JPS6045017A - Diffusion furnace - Google Patents
Diffusion furnaceInfo
- Publication number
- JPS6045017A JPS6045017A JP15393083A JP15393083A JPS6045017A JP S6045017 A JPS6045017 A JP S6045017A JP 15393083 A JP15393083 A JP 15393083A JP 15393083 A JP15393083 A JP 15393083A JP S6045017 A JPS6045017 A JP S6045017A
- Authority
- JP
- Japan
- Prior art keywords
- tube
- processing tube
- processing
- inclined surfaces
- heater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
Landscapes
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Furnace Details (AREA)
Abstract
Description
【発明の詳細な説明】
（イ）産業上の利用分野
この発明は、半導体装置の製造等に用いられる拡Ｉｉ＆
炉に関する。DETAILED DESCRIPTION OF THE INVENTION (a) Industrial application field This invention is applicable to expansion Ii &
Regarding furnaces.
（＋：＋ ）従来技術
従来の拡ｔｉｋ、炉は、チューブホルダの筒状開口部の
内面と、これに挿入されたプロセスチューブの管面との
隙間に石英綿を詰め込んでプロセスチューブを固定して
いる。(+:+) Prior art In conventional expansion furnaces, the process tube is fixed by stuffing quartz wool into the gap between the inner surface of the cylindrical opening of the tube holder and the tube surface of the process tube inserted into it. ing.
しかしながら、かかる固定作業は煩わしく、また、プロ
セスチューブの取り外しに１１４テ１ｔを件うという欠
点がある。However, such fixing work is troublesome and has the disadvantage that it takes 114 hours to remove the process tube.
一方、均一な温度分布を得るために、プロセスチューブ
の正確な位置決め及び炉内と外界とのシールを厳密に行
う必要があるが、従来の７１２．’ ！ｉｕ、炉は、前
述した固定手段を採る関係」二、プに１セスチ１．−ブ
の正確な位置決めや外界とのシールをＩｉｉ’ｉ、密に
１１うことが困ゲＶである。On the other hand, in order to obtain a uniform temperature distribution, it is necessary to accurately position the process tube and strictly seal the inside of the furnace with the outside world, but the conventional 712. '! iu, the furnace adopts the above-mentioned fixing means. - It is difficult to accurately position the tube and seal it tightly with the outside world.
さらに、石英綿を詰め込む作業の際に、塵埃が発生し、
′半導体装置の製造に好ましくない影響を与えるという
問題もある。Furthermore, dust is generated during the work of packing the quartz wool.
'There is also the problem that it has an unfavorable effect on the manufacturing of semiconductor devices.
（ハ）目的
この発明は、プロセスチューブの固定作業が容易で、且
つ、その位置決め及び炉内と外界とのソールを厳密を行
え、しかも、固定作業におりる塵埃の発生が少ないｔＬ
散炉を提供するごとをＬＪ的としている。(C) Purpose This invention facilitates the process tube fixing work, allows for precise positioning of the process tube and sole between the inside of the furnace and the outside world, and generates less dust during the fixing work.
Every time they provide a scattered hearth is considered LJ-like.
（ニ）構成
この発明に係る拡ｆｌ＆炉は、輪状のハネ祠に１ｌＪｉ
；’：Ｊ！月を巻回してなる固定リングをプ目セスチ
１．−ゾに１１）；め込の、前記固定リングをリング押
さえ板でチューブホルダの開１］部（ｔ４斜面に押し当
て′ζ止めることにより、前記プロセスチューブを固定
したごとを特徴としている。(D) Configuration The expansion fl/furnace according to the present invention has a ring-shaped honeycomb with 1lJi
;':J! A fixing ring made by winding the moon. 1. - 11); The process tube is fixed by pressing the fitted fixing ring against the opening 1] (t4 slope) of the tube holder with a ring holding plate and stopping it.
（ボ）実施例
第１図はこの発明に係る拡散炉の一実施例の構成を略示
した説明図である。(B) Embodiment FIG. 1 is an explanatory diagram schematically showing the structure of an embodiment of a diffusion furnace according to the present invention.
同図（ａｌは、実施例の縦断面の概略図であって、ｌは
石英等よりなるプロセスチューブ、２はヒータ、３は例
えばアルミナ等からなる均熱管であって、この均熱管３
は炉内の温度を均一にするためにプロセスチューブｌと
ヒータ２との間に設けられる。In the same figure (al is a schematic longitudinal cross-sectional view of the embodiment, l is a process tube made of quartz or the like, 2 is a heater, 3 is a soaking tube made of, for example, alumina, etc.
is provided between the process tube 1 and the heater 2 in order to equalize the temperature inside the furnace.
４はプロセスチューブ１を支持するためにヒータ２の両
側に設けられるチューブホルダであり、ごのチューブボ
ルダ４の中央部分にはゾ１．Ｉレスチ〜２．−ゾＩを挿
入するための開口部４１が設けられている。4 are tube holders provided on both sides of the heater 2 to support the process tube 1; I Resti~2. - An opening 41 is provided for insertion of ZoI.
５はプロセスチューブｌの両端に嵌め込まれる固定リン
グである。ごの固定リング５は、同図（ｂｌにその断面
を示すように、輪状の：１イルハネ５１に断熱材として
の例えば石英綿５２を巻回し−（形成される。Reference numeral 5 denotes a fixing ring fitted into both ends of the process tube l. The fixing ring 5 is formed by winding, for example, quartz cotton 52 as a heat insulating material around a ring-shaped ring 51, as shown in the cross section in FIG.
