JPS602946A - ポジ型レジスト材料 - Google Patents

ポジ型レジスト材料

Info

Publication number
JPS602946A
JPS602946A JP10925083A JP10925083A JPS602946A JP S602946 A JPS602946 A JP S602946A JP 10925083 A JP10925083 A JP 10925083A JP 10925083 A JP10925083 A JP 10925083A JP S602946 A JPS602946 A JP S602946A
Authority
JP
Japan
Prior art keywords
resist
resist material
positive type
type resist
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10925083A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0377986B2 (cs
Inventor
Kazuo Toda
和男 戸田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10925083A priority Critical patent/JPS602946A/ja
Publication of JPS602946A publication Critical patent/JPS602946A/ja
Publication of JPH0377986B2 publication Critical patent/JPH0377986B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP10925083A 1983-06-20 1983-06-20 ポジ型レジスト材料 Granted JPS602946A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10925083A JPS602946A (ja) 1983-06-20 1983-06-20 ポジ型レジスト材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10925083A JPS602946A (ja) 1983-06-20 1983-06-20 ポジ型レジスト材料

Publications (2)

Publication Number Publication Date
JPS602946A true JPS602946A (ja) 1985-01-09
JPH0377986B2 JPH0377986B2 (cs) 1991-12-12

Family

ID=14505414

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10925083A Granted JPS602946A (ja) 1983-06-20 1983-06-20 ポジ型レジスト材料

Country Status (1)

Country Link
JP (1) JPS602946A (cs)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000010057A1 (en) * 1998-08-11 2000-02-24 International Business Machines Corporation Single component developer for copolymer resists
JP2001318472A (ja) * 2000-02-28 2001-11-16 Mitsubishi Electric Corp 現像方法、パターン形成方法およびこれらを用いたフォトマスクの製造方法、半導体装置の製造方法
US6426177B2 (en) 1998-08-11 2002-07-30 International Business Machines Corporation Single component developer for use with ghost exposure

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54133322A (en) * 1978-04-07 1979-10-17 Cho Lsi Gijutsu Kenkyu Kumiai Positive type ionizing radiation sensitive resist
JPS5615804A (en) * 1979-07-20 1981-02-16 Toray Ind Inc Semipermeable composite membrane having stable selective separation capacity
JPS5848046A (ja) * 1981-09-17 1983-03-19 Matsushita Electric Ind Co Ltd 遠紫外線露光用レジスト材料

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54133322A (en) * 1978-04-07 1979-10-17 Cho Lsi Gijutsu Kenkyu Kumiai Positive type ionizing radiation sensitive resist
JPS5615804A (en) * 1979-07-20 1981-02-16 Toray Ind Inc Semipermeable composite membrane having stable selective separation capacity
JPS5848046A (ja) * 1981-09-17 1983-03-19 Matsushita Electric Ind Co Ltd 遠紫外線露光用レジスト材料

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000010057A1 (en) * 1998-08-11 2000-02-24 International Business Machines Corporation Single component developer for copolymer resists
US6270949B1 (en) 1998-08-11 2001-08-07 International Business Machines Corporation Single component developer for copolymer resists
US6426177B2 (en) 1998-08-11 2002-07-30 International Business Machines Corporation Single component developer for use with ghost exposure
JP2001318472A (ja) * 2000-02-28 2001-11-16 Mitsubishi Electric Corp 現像方法、パターン形成方法およびこれらを用いたフォトマスクの製造方法、半導体装置の製造方法

Also Published As

Publication number Publication date
JPH0377986B2 (cs) 1991-12-12

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