JPS60254620A - ウエハーの乾燥方法および装置 - Google Patents
ウエハーの乾燥方法および装置Info
- Publication number
- JPS60254620A JPS60254620A JP59109475A JP10947584A JPS60254620A JP S60254620 A JPS60254620 A JP S60254620A JP 59109475 A JP59109475 A JP 59109475A JP 10947584 A JP10947584 A JP 10947584A JP S60254620 A JPS60254620 A JP S60254620A
- Authority
- JP
- Japan
- Prior art keywords
- drying
- basket
- wafer
- gas
- wafers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0402—Apparatus for fluid treatment
- H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H10P72/0408—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59109475A JPS60254620A (ja) | 1984-05-31 | 1984-05-31 | ウエハーの乾燥方法および装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59109475A JPS60254620A (ja) | 1984-05-31 | 1984-05-31 | ウエハーの乾燥方法および装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60254620A true JPS60254620A (ja) | 1985-12-16 |
| JPH0216006B2 JPH0216006B2 (enExample) | 1990-04-13 |
Family
ID=14511175
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59109475A Granted JPS60254620A (ja) | 1984-05-31 | 1984-05-31 | ウエハーの乾燥方法および装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60254620A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6369235A (ja) * | 1986-09-10 | 1988-03-29 | Tokuda Seisakusho Ltd | 熱風発生装置 |
| JPH0550739U (ja) * | 1991-12-04 | 1993-07-02 | 大日本スクリーン製造株式会社 | ウエハ保持ホルダ |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5756930A (en) * | 1980-09-22 | 1982-04-05 | Mitsubishi Electric Corp | Wafer washing and drying device |
-
1984
- 1984-05-31 JP JP59109475A patent/JPS60254620A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5756930A (en) * | 1980-09-22 | 1982-04-05 | Mitsubishi Electric Corp | Wafer washing and drying device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6369235A (ja) * | 1986-09-10 | 1988-03-29 | Tokuda Seisakusho Ltd | 熱風発生装置 |
| JPH0550739U (ja) * | 1991-12-04 | 1993-07-02 | 大日本スクリーン製造株式会社 | ウエハ保持ホルダ |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0216006B2 (enExample) | 1990-04-13 |
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