プロセスチューブ１に嵌め込まれた固定リング５は、前
記チューブホルタ４の開ｌ−１部４１の顛♀；［面４２
に当接するように配置され、さらに、チューブホルタ４
に取りつけられた押さえ板（ｉにより前記（Ｉｒ！斜面
４２に押さえつりられで止められる。The fixing ring 5 fitted into the process tube 1 is attached to the opening 1-1 portion 41 of the tube holder 4;
Further, the tube holder 4
It is held down and stopped by the pressing plate (i) attached to the (Ir! slope 42).
なお、前記押さえ板６は１片、ｎｋリ−１からのＰｌ〜
のつ’ｂｌ ’Ａ’Ｊを防く働きもする。Note that the pressing plate 6 is one piece, Pl~ from NK Lee-1.
It also works to prevent Notsu'bl 'A'J.
このようにして固定リング５が係止されるごとにより、
プロセスチューブ１が固定される。Each time the fixing ring 5 is locked in this way,
Process tube 1 is fixed.
（・＼）効果
この発明に係る拡ＩＩ＆炉は、１ｉｉｊ、ＪｉＬ、たよ
うノ、（固定リングを用いるから、プロセスチューブソ
の固定及び取り外しが大変容易（：ＬｊＪ？、。(・＼)Effect The expansion II & furnace according to this invention is very easy to fix and remove the process tube because it uses a fixing ring (:LjJ?,.
また、固定リングはブ１−１セス・Ｊ−、、、−’〕の
丁（曲に及びチューブボルダの開１−Ｊ ｆｉｌ ｂ：
二し、かり密着４゛るから、炉内と外界とのシールが密
に行われる。しまたがって、この発明によれは、拡（１
に炉の（！ｌ！１度分布をより均一にすることができる
。In addition, the fixing ring is attached to the opening of the tube boulder 1-J fil b:
Second, since there is close contact, the inside of the furnace and the outside world are tightly sealed. According to the present invention, it is possible to expand (1)
It is possible to make the (!l!1 degree distribution of the furnace more uniform).
さらに、この発明に係る拡１１＆炉は、従来のようなプ
ロセスチューブの脱着時に石英綿が敗らばるごとかなく
、塵埃の発生が少ないので、塵埃をり１［（うクリンル
ーム等での使用に適している。Furthermore, the expansion 11 & furnace according to the present invention does not destroy the quartz wool when attaching/detaching the process tube as in the conventional case, and generates less dust. suitable for
第１図はこの発明に係る拡散炉の一実施例の構成を略示
した説明図である。
ｌ・・・プロセスチューブ、２・・・ヒータ、３・・・
均熱管、４・・・チューブボルダ、５・・・固定リング
、６・・・押さえ（）シ。
特許出願人 ローム株式会社
代理人 弁理士 大 西 孝 治
６６
第１ト２１
（ａ）
１
（ｂ）FIG. 1 is an explanatory diagram schematically showing the structure of an embodiment of a diffusion furnace according to the present invention. l...process tube, 2...heater, 3...
Soaking tube, 4...tube boulder, 5...fixing ring, 6...presser ()shi. Patent Applicant ROHM Co., Ltd. Agent Patent Attorney Takaharu Ohnishi 66 Part 1, Part 21 (a) 1 (b)
Claims (1)
をプロセスチューブに嵌め込み、前記固定リングをリン
グ押さえ板でチューブホルダの開口部傾斜面に押し当て
て止めることにより、前記プロセスチューブを固定した
ことを特徴とする拡散炉。(1) A fixing ring made by winding an insulating moon around a ring-shaped spring moon is fitted into the process tube, and the process tube is fixed by pressing the fixing ring against the inclined surface of the opening of the tube holder with a ring pressing plate. A diffusion furnace characterized by being fixed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15393083A JPS6045017A (en) | 1983-08-22 | 1983-08-22 | Diffusion furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15393083A JPS6045017A (en) | 1983-08-22 | 1983-08-22 | Diffusion furnace |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6045017A true JPS6045017A (en) | 1985-03-11 |
| JPH0158650B2 JPH0158650B2 (en) | 1989-12-13 |
Family
ID=15573185
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15393083A Granted JPS6045017A (en) | 1983-08-22 | 1983-08-22 | Diffusion furnace |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6045017A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62115712A (en) * | 1985-11-14 | 1987-05-27 | Nec Kyushu Ltd | Diffusion furnace device |
| JPS6385321U (en) * | 1986-11-20 | 1988-06-03 | ||
| JPH02257612A (en) * | 1989-03-30 | 1990-10-18 | Fujitsu Ltd | Heat-treatment furnace |
| JPH03207600A (en) * | 1990-01-11 | 1991-09-10 | Citizen Watch Co Ltd | Progressive press punching die |
-
1983
- 1983-08-22 JP JP15393083A patent/JPS6045017A/en active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62115712A (en) * | 1985-11-14 | 1987-05-27 | Nec Kyushu Ltd | Diffusion furnace device |
| JPS6385321U (en) * | 1986-11-20 | 1988-06-03 | ||
| JPH0340414Y2 (en) * | 1986-11-20 | 1991-08-26 | ||
| JPH02257612A (en) * | 1989-03-30 | 1990-10-18 | Fujitsu Ltd | Heat-treatment furnace |
| JPH03207600A (en) * | 1990-01-11 | 1991-09-10 | Citizen Watch Co Ltd | Progressive press punching die |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0158650B2 (en) | 1989-12-13 |
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