JPS6069167A - 光硬化型光隠蔽用コ−ティング組成物 - Google Patents

光硬化型光隠蔽用コ−ティング組成物

Info

Publication number
JPS6069167A
JPS6069167A JP58178509A JP17850983A JPS6069167A JP S6069167 A JPS6069167 A JP S6069167A JP 58178509 A JP58178509 A JP 58178509A JP 17850983 A JP17850983 A JP 17850983A JP S6069167 A JPS6069167 A JP S6069167A
Authority
JP
Japan
Prior art keywords
polyacrylate
coating composition
light
photosensitizer
scattering agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58178509A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0427272B2 (enExample
Inventor
Takao Inoue
孝夫 井上
Takahiro Matsuo
隆広 松尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58178509A priority Critical patent/JPS6069167A/ja
Priority to EP19840111387 priority patent/EP0135925B1/en
Priority to DE8484111387T priority patent/DE3461934D1/de
Priority to CA000464066A priority patent/CA1238741A/en
Publication of JPS6069167A publication Critical patent/JPS6069167A/ja
Publication of JPH0427272B2 publication Critical patent/JPH0427272B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/022—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polycondensates with side or terminal unsaturations
    • C08F299/024—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polycondensates with side or terminal unsaturations the unsaturation being in acrylic or methacrylic groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
JP58178509A 1983-09-27 1983-09-27 光硬化型光隠蔽用コ−ティング組成物 Granted JPS6069167A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP58178509A JPS6069167A (ja) 1983-09-27 1983-09-27 光硬化型光隠蔽用コ−ティング組成物
EP19840111387 EP0135925B1 (en) 1983-09-27 1984-09-25 Photo-settable, light-shielding coating composition
DE8484111387T DE3461934D1 (en) 1983-09-27 1984-09-25 Photo-settable, light-shielding coating composition
CA000464066A CA1238741A (en) 1983-09-27 1984-09-26 Photo-settable, light-shielding coating composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58178509A JPS6069167A (ja) 1983-09-27 1983-09-27 光硬化型光隠蔽用コ−ティング組成物

Publications (2)

Publication Number Publication Date
JPS6069167A true JPS6069167A (ja) 1985-04-19
JPH0427272B2 JPH0427272B2 (enExample) 1992-05-11

Family

ID=16049708

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58178509A Granted JPS6069167A (ja) 1983-09-27 1983-09-27 光硬化型光隠蔽用コ−ティング組成物

Country Status (4)

Country Link
EP (1) EP0135925B1 (enExample)
JP (1) JPS6069167A (enExample)
CA (1) CA1238741A (enExample)
DE (1) DE3461934D1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008081688A (ja) * 2006-09-29 2008-04-10 Kimoto & Co Ltd ハードコート塗料、これを用いてなるハードコート膜、および成形体

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8602402D0 (en) * 1986-01-31 1986-03-05 Sericol Group Ltd Coating compositions
GB2226566B (en) * 1988-12-12 1992-04-08 Croda Applic Chemicals Limited Automotive sealing process
US6316515B1 (en) * 1994-04-05 2001-11-13 Red Spot Paint & Varnish Co., Inc. UV curable hardcoat compositions and processes
WO2009032271A2 (en) * 2007-09-05 2009-03-12 Albany International Corp. Process for producing papermaker's and industrial fabric seam and seam produced by that method
US8277645B2 (en) 2008-12-17 2012-10-02 Jarvis Jr Ernest Automatic retractable screen system for storm drain inlets
CN116656227B (zh) * 2023-05-22 2025-07-11 中山市永鑫电子科技有限公司 一种消光涂料及其制备方法和光学仪器用遮光膜

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS564565B1 (enExample) * 1971-07-05 1981-01-30
GB2030584B (en) * 1978-10-03 1983-03-23 Lankro Chem Ltd Photopolymerisable solder resist compositions
US4384026A (en) * 1978-11-01 1983-05-17 General Electric Company Photocurable acrylic coated polycarbonate articles
JPS5774369A (en) * 1980-10-28 1982-05-10 Mitsui Petrochem Ind Ltd Coating composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008081688A (ja) * 2006-09-29 2008-04-10 Kimoto & Co Ltd ハードコート塗料、これを用いてなるハードコート膜、および成形体

Also Published As

Publication number Publication date
DE3461934D1 (en) 1987-02-12
JPH0427272B2 (enExample) 1992-05-11
CA1238741A (en) 1988-06-28
EP0135925B1 (en) 1987-01-07
EP0135925A3 (en) 1985-05-08
EP0135925A2 (en) 1985-04-03

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