JPS60502259A - 膜を塗布するための方法及び装置 - Google Patents
膜を塗布するための方法及び装置Info
- Publication number
- JPS60502259A JPS60502259A JP59503497A JP50349784A JPS60502259A JP S60502259 A JPS60502259 A JP S60502259A JP 59503497 A JP59503497 A JP 59503497A JP 50349784 A JP50349784 A JP 50349784A JP S60502259 A JPS60502259 A JP S60502259A
- Authority
- JP
- Japan
- Prior art keywords
- fluid
- passages
- velocity
- cross
- sectional area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 39
- 239000012528 membrane Substances 0.000 title description 3
- 239000012530 fluid Substances 0.000 claims description 129
- 239000000758 substrate Substances 0.000 claims description 46
- 239000011521 glass Substances 0.000 claims description 15
- 230000007423 decrease Effects 0.000 claims description 8
- 239000005357 flat glass Substances 0.000 claims description 8
- 230000003247 decreasing effect Effects 0.000 claims description 5
- 230000000087 stabilizing effect Effects 0.000 claims description 4
- 239000000376 reactant Substances 0.000 description 14
- 239000000203 mixture Substances 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 241000981595 Zoysia japonica Species 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- HEFNNWSXXWATRW-UHFFFAOYSA-N Ibuprofen Chemical compound CC(C)CC1=CC=C(C(C)C(O)=O)C=C1 HEFNNWSXXWATRW-UHFFFAOYSA-N 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45502—Flow conditions in reaction chamber
- C23C16/45504—Laminar flow
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45582—Expansion of gas before it reaches the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45585—Compression of gas before it reaches the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
- C23C16/45591—Fixed means, e.g. wings, baffles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45595—Atmospheric CVD gas inlets with no enclosed reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Chemical Vapour Deposition (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Surface Treatment Of Glass (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US535798 | 1983-09-26 | ||
| US06/535,798 US4504526A (en) | 1983-09-26 | 1983-09-26 | Apparatus and method for producing a laminar flow of constant velocity fluid along a substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60502259A true JPS60502259A (ja) | 1985-12-26 |
| JPH0582475B2 JPH0582475B2 (enExample) | 1993-11-19 |
Family
ID=24135810
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59503497A Granted JPS60502259A (ja) | 1983-09-26 | 1984-09-17 | 膜を塗布するための方法及び装置 |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US4504526A (enExample) |
| EP (1) | EP0156857B1 (enExample) |
| JP (1) | JPS60502259A (enExample) |
| AU (1) | AU575349B2 (enExample) |
| BR (1) | BR8407050A (enExample) |
| CA (1) | CA1252369A (enExample) |
| DE (1) | DE3484059D1 (enExample) |
| ES (1) | ES8606910A1 (enExample) |
| IT (1) | IT1178436B (enExample) |
| MX (1) | MX163477B (enExample) |
| WO (1) | WO1985001522A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4849260A (en) * | 1986-06-30 | 1989-07-18 | Nihon Sinku Gijutsu Kabushiki Kaisha | Method for selectively depositing metal on a substrate |
| US4994301A (en) * | 1986-06-30 | 1991-02-19 | Nihon Sinku Gijutsu Kabusiki Kaisha | ACVD (chemical vapor deposition) method for selectively depositing metal on a substrate |
| US4793282A (en) * | 1987-05-18 | 1988-12-27 | Libbey-Owens-Ford Co. | Distributor beam for chemical vapor deposition on glass |
| CN1037702C (zh) * | 1993-04-16 | 1998-03-11 | 利比-欧文斯-福特公司 | 涂敷－玻璃基片的方法和设备 |
| GB9511841D0 (en) * | 1995-06-10 | 1995-08-09 | Pilkington Glass Ltd | Mirrors and their production |
| US6103015A (en) * | 1998-01-19 | 2000-08-15 | Libbey-Owens-Ford Co. | Symmetrical CVD coater with lower upstream exhaust toe |
| JP3806537B2 (ja) * | 1999-03-10 | 2006-08-09 | 株式会社カイジョー | 超音波洗浄機及びそれを具備するウエット処理ノズル |
