JPS62232911A - Magnetic film forming device - Google Patents
Magnetic film forming deviceInfo
- Publication number
- JPS62232911A JPS62232911A JP7718886A JP7718886A JPS62232911A JP S62232911 A JPS62232911 A JP S62232911A JP 7718886 A JP7718886 A JP 7718886A JP 7718886 A JP7718886 A JP 7718886A JP S62232911 A JPS62232911 A JP S62232911A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic field
- magnetic
- substrate
- generating device
- film forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims abstract description 51
- 239000000463 material Substances 0.000 claims description 4
- 239000010408 film Substances 0.000 abstract description 17
- 239000010409 thin film Substances 0.000 abstract description 10
- 238000000034 method Methods 0.000 description 9
- 238000004544 sputter deposition Methods 0.000 description 5
- 239000000696 magnetic material Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000005381 magnetic domain Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は磁性膜形成装置に係り、特にスパッタ法により
基板−ヒに磁性膜を形成する磁性1漠形成装置に関する
。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic film forming apparatus, and more particularly to a magnetic film forming apparatus for forming a magnetic film on a substrate by sputtering.
磁気記録再生装置などに用いられる磁気ヘッドとしては
、薄膜で磁性膜が形成された薄膜磁気ヘッドが多用化さ
れている。この薄膜磁気ヘッドの製法としては、スパッ
タ法、真空蒸着法、マグネトロン法、対向ターゲツト法
など多種類の方法が開発され実用化されているが、薄膜
の再現性がよく基板との付着力が強いなどの利点からス
パッタ法が多く用いられている。またこの薄膜には金属
膜から絶縁物膜まで多くの種類があるが、磁気ヘッドな
どに用いられる薄膜は磁性材料で形成されたものが多い
。2. Description of the Related Art Thin-film magnetic heads, in which a thin magnetic film is formed, are widely used as magnetic heads used in magnetic recording and reproducing devices. Many methods have been developed and put into practical use for producing thin film magnetic heads, including sputtering, vacuum evaporation, magnetron, and facing target methods, but they offer good reproducibility of thin films and strong adhesion to the substrate. The sputtering method is often used because of the following advantages. There are many types of thin films ranging from metal films to insulating films, but the thin films used in magnetic heads and the like are often made of magnetic materials.
磁性材料の薄膜をスパッタ法で基板上に成膜するときに
は、磁気特性を得るために成膜時に平行磁場を印加して
、磁区を一定方向に配向させながらスパッタさせる必要
がある。このために現状では、r高密度磁気記録技術集
成」 (対馬立部監修。When a thin film of a magnetic material is formed on a substrate by sputtering, it is necessary to apply a parallel magnetic field during film formation and perform sputtering while aligning the magnetic domains in a certain direction in order to obtain magnetic properties. For this reason, the current state of the art is "High Density Magnetic Recording Technology Collection" (Supervised by Tsushima Tatebe).
綜合技術センター発行)図1.2,167頁及び197
真に記載されたように、磁区を揃えたい方向に磁場コイ
ルまたは永久磁石などにより磁場を発生させ印加する方
法が採用されている。Published by Sogo Technological Center) Figure 1.2, pages 167 and 197
As described above, a method is employed in which a magnetic field is generated and applied using a magnetic field coil or a permanent magnet in the direction in which the magnetic domains are desired to be aligned.
しかしながら、この方法において、第4図(a)に示す
ように磁場コイル1により外部磁場を与える場合に、磁
力線2は少なくとも1個の図示せぬ基板を載置した基板
ホルダ3の全域にわたって平行にはならない。このため
第4図(b)に示すように基板ホルダ3の両側に磁性材
からなる磁極板4を設けて、この磁極板4に磁束を集め
ることによって基板上の空間磁場をより均一平行にする
方法が知られている。この方法によれば基板上での磁場
の均一性は改善されるが1図から明らかなように磁力線
2は直線ではなく弧状になるため、基板全域にわたって
磁力線2を平行にすることはできない。However, in this method, when an external magnetic field is applied by the magnetic field coil 1 as shown in FIG. Must not be. For this reason, as shown in FIG. 4(b), magnetic pole plates 4 made of magnetic material are provided on both sides of the substrate holder 3, and by concentrating the magnetic flux on the magnetic pole plates 4, the spatial magnetic field on the substrate is made more uniform and parallel. method is known. According to this method, the uniformity of the magnetic field on the substrate is improved, but as is clear from FIG. 1, the lines of magnetic force 2 are not straight lines but arcuate, so it is not possible to make the lines of magnetic force 2 parallel over the entire area of the substrate.
特に最近は生産性向上を目的として複数の基板を同時に
処理する場合が多いため、磁極板4間の距離が増加して
複数の基板の全域にわたって、平行均一な磁場を印加す
ることはますます困難となってきている。このため第4
図(C)に示すように複数個の磁極板5をJ′t、板6
の間に設け、基板6への印加磁場を平行均一化すること
が考えられている。しかしこの方法によってもなお基板
6の全域にわたって磁力線2を平行にすることはできな
い、またこの方法では追加した磁極板2の巾だけ基板ホ
ルダ3の長さが長くなり、装置が大形になるという問題
もあった。Especially recently, as multiple substrates are often processed at the same time to improve productivity, the distance between the magnetic pole plates 4 has increased, making it increasingly difficult to apply a parallel and uniform magnetic field over the entire area of multiple substrates. It is becoming. For this reason, the fourth
As shown in Figure (C), a plurality of magnetic pole plates 5 are connected to
It is considered that the magnetic field applied to the substrate 6 is made parallel and uniform by providing the magnetic field between the substrates 6 and 6. However, even with this method, it is still not possible to make the magnetic lines of force 2 parallel over the entire area of the substrate 6, and in this method, the length of the substrate holder 3 becomes longer by the width of the added magnetic pole plate 2, resulting in a larger device. There were also problems.
本発明は上述した事情に鑑みてなされたもので、広範囲
にわたって基板面と平行に均一な磁場を生成させること
ができ、磁気特性のすぐれた磁性薄膜を成膜することが
できる小形の磁性膜形成i&Ql!tを提供することを
目的とする。The present invention has been made in view of the above-mentioned circumstances, and is a compact magnetic film formation method that can generate a uniform magnetic field parallel to the substrate surface over a wide range and can form a magnetic thin film with excellent magnetic properties. i&Ql! The purpose is to provide t.
本発明は上記の目的を達成するために、成膜材料からな
るターゲットと、被成膜母材である基板と、この基板を
保持する基板ホルダと、前記基板面上に磁場を印加する
主磁場生成装置と、これらのうち少なくとも一部を収納
保持する真空容器とよりなる磁性膜形成装置において、
前記主磁場生成装置の生成する磁場とほぼ平行な磁場を
生成する補助磁場生成装置を設けたものである。In order to achieve the above object, the present invention includes a target made of a film forming material, a substrate which is a base material to be film formed, a substrate holder that holds this substrate, and a main magnetic field that applies a magnetic field onto the surface of the substrate. In a magnetic film forming apparatus comprising a generating device and a vacuum container that houses and holds at least a part of the generating device,
An auxiliary magnetic field generating device is provided that generates a magnetic field substantially parallel to the magnetic field generated by the main magnetic field generating device.
上記の構成によると、主磁場生成装置と補助磁場生成装
置とのそれぞれが生成する磁場が、基板面上で主磁場印
加方向には強め合い、これに垂直方向には弱め合うよう
にすることによって、基板面上での磁場の印加方向の強
度、均一性を高めることができる。According to the above configuration, the magnetic fields generated by the main magnetic field generating device and the auxiliary magnetic field generating device strengthen each other in the main magnetic field application direction on the substrate surface, and weaken each other in the direction perpendicular to this. , it is possible to increase the strength and uniformity of the magnetic field in the applied direction on the substrate surface.
以下、本発明に係る磁性膜形成装置の一実施例を図面を
参照して説明する。An embodiment of the magnetic film forming apparatus according to the present invention will be described below with reference to the drawings.
第1図、第2図及び第3図に本発明の一実施例を示す。An embodiment of the present invention is shown in FIGS. 1, 2, and 3.
これらの図において第4図に示す従来例と同一または同
等部分には同一符号を付して示す。In these figures, parts that are the same or equivalent to those of the conventional example shown in FIG. 4 are denoted by the same reference numerals.
