JPS6045017A - 拡散炉 - Google Patents
拡散炉Info
- Publication number
- JPS6045017A JPS6045017A JP15393083A JP15393083A JPS6045017A JP S6045017 A JPS6045017 A JP S6045017A JP 15393083 A JP15393083 A JP 15393083A JP 15393083 A JP15393083 A JP 15393083A JP S6045017 A JPS6045017 A JP S6045017A
- Authority
- JP
- Japan
- Prior art keywords
- tube
- processing tube
- processing
- inclined surfaces
- heater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009792 diffusion process Methods 0.000 title claims description 4
- 238000000034 method Methods 0.000 claims abstract description 19
- 238000004804 winding Methods 0.000 claims abstract description 5
- 238000003825 pressing Methods 0.000 claims description 5
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 3
- 239000010453 quartz Substances 0.000 abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 3
- 238000003780 insertion Methods 0.000 abstract description 2
- 230000037431 insertion Effects 0.000 abstract description 2
- 239000000835 fiber Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000007789 sealing Methods 0.000 abstract 1
- 239000012494 Quartz wool Substances 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
Landscapes
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Furnace Details (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15393083A JPS6045017A (ja) | 1983-08-22 | 1983-08-22 | 拡散炉 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15393083A JPS6045017A (ja) | 1983-08-22 | 1983-08-22 | 拡散炉 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6045017A true JPS6045017A (ja) | 1985-03-11 |
JPH0158650B2 JPH0158650B2 (enrdf_load_stackoverflow) | 1989-12-13 |
Family
ID=15573185
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15393083A Granted JPS6045017A (ja) | 1983-08-22 | 1983-08-22 | 拡散炉 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6045017A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62115712A (ja) * | 1985-11-14 | 1987-05-27 | Nec Kyushu Ltd | 拡散炉装置 |
JPS6385321U (enrdf_load_stackoverflow) * | 1986-11-20 | 1988-06-03 | ||
JPH02257612A (ja) * | 1989-03-30 | 1990-10-18 | Fujitsu Ltd | 熱処理炉 |
JPH03207600A (ja) * | 1990-01-11 | 1991-09-10 | Citizen Watch Co Ltd | 順送りプレス抜金型 |
-
1983
- 1983-08-22 JP JP15393083A patent/JPS6045017A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62115712A (ja) * | 1985-11-14 | 1987-05-27 | Nec Kyushu Ltd | 拡散炉装置 |
JPS6385321U (enrdf_load_stackoverflow) * | 1986-11-20 | 1988-06-03 | ||
JPH02257612A (ja) * | 1989-03-30 | 1990-10-18 | Fujitsu Ltd | 熱処理炉 |
JPH03207600A (ja) * | 1990-01-11 | 1991-09-10 | Citizen Watch Co Ltd | 順送りプレス抜金型 |
Also Published As
Publication number | Publication date |
---|---|
JPH0158650B2 (enrdf_load_stackoverflow) | 1989-12-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
NO20003477L (no) | Varmeveksler i komposittmateriale og fremgangsmÕte for dens fremstilling | |
KR970067593A (ko) | 기판처리장치 | |
JP3155757B2 (ja) | 端部開口式モールドのキャビティを形成する手段及び技術 | |
JPS553384A (en) | Method of adhering siliconndenatured silicon carbide element | |
JPS6045017A (ja) | 拡散炉 | |
ES8407103A1 (es) | Disposicion de cesta para la sujecion de piezas sobre un fondo durante su tratamiento termico | |
JPH0769777A (ja) | るつぼ、特に支持るつぼ | |
JPH0766181B2 (ja) | マスク膜とホルダ枠とからなるマスクの安定化方法 | |
JP2773150B2 (ja) | 半導体装置の製造装置 | |
JPS6331688Y2 (enrdf_load_stackoverflow) | ||
JPS636520B2 (enrdf_load_stackoverflow) | ||
JPS6245020A (ja) | 半導体加熱用石英管のシ−ル方法 | |
JPS6017076A (ja) | 気相成長用装置 | |
JP3987841B2 (ja) | ウェハ保持装置 | |
JP2562683B2 (ja) | 縦型ウェハボ−ト | |
JPH02198134A (ja) | 半導体製造装置 | |
JPH0632680Y2 (ja) | 半導体製造装置の加熱炉 | |
JPH0245913A (ja) | 半導体製造装置 | |
JPH0791566B2 (ja) | 焼結炉の処理物収納内室 | |
JPS63164312A (ja) | シリコンウエ−ハ処理用治具 | |
JPS59181446A (ja) | 陰極線管の製造方法 | |
JPH01130522A (ja) | ウェハボートの製造方法 | |
JPS6038018B2 (ja) | 半導体ウエ−ハの減圧熱処理炉 | |
JPH0397222A (ja) | 枚葉式cvd装置 | |
JPS6394638A (ja) | 真空炉キヤツプ |