JPH055895B2 (enrdf_load_stackoverflow) | 1993-01-25 |
Family
ID=16210494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18769383A Granted JPS6082663A (ja) | 1983-10-08 | 1983-10-08 | 混合物薄膜製造の方法および装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6082663A (enrdf_load_stackoverflow) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61207573A (ja) * | 1985-03-09 | 1986-09-13 | Matsufumi Takatani | 多成分系電力スパツタリング法 |
JPS62142763A (ja) * | 1985-12-18 | 1987-06-26 | Hitachi Ltd | スパツタ装置 |
JPS62272402A (ja) * | 1986-05-20 | 1987-11-26 | 松下電器産業株式会社 | ペロブスカイト薄膜の製造方法 |
JPS6487768A (en) * | 1987-09-29 | 1989-03-31 | Hitachi Ltd | Multifunction vacuum plating device |
WO2001055477A1 (fr) * | 2000-01-27 | 2001-08-02 | Nikon Corporation | Procede de fabrication d'un film de materiau composite renfermant un element generateur de gaz |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08214930A (ja) * | 1995-02-14 | 1996-08-27 | Eewa:Kk | 包装容器および包装容器の製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5538427A (en) * | 1978-09-09 | 1980-03-17 | Toshiba Electric Appliance Co Ltd | Oblique pot-type incinerator |
JPS57116347A (en) * | 1981-01-13 | 1982-07-20 | Canon Inc | Photoconductive material |
-
1983
- 1983-10-08 JP JP18769383A patent/JPS6082663A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5538427A (en) * | 1978-09-09 | 1980-03-17 | Toshiba Electric Appliance Co Ltd | Oblique pot-type incinerator |
JPS57116347A (en) * | 1981-01-13 | 1982-07-20 | Canon Inc | Photoconductive material |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61207573A (ja) * | 1985-03-09 | 1986-09-13 | Matsufumi Takatani | 多成分系電力スパツタリング法 |
JPS62142763A (ja) * | 1985-12-18 | 1987-06-26 | Hitachi Ltd | スパツタ装置 |
JPS62272402A (ja) * | 1986-05-20 | 1987-11-26 | 松下電器産業株式会社 | ペロブスカイト薄膜の製造方法 |
JPS6487768A (en) * | 1987-09-29 | 1989-03-31 | Hitachi Ltd | Multifunction vacuum plating device |
WO2001055477A1 (fr) * | 2000-01-27 | 2001-08-02 | Nikon Corporation | Procede de fabrication d'un film de materiau composite renfermant un element generateur de gaz |
Also Published As
Publication number | Publication date |
---|---|
JPH055895B2 (enrdf_load_stackoverflow) | 1993-01-25 |
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