図において、真空容器7の底部にはカソードttt4i
8に連結されたターゲットホルダ9が設けられており、
このターゲットホルダ9上に磁性材料よりなるターゲラ
1〜10が載置されている。前記カソード1if極8は
前記真空室f!7に絶縁物11を介して気密に固定され
ている。真空室D7の上部には1対のへルムホルツコイ
ル1が主磁場発生装置として設けられており、コイル1
間に磁場を形成している。これらのコイル1間には基板
ホルダ3に保持された少なくとも1個の基板6が配置さ
れており、この基板ホルダ3と前記ターゲット10との
間にはシャッタ12が設けられている。また真空容器7
内の基板ホルダ3の上部には基板ヒータ13が設けられ
ており、基極ホルダ3の両端にはパーマロイなどからな
る磁極板4が一体に設けられている。また基板ホルダ3
の両側には基板6と平行な面上で基板ホルダ3から一定
の距離をおいて1対の永久磁石14が補助磁場生成装置
として配設されている。そしてこの永久磁石は1例えば
前記1対のコイル1によって基板ホルダ3上で図中左か
ら右向きに磁場を生成させたとすれば、N極を図中左側
に向けて配置されている。In the figure, the bottom of the vacuum container 7 has a cathode ttt4i.
A target holder 9 connected to 8 is provided,
Targeters 1 to 10 made of a magnetic material are placed on this target holder 9. The cathode 1if pole 8 is connected to the vacuum chamber f! 7 through an insulator 11 in an airtight manner. A pair of Helmholtz coils 1 are provided in the upper part of the vacuum chamber D7 as a main magnetic field generator.
A magnetic field is formed between them. At least one substrate 6 held by a substrate holder 3 is arranged between these coils 1, and a shutter 12 is provided between this substrate holder 3 and the target 10. Also, vacuum container 7
A substrate heater 13 is provided above the substrate holder 3 inside, and magnetic pole plates 4 made of permalloy or the like are integrally provided at both ends of the substrate holder 3. Also, the board holder 3
A pair of permanent magnets 14 are disposed on both sides of the substrate 6 at a certain distance from the substrate holder 3 on a plane parallel to the substrate 6 as an auxiliary magnetic field generating device. If a magnetic field is generated on the substrate holder 3 from left to right in the figure by the pair of coils 1, for example, this permanent magnet is arranged with its north pole facing left in the figure.
次に本実施例の作用を説明する。第3図(a)。Next, the operation of this embodiment will be explained. Figure 3(a).
(b)にそれぞれ永久磁石14及びコイル1が別個に生
成する磁場を示す、永久磁石14のNKaは図中左側に
形成されており、左右1対のコイル1に流れる同一方向
の電流の方向を1図中左右−[−側のコイル断面におい
て紙面裏側より表側に向う方向に選んでいるので、それ
ぞれ図に示した磁力線2の方向に磁場が発生する。基板
ホルダ3の両端には均一な磁場を印加するために?jt
極板4が配性されているが、コイル1のみによる磁力線
2は(b)に示すように中心のごく一部を除いて均一平
行とはならない。しかし第3図(Q)に示すように、コ
イル1の間に1対の永久磁石14を対向して配置すると
1図に示すように基板ホルダ3上の磁力Ai2はほぼ平
行となり、磁場の平行性がよくなり図中X方向の磁場強
度が増大する。(b) shows the magnetic fields generated separately by the permanent magnet 14 and the coil 1. NKa of the permanent magnet 14 is formed on the left side of the figure, and indicates the direction of the current flowing in the same direction in the left and right pair of coils 1. In the coil cross section on the left and right sides of Figure 1, the direction from the back side to the front side of the paper is selected, so a magnetic field is generated in the direction of the magnetic lines of force 2 shown in the figure. To apply a uniform magnetic field to both ends of the substrate holder 3? jt
Although the polar plate 4 is arranged, the magnetic lines of force 2 due to only the coil 1 are not uniformly parallel except for a small part at the center, as shown in FIG. 3(b). However, as shown in FIG. 3 (Q), when a pair of permanent magnets 14 are placed facing each other between the coils 1, the magnetic forces Ai2 on the substrate holder 3 become almost parallel as shown in FIG. The magnetic field strength in the X direction in the figure increases.
このことは下記の理由によって実現できる。すなわち第
3図(a)に示す磁力Jli2上のある点Ms と、こ
の点Mt と整合する位置における第3図(b)に示す
磁力線2上の点C1での磁場を比較すると、点M1にお
けるX方向の磁場B MIXと、点C1におけるX方向
の磁場B ctxとは同じ向きであるが、それぞれのZ
方向の磁場BMI□と)3ctzとは逆向きである。従
って両者を合成したときX方向には強め合うが2方向に
は打消し合う。このことは第3図(a)、(b)、にそ
れぞれ示す別の点Mz 、C2についても同様である。This can be achieved for the following reasons. That is, if we compare the magnetic field at a certain point Ms on the magnetic force Jli2 shown in FIG. 3(a) with the magnetic field at point C1 on the magnetic field line 2 shown in FIG. 3(b) at a position aligned with this point Mt, The magnetic field B MIX in the X direction and the magnetic field B ctx in the X direction at point C1 are in the same direction, but their respective Z
The magnetic field BMI□ and )3ctz are opposite in direction. Therefore, when the two are combined, they strengthen each other in the X direction, but cancel each other out in the two directions. This also applies to other points Mz and C2 shown in FIGS. 3(a) and 3(b), respectively.
