JPS61158121A - Magnetic film forming device - Google Patents

Magnetic film forming device

Info

Publication number
JPS61158121A
JPS61158121A JP27565784A JP27565784A JPS61158121A JP S61158121 A JPS61158121 A JP S61158121A JP 27565784 A JP27565784 A JP 27565784A JP 27565784 A JP27565784 A JP 27565784A JP S61158121 A JPS61158121 A JP S61158121A
Authority
JP
Japan
Prior art keywords
substrate
magnetic
substrate holder
providing surface
magnetic film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27565784A
Other languages
Japanese (ja)
Inventor
Kazumasa Hosono
和真 細野
Kunio Hata
畑 邦夫
Yoshio Koshikawa
越川 誉生
Yoshio Takahashi
良夫 高橋
Hitoshi Takagi
均 高木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP27565784A priority Critical patent/JPS61158121A/en
Publication of JPS61158121A publication Critical patent/JPS61158121A/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To enable to obtain a magnetic anisotropy with an excellent reproducibility by a method wherein the title device is constituted in such a manner that the magnetic pole ofthe permanent magnetic plate, with which the substrate providing surface of a polygonal column-shaped substrate, becomes the same magnetic pole at the position of the ridgeline of the substrate holder. CONSTITUTION:A substrate providing surface 13 is formed with a permanent magnetic plate, a fixing frame 15 with which the substrate providing surface 13 is fixed is attached to the position of each ridgeline of a substrate holder 11, and the substrate providing surface 13 is fitted in the fixing frame 15. A permanent magnet is arranged on the fixing frame 15 of the substrate holder 11 at the position of the ridgeline 14 where each of the substrate providing surfaces 13 is butted together. Besides, a shielding plate 17, with which the part of the substrate providing surface 13 other than the region where a substrate 16 is provided, is formed and a premanent magnet plate is protected in such a manner that a magnetic film is not formed on the substrate providing surface 13 of the part other than the region where the substrate 16 is provided. As a result, the distribution of the magnetic field to be applied to the substrate on the substrate providing surface can be made uniform, thereby enabling to obtain a magnetic anisotropy with excellent reproducibility.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は磁性膜の形成装置に係り、特に成長中の磁性膜
に磁場を印加し、磁場中で磁性膜を成膜する磁性膜の形
成装置に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a magnetic film forming apparatus, and particularly to a magnetic film forming apparatus that applies a magnetic field to a growing magnetic film and forms the magnetic film in the magnetic field. Regarding equipment.

例えばフォトセラムよりなる非磁性体基板上に所定形状
のN1−Fe(パーマロイ)よりなる下部磁極層を形成
し、その上に絶縁膜よりなるギャップ層を設け、更にそ
の上に樹脂絶縁膜を介して導体層よりなる所定形状の薄
膜コイルを形成し、次いでこの上にパーマロイよりなる
上部磁極層を所定形状に形成し、前記薄膜コイル、及び
ギヤツブ層を上部磁極層と下部磁極層でU字型形状に挟
んだ薄膜磁気ヘッドは周知である。
For example, a lower magnetic pole layer made of N1-Fe (permalloy) in a predetermined shape is formed on a non-magnetic substrate made of photoceram, a gap layer made of an insulating film is provided on top of the lower magnetic pole layer, and a gap layer made of an insulating film is provided on top of the lower magnetic pole layer, and a resin insulating film is further placed on top of the gap layer. A thin film coil of a predetermined shape made of a conductive layer is then formed on this, and an upper magnetic pole layer made of permalloy is formed in a predetermined shape. Shaped thin film magnetic heads are well known.

このような上部磁極層、及び下部磁極層を形成する磁性
膜は通常スパッタリング法、蒸着法を用いて形成されて
おり、製造される薄膜磁気ヘッドの記録密度を向上させ
るために磁性膜は磁気異方性を持たすことが必要とされ
ている。
The magnetic films that form the top and bottom pole layers are usually formed using sputtering or vapor deposition, and in order to improve the recording density of the manufactured thin-film magnetic head, the magnetic films are made with magnetic anisotropy. It is necessary to have direction.

〔従来の技術〕[Conventional technology]

第3図は上記磁性膜をスパッタリング法で形成する場合
の磁性膜形成装置を上面からみた説明図で、第4図はこ
の装置の基板ホルダの説明図である。
FIG. 3 is an explanatory diagram of a magnetic film forming apparatus seen from above when the magnetic film is formed by sputtering, and FIG. 4 is an explanatory diagram of a substrate holder of this apparatus.

