JPS60263145A - ポジ型レジストパタ−ンの形成方法 - Google Patents

ポジ型レジストパタ−ンの形成方法

Info

Publication number
JPS60263145A
JPS60263145A JP12029984A JP12029984A JPS60263145A JP S60263145 A JPS60263145 A JP S60263145A JP 12029984 A JP12029984 A JP 12029984A JP 12029984 A JP12029984 A JP 12029984A JP S60263145 A JPS60263145 A JP S60263145A
Authority
JP
Japan
Prior art keywords
resist
layer
pattern
forming
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12029984A
Other languages
English (en)
Japanese (ja)
Other versions
JPH042183B2 (enrdf_load_stackoverflow
Inventor
Yasuhiro Yoneda
泰博 米田
Masashi Miyagawa
昌士 宮川
Kota Nishii
耕太 西井
Shunichi Fukuyama
俊一 福山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12029984A priority Critical patent/JPS60263145A/ja
Publication of JPS60263145A publication Critical patent/JPS60263145A/ja
Publication of JPH042183B2 publication Critical patent/JPH042183B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP12029984A 1984-06-12 1984-06-12 ポジ型レジストパタ−ンの形成方法 Granted JPS60263145A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12029984A JPS60263145A (ja) 1984-06-12 1984-06-12 ポジ型レジストパタ−ンの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12029984A JPS60263145A (ja) 1984-06-12 1984-06-12 ポジ型レジストパタ−ンの形成方法

Publications (2)

Publication Number Publication Date
JPS60263145A true JPS60263145A (ja) 1985-12-26
JPH042183B2 JPH042183B2 (enrdf_load_stackoverflow) 1992-01-16

Family

ID=14782794

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12029984A Granted JPS60263145A (ja) 1984-06-12 1984-06-12 ポジ型レジストパタ−ンの形成方法

Country Status (1)

Country Link
JP (1) JPS60263145A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS621230A (ja) * 1985-06-27 1987-01-07 Toshiba Corp パタ−ン形成方法
WO2004027843A1 (en) * 2002-09-18 2004-04-01 Tokyo University Of Science Surface processing method
US7629596B2 (en) 2005-02-21 2009-12-08 Tokyo University Of Science Educational Foundation Administrative Organization Method of producing 3-D mold, method of producing finely processed product, method of producing fine-pattern molded product, 3-D mold, finely processed product, fine-pattern molded product and optical component

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS621230A (ja) * 1985-06-27 1987-01-07 Toshiba Corp パタ−ン形成方法
WO2004027843A1 (en) * 2002-09-18 2004-04-01 Tokyo University Of Science Surface processing method
JP2005539393A (ja) * 2002-09-18 2005-12-22 学校法人東京理科大学 表面加工方法
US7629596B2 (en) 2005-02-21 2009-12-08 Tokyo University Of Science Educational Foundation Administrative Organization Method of producing 3-D mold, method of producing finely processed product, method of producing fine-pattern molded product, 3-D mold, finely processed product, fine-pattern molded product and optical component

Also Published As

Publication number Publication date
JPH042183B2 (enrdf_load_stackoverflow) 1992-01-16

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