従って第3図(c)では、X方向の磁場の平行性が良く
なるとともに1強度も強められる。Therefore, in FIG. 3(c), the parallelism of the magnetic field in the X direction is improved and the strength is also increased by 1.
本実施例によれば、従来例において設けられた中間の磁
極板を必要とせず基板ホルダ3上に全体にわたって平行
均一で強い磁場を印加できる。また中間の磁極板のない
分だけ基板ホルダ3を小さくすることができ、装置の小
型化が可能である。According to this embodiment, a parallel, uniform, strong magnetic field can be applied over the entire substrate holder 3 without requiring the intermediate magnetic pole plate provided in the conventional example. Furthermore, the substrate holder 3 can be made smaller due to the absence of the intermediate magnetic pole plate, and the device can be made smaller.
さらに永久磁石14の位置や強さを変えることにより、
磁場印加の最適条件を比較的簡単に実現できる。Furthermore, by changing the position and strength of the permanent magnet 14,
Optimal conditions for applying a magnetic field can be achieved relatively easily.
本実施例では補助磁場生成装置として永久磁石を用いた
場合について説明したが、この補助磁場生成装置として
電磁コイルを用いてもよい。In this embodiment, a case has been described in which a permanent magnet is used as the auxiliary magnetic field generating device, but an electromagnetic coil may be used as the auxiliary magnetic field generating device.
上述したように本発明によれば、磁性膜形成装置の主磁
場生成装置の生成する磁場とほぼ平行な磁場を生成する
補助磁場生成装置を設けたので。As described above, according to the present invention, an auxiliary magnetic field generating device is provided that generates a magnetic field substantially parallel to the magnetic field generated by the main magnetic field generating device of the magnetic film forming apparatus.
基板ホルダ」二に広範vnにわたって基板面と平行に均
一な磁場を生成させることができ、小形の装置で磁気特
性のすぐれた磁性薄膜を基板上に成膜することができる
。It is possible to generate a uniform magnetic field parallel to the substrate surface over a wide range of the substrate holder, and a magnetic thin film with excellent magnetic properties can be formed on the substrate using a small device.
【図面の簡単な説明】
第1図は本発明に係る磁性膜形成装置の一実施例を示す
縦断面図、第2図は第1図の横断面図、第3図は本実施
例による磁力線を示す平面図、第4図は従来の磁性膜形
成装置による磁力線を示す平面図である。
1・・・コイル(主磁場生成装置)、2・・・磁力線、
3・・・基板ホルダ、6・・・基板、7・・・真空容器
、10・・・ターゲット、14・・・永久磁石(補助1
11場生成装置)。[BRIEF DESCRIPTION OF THE DRAWINGS] FIG. 1 is a longitudinal cross-sectional view showing an embodiment of the magnetic film forming apparatus according to the present invention, FIG. 2 is a cross-sectional view of FIG. 1, and FIG. 3 is a magnetic field line according to the present embodiment. FIG. 4 is a plan view showing lines of magnetic force produced by a conventional magnetic film forming apparatus. 1... Coil (main magnetic field generator), 2... Lines of magnetic force,
3... Substrate holder, 6... Substrate, 7... Vacuum container, 10... Target, 14... Permanent magnet (auxiliary 1
11 field generator).
Claims (1)
基板と、この基板を保持する基板ホルダと、前記基板面
上に磁場を印加する主磁場生成装置と、これらうち少な
くとも一部を収納保持する真空容器とよりなる磁性膜形
成装置において、前記主磁場生成装置の生成する磁場と
ほぼ平行な磁場を生成する補助磁場生成装置を設けたこ
とを特徴とする磁性膜形成装置。 2、特許請求の範囲第1項において、補助磁場生成装置
は、基板とほぼ平行に設けられた1対の永久磁石である
ことを特徴とする磁性膜形成装置。[Claims] 1. A target made of a film-forming material, a substrate that is a base material to be film-formed, a substrate holder that holds this substrate, and a main magnetic field generating device that applies a magnetic field onto the surface of the substrate; A magnetic film forming apparatus comprising a vacuum container that houses and holds at least a portion of these, characterized in that an auxiliary magnetic field generating device is provided that generates a magnetic field substantially parallel to the magnetic field generated by the main magnetic field generating device. Film forming device. 2. A magnetic film forming apparatus according to claim 1, wherein the auxiliary magnetic field generating device is a pair of permanent magnets provided substantially parallel to the substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7718886A JPS62232911A (en) | 1986-04-03 | 1986-04-03 | Magnetic film forming device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7718886A JPS62232911A (en) | 1986-04-03 | 1986-04-03 | Magnetic film forming device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62232911A true JPS62232911A (en) | 1987-10-13 |
JPH0584657B2 JPH0584657B2 (en) | 1993-12-02 |
Family
ID=13626840
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7718886A Granted JPS62232911A (en) | 1986-04-03 | 1986-04-03 | Magnetic film forming device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62232911A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01294859A (en) * | 1988-05-23 | 1989-11-28 | Hitachi Ltd | Opposed target-type sputtering device |
US5630916A (en) * | 1993-03-02 | 1997-05-20 | Cvc Products, Inc. | Magnetic orienting device for thin film deposition and method of use |
WO1997042649A1 (en) * | 1996-05-07 | 1997-11-13 | Nordiko Limited | Magnet array |
US6042707A (en) * | 1998-05-22 | 2000-03-28 | Cvc Products, Inc. | Multiple-coil electromagnet for magnetically orienting thin films |
US6106682A (en) * | 1998-05-22 | 2000-08-22 | Cvc Products, Inc. | Thin-film processing electromagnet for low-skew magnetic orientation |
JP2008010540A (en) * | 2006-06-28 | 2008-01-17 | Shin Etsu Chem Co Ltd | Magnetic circuit for generating radial magnetic field, and magnetic recording medium |
WO2019011161A1 (en) * | 2017-07-14 | 2019-01-17 | 北京北方华创微电子装备有限公司 | Magnetic thin film deposition chamber and thin film deposition device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60182711A (en) * | 1984-02-29 | 1985-09-18 | Konishiroku Photo Ind Co Ltd | Method and apparatus for forming magnetic thin-film |
-
1986
- 1986-04-03 JP JP7718886A patent/JPS62232911A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60182711A (en) * | 1984-02-29 | 1985-09-18 | Konishiroku Photo Ind Co Ltd | Method and apparatus for forming magnetic thin-film |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01294859A (en) * | 1988-05-23 | 1989-11-28 | Hitachi Ltd | Opposed target-type sputtering device |
US5630916A (en) * | 1993-03-02 | 1997-05-20 | Cvc Products, Inc. | Magnetic orienting device for thin film deposition and method of use |
US5902466A (en) * | 1993-03-02 | 1999-05-11 | Cvc Products, Inc. | Sputtering apparatus with magnetic orienting device for thin film deposition |
US6235164B1 (en) * | 1993-03-02 | 2001-05-22 | Cvc Products, Inc. | Low-pressure processing system for magnetic orientation of thin magnetic film |
WO1997042649A1 (en) * | 1996-05-07 | 1997-11-13 | Nordiko Limited | Magnet array |
US6042707A (en) * | 1998-05-22 | 2000-03-28 | Cvc Products, Inc. | Multiple-coil electromagnet for magnetically orienting thin films |
US6106682A (en) * | 1998-05-22 | 2000-08-22 | Cvc Products, Inc. | Thin-film processing electromagnet for low-skew magnetic orientation |
US6126790A (en) * | 1998-05-22 | 2000-10-03 | Cvc Products, Inc. | Method of magnetically orienting thin magnetic films with a multiple-coil electromagnet |
US6475359B1 (en) | 1998-05-22 | 2002-11-05 | Cvc Products, Inc. | Thin-film processing electromagnet with modified core for producing low-skew magnetic orientation |
JP2008010540A (en) * | 2006-06-28 | 2008-01-17 | Shin Etsu Chem Co Ltd | Magnetic circuit for generating radial magnetic field, and magnetic recording medium |
JP4648876B2 (en) * | 2006-06-28 | 2011-03-09 | 信越化学工業株式会社 | Magnetic circuit for radial magnetic field generation |
WO2019011161A1 (en) * | 2017-07-14 | 2019-01-17 | 北京北方华创微电子装备有限公司 | Magnetic thin film deposition chamber and thin film deposition device |
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JPH0584657B2 (en) | 1993-12-02 |
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