第3図、および第4図に示すように高真空に排気された
容器1内には、基台(図示せず)上に設置された回転軸
2によって回転移動するステンレス製の多角柱状の基板
ホルダ3が設けられ、この基板ホルダ3の基板設置面4
に対向する位置に磁性膜形成用成分からなるターゲット
5が所定数設置されている。
As shown in FIGS. 3 and 4, inside the container 1, which is evacuated to a high vacuum, is a stainless steel polygonal columnar substrate that is rotated by a rotating shaft 2 installed on a base (not shown). A holder 3 is provided, and a substrate installation surface 4 of this substrate holder 3
A predetermined number of targets 5 made of a component for forming a magnetic film are placed at positions facing the target.

第4図に示すようにこの基板設置面4の凹部(図示せず
)にはフォトセラムよりなる基板6を適当な治具(図示
せず)を用いて設置し、またこの基板6の各々を挟むよ
うにして、磁場印加用磁石7を基板設置面4に設置して
いる。
As shown in FIG. 4, a substrate 6 made of photoceram is installed in the recess (not shown) of the substrate installation surface 4 using an appropriate jig (not shown), and each of the substrates 6 is A magnetic field applying magnet 7 is installed on the substrate installation surface 4 so as to be sandwiched therebetween.

この磁場印加用磁石7は基板6を挟んで、対向する位置
で、それぞれの磁石7の磁極を異ならせるように配置し
、各基板6面上にこの各々の磁石7によって磁場を形成
している。
The magnetic field applying magnets 7 are arranged at opposing positions with the substrate 6 in between, so that the magnetic poles of the magnets 7 are different, and a magnetic field is formed by each magnet 7 on the surface of each substrate 6. .

そしてこの基板61、及び磁石7を設置した基板設置面
4を基板ホルダ3の稜線の位置の固定枠8にはめ込むよ
うにして設置している。
The board 61 and the board installation surface 4 on which the magnet 7 is installed are fitted into the fixed frame 8 at the ridgeline of the board holder 3.

このような磁性膜形成装置の容器1内を、例えば10=
 torrの真空度になる迄排気した後、容器内にアル
ゴン(^r)ガス等のスパッタ用ガスを導入し、所定方
向に回転する基板ホルダ3と、ターゲット5間に高周波
電圧を印加し、磁石7を用いて、基板6上に磁場を形成
しながら、このスパッタ用ガスによってスパッタされた
ターゲット5の成分を基板6上に被着させ、前記磁石7
により基板設置面4上に形成された磁場によって磁気異
方性を有する磁性膜を形成している。
The inside of the container 1 of such a magnetic film forming apparatus is, for example, 10=
After evacuating to a vacuum level of torr, a sputtering gas such as argon (^r) gas is introduced into the container, and a high frequency voltage is applied between the substrate holder 3, which rotates in a predetermined direction, and the target 5, and the magnet While forming a magnetic field on the substrate 6 using the magnet 7, components of the target 5 sputtered by this sputtering gas are deposited on the substrate 6, and the magnet 7
A magnetic film having magnetic anisotropy is formed by a magnetic field formed on the substrate installation surface 4.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

然し、上記した構造のスパッタ装置では、基板6を挟む
ようにして一対の磁場印加用磁石7が必要であり、また
この各々の磁石7は基板6を挟むようにしてN極とS極
を対向して設置する必要があり、更に多数の磁石7を用
意せねばならず、更にこの磁石7を基板設置面4に設置
する際、それぞれの磁石7の磁極を間違って配置する問
題がある。
However, in the sputtering apparatus having the above structure, a pair of magnetic field applying magnets 7 are required so as to sandwich the substrate 6 therebetween, and each magnet 7 is installed with the north and south poles facing each other so as to sandwich the substrate 6 therebetween. Therefore, a large number of magnets 7 must be prepared, and when the magnets 7 are installed on the substrate installation surface 4, there is a problem that the magnetic poles of each magnet 7 may be placed incorrectly.

更に従来の基板ホルダ3では、基板設置面4上の磁場の
均一性が悪く、良好な磁気異方性が付与された磁性膜が
形成されないという不都合”を生じる。
Furthermore, in the conventional substrate holder 3, the uniformity of the magnetic field on the substrate mounting surface 4 is poor, resulting in the disadvantage that a magnetic film with good magnetic anisotropy cannot be formed.