| US6521295B1 (en) | 2001-04-17 | 2003-02-18 | Pilkington North America, Inc. | Chemical vapor deposition of antimony-doped metal oxide and the coated article made thereby |
| US7635647B2 (en) * | 2004-08-18 | 2009-12-22 | Calyxo Gmbh | Atmospheric pressure chemical vapor deposition |
| BRPI0614819A2 (pt) * | 2005-08-30 | 2011-04-19 | Pilkington Group Ltd | artigo revestido, método de formar um artigo revestido, e artigo de vidro revestido |
| US8076224B2 (en) * | 2008-12-08 | 2011-12-13 | Calyxo Gmbh | Thin-film deposition and recirculation of a semi-conductor material |
| EP2391743B1 (en) | 2009-02-02 | 2014-04-09 | Pilkington Group Limited | Method of depositing an electrically conductive titanium oxide coating on a substrate |
| FI9160U1 (fi) | 2010-01-04 | 2011-04-14 | Beneq Oy | Pinnoituslaite |
| US20110207301A1 (en) * | 2010-02-19 | 2011-08-25 | Kormanyos Kenneth R | Atmospheric pressure chemical vapor deposition with saturation control |
| DE102010028277B4 (de) | 2010-04-27 | 2013-04-18 | Calyxo Gmbh | Verfahren und Vorrichtung zur Herstellung einer mit einem Halbleitermaterial beschichteten Glasscheibe und nach dem Verfahren erhältliche Solarzelle oder Solarmodul |
| EP2707098A4 (en) | 2011-05-13 | 2014-05-07 | Thomas J Sheperak | SYSTEM, APPARATUS AND METHOD FOR CARRYING OUT PLASMA-DIRECTED ELECTRON BEAM INJURY |
| US20150122319A1 (en) | 2011-07-28 | 2015-05-07 | David A. Strickler | Apcvd of doped titanium oxide and the coated article made thereby |
| US10151861B2 (en) | 2014-02-11 | 2018-12-11 | Pilkington Group Limited | Coated glass article and display assembly made therewith |
| CN104451601B (zh) * | 2014-12-02 | 2017-02-22 | 浙江大学 | 一种常压化学气相沉积镀膜反应器 |
| CN104561938B (zh) * | 2015-01-09 | 2017-04-19 | 浙江大学 | 一种浮法在线常压化学气相沉积镀膜反应器 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3805736A (en) * | 1971-12-27 | 1974-04-23 | Ibm | Apparatus for diffusion limited mass transport |
| JPS5843508A (ja) * | 1981-09-09 | 1983-03-14 | Fuji Electric Corp Res & Dev Ltd | 量産型成膜装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3790404A (en) * | 1972-06-19 | 1974-02-05 | Ibm | Continuous vapor processing apparatus and method |
| GB1524326A (en) * | 1976-04-13 | 1978-09-13 | Bfg Glassgroup | Coating of glass |
| US4462333A (en) * | 1982-10-27 | 1984-07-31 | Energy Conversion Devices, Inc. | Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus |
-
1983
- 1983-09-26 US US06/535,798 patent/US4504526A/en not_active Expired - Lifetime
-
1984
- 1984-09-14 CA CA000463186A patent/CA1252369A/en not_active Expired
- 1984-09-17 BR BR8407050A patent/BR8407050A/pt not_active IP Right Cessation
- 1984-09-17 AU AU34348/84A patent/AU575349B2/en not_active Ceased
- 1984-09-17 JP JP59503497A patent/JPS60502259A/ja active Granted
- 1984-09-17 EP EP84903521A patent/EP0156857B1/en not_active Expired
- 1984-09-17 DE DE8484903521T patent/DE3484059D1/de not_active Expired - Lifetime
- 1984-09-17 WO PCT/US1984/001460 patent/WO1985001522A1/en not_active Ceased
- 1984-09-25 ES ES536212A patent/ES8606910A1/es not_active Expired
- 1984-09-25 IT IT48896/84A patent/IT1178436B/it active
- 1984-09-25 MX MX202824A patent/MX163477B/es unknown
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3805736A (en) * | 1971-12-27 | 1974-04-23 | Ibm | Apparatus for diffusion limited mass transport |
| JPS5843508A (ja) * | 1981-09-09 | 1983-03-14 | Fuji Electric Corp Res & Dev Ltd | 量産型成膜装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3484059D1 (de) | 1991-03-07 |
| JPH0582475B2 (enExample) | 1993-11-19 |
| AU3434884A (en) | 1985-04-23 |
| IT8448896A0 (it) | 1984-09-25 |
| ES536212A0 (es) | 1986-05-16 |
| MX163477B (es) | 1992-05-19 |
| CA1252369A (en) | 1989-04-11 |
| WO1985001522A1 (en) | 1985-04-11 |
| ES8606910A1 (es) | 1986-05-16 |
| EP0156857A1 (en) | 1985-10-09 |
| AU575349B2 (en) | 1988-07-28 |
| IT1178436B (it) | 1987-09-09 |
| US4504526A (en) | 1985-03-12 |
| EP0156857A4 (en) | 1986-07-30 |
| EP0156857B1 (en) | 1991-01-30 |
| BR8407050A (pt) | 1985-08-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |