JPH0158650B2 - - Google Patents

Info

Publication number
JPH0158650B2
JPH0158650B2 JP15393083A JP15393083A JPH0158650B2 JP H0158650 B2 JPH0158650 B2 JP H0158650B2 JP 15393083 A JP15393083 A JP 15393083A JP 15393083 A JP15393083 A JP 15393083A JP H0158650 B2 JPH0158650 B2 JP H0158650B2
Authority
JP
Japan
Prior art keywords
tube
fixing ring
tube holder
process tube
ring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15393083A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6045017A (ja
Inventor
Yasuhiro Fuwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP15393083A priority Critical patent/JPS6045017A/ja
Publication of JPS6045017A publication Critical patent/JPS6045017A/ja
Publication of JPH0158650B2 publication Critical patent/JPH0158650B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67115Apparatus for thermal treatment mainly by radiation

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Furnace Details (AREA)
JP15393083A 1983-08-22 1983-08-22 拡散炉 Granted JPS6045017A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15393083A JPS6045017A (ja) 1983-08-22 1983-08-22 拡散炉

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15393083A JPS6045017A (ja) 1983-08-22 1983-08-22 拡散炉

Publications (2)

Publication Number Publication Date
JPS6045017A JPS6045017A (ja) 1985-03-11
JPH0158650B2 true JPH0158650B2 (enrdf_load_stackoverflow) 1989-12-13

Family

ID=15573185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15393083A Granted JPS6045017A (ja) 1983-08-22 1983-08-22 拡散炉

Country Status (1)

Country Link
JP (1) JPS6045017A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62115712A (ja) * 1985-11-14 1987-05-27 Nec Kyushu Ltd 拡散炉装置
JPH0340414Y2 (enrdf_load_stackoverflow) * 1986-11-20 1991-08-26
JPH02257612A (ja) * 1989-03-30 1990-10-18 Fujitsu Ltd 熱処理炉
JP2854907B2 (ja) * 1990-01-11 1999-02-10 シチズン時計株式会社 順送りプレス抜金型

Also Published As

Publication number Publication date
JPS6045017A (ja) 1985-03-11

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