〔問題点を解決するための手段〕[Means for solving problems]

上記問題点は、容器内に回転する多角柱状の基板ホルダ
とターゲットとを対向配置し、この基板ホルダに設置さ
れた基板上に磁場を形成しながら、容器内にスパッタガ
スを導入して基板上に磁性膜を形成する装置に於いて、
前述の多角柱状の基板ホルダの基板設置面を永久磁石板
にて形成し、この磁石板の磁極が基板ホルダの稜線の位
置で同一磁極となるようにした本発明の磁性膜の形成装
置によって解決される。
The above problem is solved by placing a rotating polygonal columnar substrate holder and a target in a container facing each other, and creating a magnetic field on the substrate placed in the substrate holder while introducing a sputtering gas into the container. In an apparatus for forming a magnetic film on
This problem is solved by the magnetic film forming apparatus of the present invention, in which the substrate installation surface of the aforementioned polygonal columnar substrate holder is formed of a permanent magnet plate, and the magnetic poles of the magnet plate are the same magnetic pole at the ridgeline of the substrate holder. be done.

〔作用〕[Effect]

即ち、本発明の磁性膜形成装置は、多角柱状の基板ホル
ダの基板設置面を永久磁石板で形成し、基板ホルダの各
稜線で磁石板の磁極が同一磁極となるように構成し、基
板設置面上に一様な強さの磁場分布が得られるようにし
て、均一な厚さで、しかも磁気異方性を再現性良く付与
した磁性膜が得られるようにする。また基板設置面を永
久磁石板で形成することで、従来の装置に於けるように
佑場印加用の磁石を多数必要とせず、それによってこの
磁場印加用磁石を、基板ホルダに取りつける際の磁極の
位置を間違えることがないようにしたものである。
That is, in the magnetic film forming apparatus of the present invention, the substrate mounting surface of the polygonal columnar substrate holder is formed of a permanent magnet plate, and the magnetic film is configured so that the magnetic poles of the magnet plate are the same on each edge line of the substrate holder. To obtain a magnetic film having a uniform thickness and imparting magnetic anisotropy with good reproducibility by obtaining a magnetic field distribution of uniform strength on a surface. In addition, by forming the substrate installation surface with a permanent magnet plate, there is no need for a large number of field-applying magnets as in conventional equipment, and this allows the magnetic field-applying magnet to be used as a magnetic pole when attached to the substrate holder. This is to prevent mistakes in the position of the .

〔実施例〕〔Example〕

以下、図面を用いて本発明の一実施例につき詳細に説明
する。
Hereinafter, one embodiment of the present invention will be described in detail with reference to the drawings.

第1図は本発明の磁性膜形成装置の基板ホルダの要部を
断面して示す平面図で、第2図は本発明の磁性膜形成装
置の基板ホルダの説明図である。
FIG. 1 is a plan view illustrating a main part of the substrate holder of the magnetic film forming apparatus of the present invention in cross section, and FIG. 2 is an explanatory diagram of the substrate holder of the magnetic film forming apparatus of the present invention.

第1図、および第2図に示すように本発明の基板ホルダ
11はスンテンレス製で多角柱状に形成されており、こ
の中心部には回転軸12が設けられている。この基板ホ
ルダ11の基板設置面13は永久磁石板で形成されてお
り、この基板ホルダ11の各稜線14の位置には、この
基板設置面13を固定する固定枠15が取りつけられ、
その固定枠15に基板設置面13がはめ込まれるように
成っている。また基板設置面13には基板16を収容す
るための凹所(図示せず)が設けられ、その部分に基板
16が設置されるようになっている。またこの各々の基
板設置面13が、突き合わされる稜線14の位置に於い
て、基仮設置面13を構成する永久磁石板は同一の磁極
となるように基板ホルダ11の固定枠15に配置されて
いる。
As shown in FIGS. 1 and 2, the substrate holder 11 of the present invention is made of stainless steel and is formed into a polygonal column shape, and a rotating shaft 12 is provided at the center thereof. The board installation surface 13 of this board holder 11 is formed of a permanent magnet plate, and a fixing frame 15 for fixing this board installation surface 13 is attached to each ridgeline 14 of this board holder 11.
The board mounting surface 13 is fitted into the fixed frame 15. Further, the board installation surface 13 is provided with a recess (not shown) for accommodating the board 16, and the board 16 is installed in the recess. Further, at the position of the ridge line 14 where each of the board installation surfaces 13 butts against each other, the permanent magnet plates constituting the base temporary installation surface 13 are arranged on the fixed frame 15 of the board holder 11 so that they have the same magnetic pole. ing.

更にこの固定枠15には、基板16が設置される領域以
外の基板設置面13の部分を遮蔽する遮蔽板17が設け
ら、基板16が設置されている領域以外の部分の基板設
置面13上に磁性膜が形成されないようにし、基板設置
面13を構成する永久磁石板を保護している。
Furthermore, this fixed frame 15 is provided with a shielding plate 17 that shields a portion of the board installation surface 13 other than the area where the board 16 is installed. The permanent magnet plate constituting the substrate mounting surface 13 is protected by preventing a magnetic film from being formed on the substrate mounting surface 13.

このような本発明の基板ホルダによれば、磁場印加用磁
石を多数必要とせず、従ってこの磁場印加用磁石を基板
設置面に取りつける際の磁極の間違いといった問題も発
生せず、取扱の容易な高性能な磁性膜形成装置が得られ
る。
According to the substrate holder of the present invention, a large number of magnets for applying a magnetic field are not required, and therefore problems such as wrong magnetic poles when attaching the magnets for applying a magnetic field to the substrate installation surface do not occur, and the handling is easy. A high-performance magnetic film forming apparatus can be obtained.

〔発明の効果〕〔Effect of the invention〕

以上述べたように本発明の磁性膜形成装置によれば、基
板設置面上で基板に印加する磁場の分布が一様になり、
再現性良く磁気異方性を付与することができる。また磁
場印加用磁石を多数用意する必要がなく、取扱の用意な
磁性膜形成装置が得られる効果がある。
As described above, according to the magnetic film forming apparatus of the present invention, the distribution of the magnetic field applied to the substrate on the substrate installation surface becomes uniform,
Magnetic anisotropy can be imparted with good reproducibility. Furthermore, there is no need to prepare a large number of magnets for applying a magnetic field, and an easy-to-handle magnetic film forming apparatus can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の磁性膜形成装置の基板ホルダの要部を
示す平面図、 第2図は本発明の磁性膜形成装置の基板ホルダの説明図
、 第3図は一般的な磁性膜形成装置の平面図、第4図は従
来の基板ホルダの説明図である。 図に於いて11は基板ホルダ、12は回転軸、13は基
板設置面、14は稜線、15は固定枠、16は基板、1
7は遮蔽板を示す。 第11111 第2図 第3図 第4図
Fig. 1 is a plan view showing the main parts of the substrate holder of the magnetic film forming apparatus of the present invention, Fig. 2 is an explanatory diagram of the substrate holder of the magnetic film forming apparatus of the present invention, and Fig. 3 is a general magnetic film forming method. FIG. 4, a plan view of the apparatus, is an explanatory diagram of a conventional substrate holder. In the figure, 11 is a substrate holder, 12 is a rotating shaft, 13 is a substrate installation surface, 14 is a ridgeline, 15 is a fixed frame, 16 is a substrate, 1
7 indicates a shielding plate. 11111 Figure 2 Figure 3 Figure 4

Claims (1)

【特許請求の範囲】[Claims] 容器内に多角柱状の基板ホルダと、該基板ホルダに対向
してターゲットを設け、前記基板ホルダを回転させると
ともに、基板に磁場を印加し、容器内に導入されたスパ
ッタガスでターゲットの成分を基板上に被着させる装置
に於いて、前記多角柱状の基板ホルダの基板設置面を、
永久磁石板にて形成し、該永久磁石板の磁極が基板ホル
ダの稜線の位置で同一磁極となるように配置したことを
特徴とする磁性膜の形成装置。
A polygonal columnar substrate holder and a target are provided in a container in opposition to the substrate holder.The substrate holder is rotated, a magnetic field is applied to the substrate, and the components of the target are transferred to the substrate using sputtering gas introduced into the container. In the device for depositing the substrate on the substrate mounting surface of the polygonal columnar substrate holder,
1. An apparatus for forming a magnetic film, characterized in that it is formed of a permanent magnet plate, and is arranged so that the magnetic poles of the permanent magnet plate become the same magnetic pole at the position of the ridge line of the substrate holder.
JP27565784A 1984-12-29 1984-12-29 Magnetic film forming device Pending JPS61158121A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27565784A JPS61158121A (en) 1984-12-29 1984-12-29 Magnetic film forming device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27565784A JPS61158121A (en) 1984-12-29 1984-12-29 Magnetic film forming device

Publications (1)

Publication Number Publication Date
JPS61158121A true JPS61158121A (en) 1986-07-17

Family

ID=17558518

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27565784A Pending JPS61158121A (en) 1984-12-29 1984-12-29 Magnetic film forming device

Country Status (1)

Country Link
JP (1) JPS61158121A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6487768A (en) * 1987-09-29 1989-03-31 Hitachi Ltd Multifunction vacuum plating device
KR100959213B1 (en) * 2007-12-20 2010-05-19 주식회사 동부하이텍 Back metal process chamber

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6487768A (en) * 1987-09-29 1989-03-31 Hitachi Ltd Multifunction vacuum plating device
KR100959213B1 (en) * 2007-12-20 2010-05-19 주식회사 동부하이텍 Back metal process chamber

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