JPS6487768A - Multifunction vacuum plating device - Google Patents

Multifunction vacuum plating device

Info

Publication number
JPS6487768A
JPS6487768A JP24249087A JP24249087A JPS6487768A JP S6487768 A JPS6487768 A JP S6487768A JP 24249087 A JP24249087 A JP 24249087A JP 24249087 A JP24249087 A JP 24249087A JP S6487768 A JPS6487768 A JP S6487768A
Authority
JP
Japan
Prior art keywords
substrate
film
target
inorg
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24249087A
Other languages
Japanese (ja)
Inventor
Yoshihiro Suzuki
Akio Takahashi
Toshikazu Narahara
Moriaki Fuyama
Michinori Katahira
Minoru Kuroiwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP24249087A priority Critical patent/JPS6487768A/en
Publication of JPS6487768A publication Critical patent/JPS6487768A/en
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To form multi-layered films by the same vacuum vessel and to form the inorg. films having high purity by segmenting a vacuum plating chamber to org. film and inorg. film forming regions, providing targets to the respective regions and constructing a device in such a manner that a substrate can be opposed to either of the targets at proper times. CONSTITUTION:A copper film is formed by sputtering on, for example, the polytetrafluoroethylene (PTFE) substrate 6. The substrate 5 faces the PTFE target 5 in the figure. A substrate rotating and mounting jig 9 is rotated to direct the substrate toward a copper target 4 electrode 3 side in the case of forming the copper film. Sputtering is then executed under prescribed conditions to form the copper film on the substrate 6. The target 6 is kept mounted to the jig 9 and is opposed in this state to the target 5. The sputtering is then executed under the prescribed conditions to form the PTFE film on the copper film. The contamination in the inorg. film forming chamber 7 is suppressed by providing a partition plate 2 and adequately maintaining the spacing between the inside circumference and the jig 9.
JP24249087A 1987-09-29 1987-09-29 Multifunction vacuum plating device Pending JPS6487768A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24249087A JPS6487768A (en) 1987-09-29 1987-09-29 Multifunction vacuum plating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24249087A JPS6487768A (en) 1987-09-29 1987-09-29 Multifunction vacuum plating device

Publications (1)

Publication Number Publication Date
JPS6487768A true JPS6487768A (en) 1989-03-31

Family

ID=17089860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24249087A Pending JPS6487768A (en) 1987-09-29 1987-09-29 Multifunction vacuum plating device

Country Status (1)

Country Link
JP (1) JPS6487768A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002371351A (en) * 2001-06-14 2002-12-26 Hitachi Metals Ltd Film forming apparatus
JP2005320569A (en) * 2004-05-07 2005-11-17 Murata Mfg Co Ltd Plating apparatus
JP2010022684A (en) * 2008-07-23 2010-02-04 Matsumoto Kiko Kk Hatch for evacuation ladder
JP2010095756A (en) * 2008-10-16 2010-04-30 Ulvac Japan Ltd Film deposition apparatus

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53124968A (en) * 1977-04-08 1978-10-31 Hitachi Ltd Continuous vapor deposition apparatus
JPS5690975A (en) * 1979-12-25 1981-07-23 Toshiba Corp Sputtering apparatus
JPS5917236A (en) * 1982-07-21 1984-01-28 Hitachi Ltd Forming device for film
JPS59173268A (en) * 1983-03-23 1984-10-01 Fuji Photo Film Co Ltd Apparatus for formation of thin film
JPS6039162A (en) * 1983-08-10 1985-02-28 Anelva Corp Vacuum apparatus for treating thin film
JPS6082663A (en) * 1983-10-08 1985-05-10 Fujitsu Ltd Method and apparatus for manufacturing mixture thin film
JPS61158121A (en) * 1984-12-29 1986-07-17 Fujitsu Ltd Magnetic film forming device
JPS61227170A (en) * 1985-03-29 1986-10-09 Fujitsu Ltd Sputtering device
JPS61272363A (en) * 1985-05-29 1986-12-02 Hitachi Ltd Formation of carbon film
JPS6241291A (en) * 1985-08-16 1987-02-23 Nippon Telegr & Teleph Corp <Ntt> Preparation of solid lubricating film
JPS6360278A (en) * 1986-09-01 1988-03-16 Nippon Telegr & Teleph Corp <Ntt> Apparatus for preparing multi-layered thin film

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53124968A (en) * 1977-04-08 1978-10-31 Hitachi Ltd Continuous vapor deposition apparatus
JPS5690975A (en) * 1979-12-25 1981-07-23 Toshiba Corp Sputtering apparatus
JPS5917236A (en) * 1982-07-21 1984-01-28 Hitachi Ltd Forming device for film
JPS59173268A (en) * 1983-03-23 1984-10-01 Fuji Photo Film Co Ltd Apparatus for formation of thin film
JPS6039162A (en) * 1983-08-10 1985-02-28 Anelva Corp Vacuum apparatus for treating thin film
JPS6082663A (en) * 1983-10-08 1985-05-10 Fujitsu Ltd Method and apparatus for manufacturing mixture thin film
JPS61158121A (en) * 1984-12-29 1986-07-17 Fujitsu Ltd Magnetic film forming device
JPS61227170A (en) * 1985-03-29 1986-10-09 Fujitsu Ltd Sputtering device
JPS61272363A (en) * 1985-05-29 1986-12-02 Hitachi Ltd Formation of carbon film
JPS6241291A (en) * 1985-08-16 1987-02-23 Nippon Telegr & Teleph Corp <Ntt> Preparation of solid lubricating film
JPS6360278A (en) * 1986-09-01 1988-03-16 Nippon Telegr & Teleph Corp <Ntt> Apparatus for preparing multi-layered thin film

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002371351A (en) * 2001-06-14 2002-12-26 Hitachi Metals Ltd Film forming apparatus
JP2005320569A (en) * 2004-05-07 2005-11-17 Murata Mfg Co Ltd Plating apparatus
JP2010022684A (en) * 2008-07-23 2010-02-04 Matsumoto Kiko Kk Hatch for evacuation ladder
JP2010095756A (en) * 2008-10-16 2010-04-30 Ulvac Japan Ltd Film deposition apparatus

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